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MEMS-tunable dielectric metasurface lens using thin-film PZT for large displacements at low voltages
Authors:
Christopher A. Dirdal,
Paul C. V. Thrane,
Firehun T. Dullo,
Jo Gjessing,
Anand Summanwar,
Jon Tschudi
Abstract:
Tunable focusing is a desired property in a wide range of optical imaging and sensing technologies but has tended to require bulky components which cannot be integrated on-chip and have slow actuation speeds. Recently, integration of metasurfaces into electrostatic MEMS architectures has shown potential to overcome these challenges, but has offered limited out of plane displacement range while req…
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Tunable focusing is a desired property in a wide range of optical imaging and sensing technologies but has tended to require bulky components which cannot be integrated on-chip and have slow actuation speeds. Recently, integration of metasurfaces into electrostatic MEMS architectures has shown potential to overcome these challenges, but has offered limited out of plane displacement range while requiring large voltages. We demonstrate for the first time a movable metasurface lens actuated by integrated thin-film PZT MEMS, which has the advantage of offering large displacements at low voltages. An out of plane displacement of a metasurface in the range of 7.2 um is demonstrated under a voltage application of 23V. This is roughly twice the displacement at a quarter of the voltage of state of the art electrostatic out of plane actuation of metasurfaces. Utilizing this tunability we demonstrate a varifocal lens doublet with a focal shift on the order of 250um at the wavelength 1.55um. Thin-film PZT MEMS-metasurfaces is a promising platform for miniaturized varifocal components.
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Submitted 19 December, 2021;
originally announced December 2021.
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Dynamic MEMS-based optical metasurfaces
Authors:
Chao Meng,
Paul C. V. Thrane,
Fei Ding,
Jo Gjessing,
Martin Thomaschewski,
Cuo Wu,
Christopher Dirdal,
Sergey I. Bozhevolnyi
Abstract:
Optical metasurfaces (OMSs) have shown unprecedented capabilities for versatile wavefront manipulations at the subwavelength scale, thus opening fascinating perspectives for next generation ultracompact optical devices and systems. However, to date, most well-established OMSs are static, featuring well-defined optical responses determined by OMS configurations set during their fabrication. Dynamic…
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Optical metasurfaces (OMSs) have shown unprecedented capabilities for versatile wavefront manipulations at the subwavelength scale, thus opening fascinating perspectives for next generation ultracompact optical devices and systems. However, to date, most well-established OMSs are static, featuring well-defined optical responses determined by OMS configurations set during their fabrication. Dynamic OMS configurations investigated so far by using controlled constituent materials or geometrical parameters often exhibit specific limitations and reduced reconfigurability. Here, by combining a thin-film piezoelectric micro-electro-mechanical system (MEMS) with a gap-surface plasmon based OMS, we develop an electrically driven dynamic MEMS-OMS platform that offers controllable phase and amplitude modulation of the reflected light by finely actuating the MEMS mirror. Using this platform, we demonstrate MEMS-OMS components for polarization-independent beam steering and two-dimensional focusing with high modulation efficiencies (~ 50%), broadband operation (~ 20% near the operating wavelength of 800 nm) and fast responses (< 0.4 ms). The developed MEMS-OMS platform offers flexible solutions for realizing complex dynamic 2D wavefront manipulations that could be used in reconfigurable and adaptive optical networks and systems.
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Submitted 21 January, 2021;
originally announced January 2021.
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Towards High Throughput Large Area Metalens Fabrication using UV-Nanoimprint lithography and Bosch Deep Reactive Ion Etching
Authors:
Christopher A. Dirdal,
Geir Uri Jensen,
Hallvard Angelskår,
Paul Conrad Vaagen Thrane,
Jo Gjessing,
Daniel Alfred Ordnung
Abstract:
We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by use of standard industrial high throughput silicon processing techniques: UV Nano Imprint Lithography (UV-NIL) combined with continuous Reactive Ion Etching (RIE) and pulsed Bosch Deep Reactive Ion Etching (DRIE). As the research field of metasurfaces moves towards applications these techniques are relev…
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We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by use of standard industrial high throughput silicon processing techniques: UV Nano Imprint Lithography (UV-NIL) combined with continuous Reactive Ion Etching (RIE) and pulsed Bosch Deep Reactive Ion Etching (DRIE). As the research field of metasurfaces moves towards applications these techniques are relevant as potential replacements of commonly used cost-intensive fabrication methods utilizing Electron Beam Lithography. We show that washboard-type sidewall surface roughness arising from the Bosch DRIE process can be compensated for in the design of the metasurface, without deteriorating lens quality. Particular attention is given to fabrication challenges that must be overcome towards high throughput production of relevance to commercial applications. Lens efficiencies are measured to be 30% and 17% at wavelengths λ = 1.55$μ$m and λ = 1.31$μ$m, respectively. A number of routes towards process optimization are proposed in relation to encountered challenges.
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Submitted 21 March, 2020;
originally announced April 2020.
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The Compact Linear Collider (CLIC) - 2018 Summary Report
Authors:
The CLIC,
CLICdp collaborations,
:,
T. K. Charles,
P. J. Giansiracusa,
T. G. Lucas,
R. P. Rassool,
M. Volpi,
C. Balazs,
K. Afanaciev,
V. Makarenko,
A. Patapenka,
I. Zhuk,
C. Collette,
M. J. Boland,
A. C. Abusleme Hoffman,
M. A. Diaz,
F. Garay,
Y. Chi,
X. He,
G. Pei,
S. Pei,
G. Shu,
X. Wang,
J. Zhang
, et al. (671 additional authors not shown)
Abstract:
The Compact Linear Collider (CLIC) is a TeV-scale high-luminosity linear $e^+e^-$ collider under development at CERN. Following the CLIC conceptual design published in 2012, this report provides an overview of the CLIC project, its current status, and future developments. It presents the CLIC physics potential and reports on design, technology, and implementation aspects of the accelerator and the…
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The Compact Linear Collider (CLIC) is a TeV-scale high-luminosity linear $e^+e^-$ collider under development at CERN. Following the CLIC conceptual design published in 2012, this report provides an overview of the CLIC project, its current status, and future developments. It presents the CLIC physics potential and reports on design, technology, and implementation aspects of the accelerator and the detector. CLIC is foreseen to be built and operated in stages, at centre-of-mass energies of 380 GeV, 1.5 TeV and 3 TeV, respectively. CLIC uses a two-beam acceleration scheme, in which 12 GHz accelerating structures are powered via a high-current drive beam. For the first stage, an alternative with X-band klystron powering is also considered. CLIC accelerator optimisation, technical developments and system tests have resulted in an increased energy efficiency (power around 170 MW) for the 380 GeV stage, together with a reduced cost estimate at the level of 6 billion CHF. The detector concept has been refined using improved software tools. Significant progress has been made on detector technology developments for the tracking and calorimetry systems. A wide range of CLIC physics studies has been conducted, both through full detector simulations and parametric studies, together providing a broad overview of the CLIC physics potential. Each of the three energy stages adds cornerstones of the full CLIC physics programme, such as Higgs width and couplings, top-quark properties, Higgs self-coupling, direct searches, and many precision electroweak measurements. The interpretation of the combined results gives crucial and accurate insight into new physics, largely complementary to LHC and HL-LHC. The construction of the first CLIC energy stage could start by 2026. First beams would be available by 2035, marking the beginning of a broad CLIC physics programme spanning 25-30 years.
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Submitted 6 May, 2019; v1 submitted 14 December, 2018;
originally announced December 2018.
