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Showing 1–6 of 6 results for author: Heistracher, C

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  1. arXiv:2307.08461  [pdf, ps, other

    cs.AI

    Towards eXplainable AI for Mobility Data Science

    Authors: Anahid Jalali, Anita Graser, Clemens Heistracher

    Abstract: This paper presents our ongoing work towards XAI for Mobility Data Science applications, focusing on explainable models that can learn from dense trajectory data, such as GPS tracks of vehicles and vessels using temporal graph neural networks (GNNs) and counterfactuals. We review the existing GeoXAI studies, argue the need for comprehensible explanations with human-centered approaches, and outline… ▽ More

    Submitted 7 September, 2023; v1 submitted 17 July, 2023; originally announced July 2023.

    Comments: 4 pages

    ACM Class: F.2.2

  2. arXiv:2304.11101  [pdf

    cs.LG

    Federated Learning for Predictive Maintenance and Quality Inspection in Industrial Applications

    Authors: Viktorija Pruckovskaja, Axel Weissenfeld, Clemens Heistracher, Anita Graser, Julia Kafka, Peter Leputsch, Daniel Schall, Jana Kemnitz

    Abstract: Data-driven machine learning is playing a crucial role in the advancements of Industry 4.0, specifically in enhancing predictive maintenance and quality inspection. Federated learning (FL) enables multiple participants to develop a machine learning model without compromising the privacy and confidentiality of their data. In this paper, we evaluate the performance of different FL aggregation method… ▽ More

    Submitted 21 April, 2023; originally announced April 2023.

  3. arXiv:2209.11464  [pdf, other

    cs.LG

    Smart Active Sampling to enhance Quality Assurance Efficiency

    Authors: Clemens Heistracher, Stefan Stricker, Pedro Casas, Daniel Schall, Jana Kemnitz

    Abstract: We propose a new sampling strategy, called smart active sapling, for quality inspections outside the production line. Based on the principles of active learning a machine learning model decides which samples are sent to quality inspection. On the one hand, this minimizes the production of scrap parts due to earlier detection of quality violations. On the other hand, quality inspection costs are re… ▽ More

    Submitted 23 September, 2022; originally announced September 2022.

  4. arXiv:2205.15145  [pdf, other

    cs.LG

    Machine Learning Methods for Health-Index Prediction in Coating Chambers

    Authors: Clemens Heistracher, Anahid Jalali, Jürgen Schneeweiss, Klaudia Kovacs, Catherine Laflamme, Bernhard Haslhofer

    Abstract: Coating chambers create thin layers that improve the mechanical and optical surface properties in jewelry production using physical vapor deposition. In such a process, evaporated material condensates on the walls of such chambers and, over time, causes mechanical defects and unstable processes. As a result, manufacturers perform extensive maintenance procedures to reduce production loss. Current… ▽ More

    Submitted 30 May, 2022; originally announced May 2022.

  5. arXiv:2110.04049  [pdf, other

    cs.LG cs.AI eess.SP

    Minimal-Configuration Anomaly Detection for IIoT Sensors

    Authors: Clemens Heistracher, Anahid Jalali, Axel Suendermann, Sebastian Meixner, Daniel Schall, Bernhard Haslhofer, Jana Kemnitz

    Abstract: The increasing deployment of low-cost IoT sensor platforms in industry boosts the demand for anomaly detection solutions that fulfill two key requirements: minimal configuration effort and easy transferability across equipment. Recent advances in deep learning, especially long-short-term memory (LSTM) and autoencoders, offer promising methods for detecting anomalies in sensor data recordings. We c… ▽ More

    Submitted 8 October, 2021; originally announced October 2021.

    Comments: This paper is accepted at the Industrial Track IDSC https://idsc.at/. The link to the publication and final version will follow as so the paper is published by Springer

  6. arXiv:1904.07686  [pdf, other

    cs.LG stat.ML

    Predicting Time-to-Failure of Plasma Etching Equipment using Machine Learning

    Authors: Anahid Jalali, Clemens Heistracher, Alexander Schindler, Bernhard Haslhofer, Tanja Nemeth, Robert Glawar, Wilfried Sihn, Peter De Boer

    Abstract: Predicting unscheduled breakdowns of plasma etching equipment can reduce maintenance costs and production losses in the semiconductor industry. However, plasma etching is a complex procedure and it is hard to capture all relevant equipment properties and behaviors in a single physical model. Machine learning offers an alternative for predicting upcoming machine failures based on relevant data poin… ▽ More

    Submitted 16 April, 2019; originally announced April 2019.

    Comments: 8 pages, 10 figures, accepted in IEEEE/PHM 2019 Conference