Condensed Matter > Materials Science
[Submitted on 8 May 2024 (v1), last revised 8 Jul 2024 (this version, v2)]
Title:Intermediates of Forming Transition Metal Dichalcogenides Heterostructures Revealed by Machine Learning Simulations
View PDF HTML (experimental)Abstract:The primary restrictions on 2D transition metal dichalcogenides (TMD) vdW heterostructures (vdWHs) are size limitation and alloying. Recently, a two-step vapor deposition method was reported to grow wafer-scale TMD vdWHs with little contamination [Nature 621, 499 (2023)]. In this letter, we developed a machine learning potential (MLP) which can accurately simulate the growth processes of bilayer MoS$_2$/WS$_2$ vdWHs under various conditions. Importantly, a SMMS (where M is Mo or W) structure is revealed as a highly stable intermediate easily introduces metal atom exchange and alloying. Eliminating the alloying contamination in TMD vdWHs is avoiding SMMS structure by preventing the landing of bare metal atoms. However, SMMS is revealed as an ideal electrode for MoS$_2$ FETs with low Schottky barrier.
Submission history
From: Luneng Zhao [view email][v1] Wed, 8 May 2024 10:10:59 UTC (1,710 KB)
[v2] Mon, 8 Jul 2024 15:52:25 UTC (20,459 KB)
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