Elucidating the active phases of CoOx films on Au(111) in the CO Oxidation Reaction
Authors:
Hao Chen,
Lorenz J. Falling,
Heath Kersell,
George Yan,
Xiao Zhao,
Judit Oliver-Meseguer,
Slavomir Nemsak,
Adrian Hunt,
Iradwikanari Waluyo,
Hirohito Ogasawara,
Alexis Bell,
Philippe Sautet,
Miquel Salmeron
Abstract:
Using CoOx thin films supported on Au(111) single crystal surfaces as model catalysts for the CO oxidation reaction we show that three reaction regimes exist in response to chemical and topographic restructuring of the CoOx catalyst as a function of reactant gas phase CO/O2 stoichiometry a finding that highlights the versatility of catalysts and their evolution in response to reaction conditions.…
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Using CoOx thin films supported on Au(111) single crystal surfaces as model catalysts for the CO oxidation reaction we show that three reaction regimes exist in response to chemical and topographic restructuring of the CoOx catalyst as a function of reactant gas phase CO/O2 stoichiometry a finding that highlights the versatility of catalysts and their evolution in response to reaction conditions. Under oxygen-lean conditions and moderate temperatures (below 150C degrees) partially oxidized films containing CoO were found to be efficient catalysts. In contrast, stoichiometric CoO films containing only Co2+ form carbonates in the presence of CO that poison the reaction below 300 C degrees. Under oxygen-rich conditions a more oxidized catalyst phase forms containing Co3+ species that is effective in a wide temperature range. Resonant photoemission spectroscopy (ResPES) revealed the unique role of Co3+ sites in catalyzing the CO oxidation. DFT calculations provided deeper insights into the pathway and free energy barriers for the reactions on these oxide phases.
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Submitted 26 April, 2023;
originally announced April 2023.
Near total reflection X-ray photoelectron spectroscopy: Quantifying chemistry at solid/liquid and solid/solid interfaces
Authors:
Henrique P. Martins,
Giuseppina Conti,
Isvar Cordova,
Lorenz Falling,
Heath Kersell,
Farhad Salmassi,
Eric Gullikson,
Inna Vishik,
Christoph Baeumer,
Patrick Naulleau,
Claus M. Schneider,
Slavomir Nemsak
Abstract:
Near total reflection regime has been widely used in X-ray science, specifically in grazing incidence small angle X-ray scattering and in hard X-ray photoelectron spectroscopy. In this work, we introduce some practical aspects of using near total reflection in ambient pressure X-ray photoelectron spectroscopy and apply this technique to study chemical concentration gradients in a substrate/photore…
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Near total reflection regime has been widely used in X-ray science, specifically in grazing incidence small angle X-ray scattering and in hard X-ray photoelectron spectroscopy. In this work, we introduce some practical aspects of using near total reflection in ambient pressure X-ray photoelectron spectroscopy and apply this technique to study chemical concentration gradients in a substrate/photoresist system. Experimental data are accompanied by X-ray optical and photoemission simulations to quantitatively probe the photoresist and the interface with the depth accuracy of ~1 nm. Together, our calculations and experiments confirm that near total reflection X-ray photoelectron spectroscopy is a suitable method to extract information from buried interfaces with highest depth-resolution, which can help address open research questions regarding our understanding of concentration profiles, electrical gradients, and charge transfer phenomena at such interfaces. The presented methodology is especially attractive for solid/liquid interface studies, since it provides all the strengths of a Bragg-reflection standing-wave spectroscopy without the need of an artificial multilayer mirror serving as a standing wave generator, thus dramatically simplifying the sample synthesis.
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Submitted 13 August, 2021;
originally announced August 2021.
