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A systematic study to investigate the effects of X-ray exposure on electrical properties of silicon dioxide thin films using X-ray photoelectron spectroscopy
Authors:
Carlos Munoz,
Thomas Iken,
Nuri Oncel
Abstract:
X-ray Photoelectron Spectroscopy (XPS) is generally used for chemical analysis of surfaces and interfaces. This method involves the analysis of changes in binding energies and peak shapes of elements under consideration. It is also possible to use XPS to study the effect of X-ray radiation on the electrical properties of thin films. We measured the Si 2p peak using X-ray powers of 300 W and 150 W…
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X-ray Photoelectron Spectroscopy (XPS) is generally used for chemical analysis of surfaces and interfaces. This method involves the analysis of changes in binding energies and peak shapes of elements under consideration. It is also possible to use XPS to study the effect of X-ray radiation on the electrical properties of thin films. We measured the Si 2p peak using X-ray powers of 300 W and 150 W on approximately 135 nm silicon dioxide (SiO2) thin films grown on both n- and p-type substrates while applying DC or AC external biases. Using the shifts in the binding energy of the Si 2p peak, we calculated the resistances and the capacitances of the SiO2 thin film. The way that the binding energies of the Si 2p peak and the capacitance of the thin film change as a function of the type of Si substrate and the power of the X-ray are explained using band bending.
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Submitted 21 March, 2024;
originally announced March 2024.
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Probing Electrical Properties of A Silicon Nanocrystal Thin Film Using X-ray Photoelectron Spectroscopy
Authors:
Amrit Laudari,
Sameera Pathiranage,
Salim A. Thomas,
Reed J. Petersen,
Kenneth J. Anderson,
Todd A. Pringle,
Erik K. Hobbie,
Nuri Oncel
Abstract:
We performed X-ray photoelectron spectroscopy (XPS) measurements on a thin film of Si nanocrystals (SiNCs) while applying DC or AC external biases to extract the resistance and the capacitance of the thin film. The measurement consists of the application of 10 V DC or square wave pulses of 10 V amplitude to the sample at various frequencies ranging from 0.01 Hz to 1 MHz while recording X-ray photo…
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We performed X-ray photoelectron spectroscopy (XPS) measurements on a thin film of Si nanocrystals (SiNCs) while applying DC or AC external biases to extract the resistance and the capacitance of the thin film. The measurement consists of the application of 10 V DC or square wave pulses of 10 V amplitude to the sample at various frequencies ranging from 0.01 Hz to 1 MHz while recording X-ray photoemission data. To analyze the data, we propose three different models with varying degrees of accuracy. The calculated capacitance of SiNCs agrees with the experimental value in the literature.
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Submitted 21 March, 2024;
originally announced March 2024.
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A Multidisciplinary Undergraduate Nanoscience and Nanotechnology Program at the University of North Dakota
Authors:
Naima Kaabouch,
Deborah Worley,
Matt Cavalli,
Kanishka Marasinghe,
Nuri Oncel,
David Pierce,
Brian Tande,
Julia Zhao
Abstract:
This paper describes some of the results of a National Science Foundation Nanotechnology Undergraduate Education project that aims to establish a nanoscience and nanotechnology program at the University of North Dakota. The goal is to generate new interest in nanoscience and nanotechnology among engineering and science students and prepare them with the knowledge and skills necessary for the next…
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This paper describes some of the results of a National Science Foundation Nanotechnology Undergraduate Education project that aims to establish a nanoscience and nanotechnology program at the University of North Dakota. The goal is to generate new interest in nanoscience and nanotechnology among engineering and science students and prepare them with the knowledge and skills necessary for the next generation of graduates to compete in the global market and contribute to the nanoscience and nanotechnology field. The project explored several aspects of student learning, including students motivations for investigating nanotechnology through interdisciplinary coursework. To collect this information, a survey was administered to students who enrolled to two nanoscience and nanotechnology courses. Data collected from the survey will be used to improve the design and delivery of future courses as part of constructing a complete nanoscience and nanotechnology curriculum.
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Submitted 24 January, 2018;
originally announced January 2018.
