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Showing 1–1 of 1 results for author: Young, E F Y

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  1. arXiv:1906.10773  [pdf, other

    cs.LG cs.CR stat.ML

    Are Adversarial Perturbations a Showstopper for ML-Based CAD? A Case Study on CNN-Based Lithographic Hotspot Detection

    Authors: Kang Liu, Haoyu Yang, Yuzhe Ma, Benjamin Tan, Bei Yu, Evangeline F. Y. Young, Ramesh Karri, Siddharth Garg

    Abstract: There is substantial interest in the use of machine learning (ML) based techniques throughout the electronic computer-aided design (CAD) flow, particularly those based on deep learning. However, while deep learning methods have surpassed state-of-the-art performance in several applications, they have exhibited intrinsic susceptibility to adversarial perturbations --- small but deliberate alteratio… ▽ More

    Submitted 25 June, 2019; originally announced June 2019.

    Journal ref: ACM Trans. Des. Autom. Electron. Syst. 25, 5, Article 48 (August 2020)