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Superconducting Vacuum-Gap Crossovers for High Performance Microwave Applications
Authors:
Kevin L. Denis,
Ari D. Brown,
Meng-** Chang,
Ron Hu,
Kongpop U-Yen,
Edward Wollack
Abstract:
The design and fabrication of low-loss wide-bandwidth superconducting vacuum-gap crossovers for high performance millimeter wave applications are described. In order to reduce ohmic and parasitic losses at millimeter wavelengths a vacuum gap is preferred relative to dielectric spacer. Here, vacuum-gap crossovers were realized by using a sacrificial polymer layer followed by niobium sputter deposit…
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The design and fabrication of low-loss wide-bandwidth superconducting vacuum-gap crossovers for high performance millimeter wave applications are described. In order to reduce ohmic and parasitic losses at millimeter wavelengths a vacuum gap is preferred relative to dielectric spacer. Here, vacuum-gap crossovers were realized by using a sacrificial polymer layer followed by niobium sputter deposition optimized for coating coverage over an underlying niobium signal layer. Both coplanar waveguide and microstrip crossover topologies have been explored in detail. The resulting fabrication process is compatible with a bulk micro-machining process for realizing waveguide coupled detectors, which includes sacrificial wax bonding, and wafer backside deep reactive ion etching for creation of leg isolated silicon membrane structures. Release of the vacuum gap structures along with the wax bonded wafer after DRIE is implemented in the same process step used to complete the detector fabrication
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Submitted 4 October, 2016;
originally announced October 2016.
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Infrared dielectric properties of low-stress silicon oxide
Authors:
Giuseppe Cataldo,
Edward J. Wollack,
Ari D. Brown,
Kevin H. Miller
Abstract:
Silicon oxide thin films play an important role in the realization of optical coatings and high-performance electrical circuits. Estimates of the dielectric function in the far- and mid-infrared regime are derived from the observed transmittance spectrum for a commonly employed low-stress silicon oxide formulation. The experimental, modeling, and numerical methods used to extract the dielectric fu…
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Silicon oxide thin films play an important role in the realization of optical coatings and high-performance electrical circuits. Estimates of the dielectric function in the far- and mid-infrared regime are derived from the observed transmittance spectrum for a commonly employed low-stress silicon oxide formulation. The experimental, modeling, and numerical methods used to extract the dielectric function are presented.
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Submitted 15 March, 2016;
originally announced March 2016.
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Analysis and calibration techniques for superconducting resonators
Authors:
Giuseppe Cataldo,
Edward J. Wollack,
Emily M. Barrentine,
Ari D. Brown,
Samuel H. Moseley,
Kongpop U-Yen
Abstract:
A method is proposed and experimentally explored for in-situ calibration of complex transmission data for superconducting microwave resonators. This cryogenic calibration method accounts for the instrumental transmission response between the vector network analyzer reference plane and the device calibration plane. Once calibrated, the observed resonator response is analyzed in detail by two approa…
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A method is proposed and experimentally explored for in-situ calibration of complex transmission data for superconducting microwave resonators. This cryogenic calibration method accounts for the instrumental transmission response between the vector network analyzer reference plane and the device calibration plane. Once calibrated, the observed resonator response is analyzed in detail by two approaches. The first, a phenomenological model based on physically realizable rational functions, enables the extraction of multiple resonance frequencies and widths for coupled resonators without explicit specification of the circuit network. In the second, an ABCD-matrix representation for the distributed transmission line circuit is used to model the observed response from the characteristic impedance and propagation constant. When used in conjunction with electromagnetic simulations, the kinetic inductance fraction can be determined with this method with an accuracy of 2%. Datasets for superconducting microstrip and coplanar-waveguide resonator devices were investigated and a recovery within 1% of the observed complex transmission amplitude was achieved with both analysis approaches. The experimental configuration used in microwave characterization of the devices and self-consistent constraints for the electromagnetic constitutive relations for parameter extraction are also presented.
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Submitted 4 December, 2014; v1 submitted 5 November, 2014;
originally announced November 2014.
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Dose-response curve of EBT, EBT2, and EBT3 radiochromic films to synchrotron-produced monochromatic x-ray beams
Authors:
Thomas A. D. Brown,
Kenneth R. Hogstrom,
Diane Alvarez,
Kenneth L. Matthews II,
Kyungmin Ham,
Joseph P. Dugas
Abstract:
This work investigates the dose-response curves of GAFCHROMIC EBT, EBT2, and EBT3 radiochromic films using synchrotron-produced monochromatic x-ray beams. EBT2 film is being utilized for dose verification in photoactivated Auger electron therapy at the Louisiana State University CAMD synchrotron facility. Monochromatic beams of 25, 30, and 35 keV were generated on the tomography beamline at CAMD.…
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This work investigates the dose-response curves of GAFCHROMIC EBT, EBT2, and EBT3 radiochromic films using synchrotron-produced monochromatic x-ray beams. EBT2 film is being utilized for dose verification in photoactivated Auger electron therapy at the Louisiana State University CAMD synchrotron facility. Monochromatic beams of 25, 30, and 35 keV were generated on the tomography beamline at CAMD. Ion chamber depth-dose measurements were used to determine the dose delivered to films irradiated at depths from 0.7 to 8.5 cm in a 10x10x10-cm3 PMMA phantom. AAPM TG-61 protocol was applied to convert measured ionization into dose. Films were digitized using an Epson 1680 Professional flatbed scanner and analyzed using the net optical density (NOD) derived from the red channel. A dose-response curve was obtained at 35 keV for EBT film, and at 25, 30, and 35 keV for EBT2 and EBT3 films. Calibrations of films for 4 MV x-rays were obtained for comparison using a radiotherapy accelerator at Mary Bird Perkins Cancer Center. The sensitivity (NOD per unit dose) of EBT film at 35 keV relative to that for 4-MV x-rays was 0.73 and 0.76 for doses 50 and 100 cGy, respectively. The sensitivity of EBT2 film at 25, 30, and 35 keV relative to that for 4-MV x-rays varied from 1.09 - 1.07, 1.23 - 1.17, and 1.27 - 1.19 for doses 50 - 200 cGy, respectively. For EBT3 film the relative sensitivity was within 3% of unity for all three monochromatic x-ray beams. EBT and EBT2 film sensitivity showed strong energy dependence over an energy range of 25 keV - 4 MV, although this dependence becomes weaker for larger doses. EBT3 film shows weak energy dependence, indicating that it would be a better dosimeter for kV x-ray beams where beam hardening effects can result in large changes in the effective energy.
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Submitted 4 December, 2012;
originally announced December 2012.
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Verification of TG-61 dose for synchrotron-produced monochromatic x-ray beams using fluence-normalized MCNP5 calculations
Authors:
Thomas A. D. Brown,
Kenneth R. Hogstrom,
Diane Alvarez,
Kenneth L. Matthews II,
Kyungmin Ham
Abstract:
Ion chamber dosimetry is being used to calibrate dose for cell irradiations designed to investigate photoactivated Auger electron therapy at the Louisiana State University CAMD synchrotron facility. This study performed a dosimetry intercomparison for synchrotron-produced monochromatic x-ray beams at 25 and 35 keV. Ion chamber depth-dose measurements in a PMMA phantom were compared with the produc…
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Ion chamber dosimetry is being used to calibrate dose for cell irradiations designed to investigate photoactivated Auger electron therapy at the Louisiana State University CAMD synchrotron facility. This study performed a dosimetry intercomparison for synchrotron-produced monochromatic x-ray beams at 25 and 35 keV. Ion chamber depth-dose measurements in a PMMA phantom were compared with the product of MCNP5 Monte Carlo calculations of dose per fluence and measured incident fluence. Monochromatic beams of 25 and 35 keV were generated on the tomography beamline at CAMD. A cylindrical, air-equivalent ion chamber was used to measure the ionization created in a 10x10x10-cm3 PMMA phantom for depths from 0.6 to 7.7 cm. The American Association of Physicists in Medicine TG-61 protocol was applied to convert measured ionization into dose. Photon fluence was determined using a NaI detector to make scattering measurements of the beam from a thin polyethylene target at angles 30 degrees to 60 degrees. Differential Compton and Rayleigh scattering cross sections obtained from xraylib, an ANSI C library for x-ray-matter interactions, were applied to derive the incident fluence. MCNP5 simulations of the irradiation geometry provided the dose deposition per photon fluence as a function of depth in the phantom. At 25 keV the fluence-normalized MCNP5 dose overestimated the ion-chamber measured dose by an average of 7.2+/-3.0% to 2.1+/-3.0% for PMMA depths from 0.6 to 7.7 cm, respectively. At 35 keV the fluence-normalized MCNP5 dose underestimated the ion-chamber measured dose by an average of 1.0+/-3.4% to 2.5+/-3.4%, respectively. These results showed that TG-61 ion chamber dosimetry, used to calibrate dose output for cell irradiations, agreed with fluence-normalized MCNP5 calculations to within approximately 7% and 3% at 25 and 35 keV, respectively.
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Submitted 4 December, 2012;
originally announced December 2012.
