Hydrogen plasma inhibits ion beam restructuring of materials
Authors:
John A. Scott,
James Bishop,
Garrett Budnik,
Milos Toth
Abstract:
Focused ion beam (FIB) techniques are employed widely for nanofabrication, and processing of materials and devices. However, ion irradiation often gives rise to severe damage due to atomic displacements that cause defect formation, migration and clustering within the ion-solid interaction volume. The resulting restructuring degrades the functionality of materials, and limits the utility FIB ablati…
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Focused ion beam (FIB) techniques are employed widely for nanofabrication, and processing of materials and devices. However, ion irradiation often gives rise to severe damage due to atomic displacements that cause defect formation, migration and clustering within the ion-solid interaction volume. The resulting restructuring degrades the functionality of materials, and limits the utility FIB ablation and nanofabrication techniques. Here we show that such restructuring can be inhibited by performing FIB irradiation in a hydrogen plasma environment via chemical pathways that modify defect binding energies and transport kinetics, as well as material ablation rates. The method is minimally-invasive and has the potential to greatly expand the utility of FIB nanofabrication techniques in processing of functional materials and devices.
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Submitted 17 April, 2024;
originally announced April 2024.
Nanoscale 3D tomography by in-flight fluorescence spectroscopy of atoms sputtered by a focused ion beam
Authors:
Garrett Budnik,
John Scott,
Chengge Jiao,
Mostafa Maazouz,
Galen Gledhill,
Lan Fu,
Hark Hoe Tan,
Milos Toth
Abstract:
Nanoscale fabrication and characterisation techniques critically underpin a vast range of fields, including materials science, nanoelectronics and nanobiotechnology. Focused ion beam (FIB) techniques are particularly appealing due to their high spatial resolution and widespread use for processing of nanostructured materials and devices. Here, we introduce FIB-induced fluorescence spectroscopy (FIB…
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Nanoscale fabrication and characterisation techniques critically underpin a vast range of fields, including materials science, nanoelectronics and nanobiotechnology. Focused ion beam (FIB) techniques are particularly appealing due to their high spatial resolution and widespread use for processing of nanostructured materials and devices. Here, we introduce FIB-induced fluorescence spectroscopy (FIB-FS) as a nanoscale technique for spectroscopic detection of atoms sputtered by an ion beam. We use semiconductor heterostructures to demonstrate nanoscale lateral and depth resolution and show that it is limited by ion-induced intermixing of nanostructured materials. Sensitivity is demonstrated qualitatively by depth-profiling of 3.5, 5 and 8 nm quantum wells, and quantitatively by detection of trace-level impurities present at parts-per-million levels. To showcase the utility of the FIB-FS technique, we use it to characterise quantum wells and Li-ion batteries. Our work introduces FIB-FS as a high-resolution, high sensitivity, 3D analysis and tomography technique that combines the versatility of FIB nanofabrication techniques with the power of diffraction-unlimited fluorescence spectroscopy. It is applicable to all elements in the periodic table, and enables real-time analysis during direct-write nanofabrication by focused ion beams.
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Submitted 21 June, 2022;
originally announced June 2022.
