Showing 1–2 of 2 results for author: Amaladass, E P
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Growth of large-sized relaxor ferroelectric PZN-PT single crystals by modified flux growth method
Authors:
P. Vijayakumar,
C. Manikandan,
R. M. Sarguna,
Edward Prabu Amaladass,
K. Ganesan,
Varsha Roy,
E. Varadarajan,
S. Ganesamoorthy
Abstract:
A novel bottom-cooling high-temperature solution growth technique is developed for growing large-sized relaxor ferroelectric 0.91Pb(Zn1/3Nb2/3O3)-0.09PbTiO3 (PZN-PT) single crystals. During the growth, an inverse temperature gradient is maintained in the crucible base by flowing air at a controlled rate. This method restricts the number of spontaneously nucleated crystals at crucible bottom, reduc…
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A novel bottom-cooling high-temperature solution growth technique is developed for growing large-sized relaxor ferroelectric 0.91Pb(Zn1/3Nb2/3O3)-0.09PbTiO3 (PZN-PT) single crystals. During the growth, an inverse temperature gradient is maintained in the crucible base by flowing air at a controlled rate. This method restricts the number of spontaneously nucleated crystals at crucible bottom, reduces loss of volatile PbO component and favours the growth of large-sized PZN-PT single crystals. Large-sized PZN-PT single crystals of dimensions ~ 22x20x14 mm3 are reproducibly grown by the proposed method. The electrical characteristics of the PZN-PT wafers oriented along the <100>, <010> and <001> directions are investigated. PZN-PT wafers oriented along the <001> direction exhibited superior piezoelectric coefficient (d33) of ~ 2221 pm/V. The homogeneity of the physical parameters is analysed by preparing 10 elements with dimensions of ~5x2.5x2.5 mm3 which were cut from single wafer oriented along the <001> direction. The ferro-, piezo- and dielectric characteristics of these wafers were found to be highly uniform with small standard deviation. The observation of d33 value with less than 2 % deviation from mean value confirms the growth of high quality PZN-PT single crystals.
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Submitted 11 December, 2023;
originally announced December 2023.
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Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films
Authors:
Shilpam Sharma,
Abhirami S.,
E. P. Amaladass,
Awadhesh Mani
Abstract:
Negative bias on substrate during DC sputter deposition of nano-crystalline molybdenum thin films has been utilized to tune their properties for solar cells and the cryogenic radiation detector applications. Films have been deposited on Si substrates under different out of plane negative biases aiming to improve their physical properties such as the sheet resistance, superconducting transition tem…
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Negative bias on substrate during DC sputter deposition of nano-crystalline molybdenum thin films has been utilized to tune their properties for solar cells and the cryogenic radiation detector applications. Films have been deposited on Si substrates under different out of plane negative biases aiming to improve their physical properties such as the sheet resistance, superconducting transition temperature, width of transition and surface roughness. Significant modifications in the electrical and surface morphological properties of nano-crystalline Mo thin films have been reported. The superconducting transition temperature and crystallite size of the films does not show much improvement but the surface roughness and electrical resistivity of the film have been improved by the application of substrate bias.
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Submitted 23 July, 2018;
originally announced July 2018.
