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Design and Comparative Analysis of a Two-Stage Ultra-Low-Power Subthreshold Operational Amplifier in 180nm, 90nm, and 45nm technology
Abstract: In this paper, a two-stage ultra-low-power operational amplifier is designed, and a comparative analysis of the proposed subthreshold complementary amplifier is presented between 180nm, 90nm, and 45nm CMOS technology. The proposed operational amplifier is compared across several different parameters to determine the optimal design. It achieves a maximum gain of around 75 dB and a phase margin of 7… ▽ More
Submitted 22 December, 2020; originally announced December 2020.
Comments: 5 pages, 5 figures, 5 tables. This work has been submitted to the IEEE for possible publication. Copyright may be transferred without notice, after which this version may no longer be accessible