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Observation of First-Order Metal-Insulator Transition without Structural Phase Transition in VO_2
Authors:
Yong-Sik Lim,
Hyun-Tak Kim,
B. G. Chae,
D. H. Youn,
K. O. Kim,
K. Y. Kang,
S. J. Lee,
K. Kim
Abstract:
An abrupt first-order metal-insulator transition (MIT) without structural phase transition is first observed by current-voltage measurements and micro-Raman scattering experiments, when a DC electric field is applied to a Mott insulator VO_2 based two-terminal device. An abrupt current jump is measured at a critical electric field. The Raman-shift frequency and the bandwidth of the most predomin…
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An abrupt first-order metal-insulator transition (MIT) without structural phase transition is first observed by current-voltage measurements and micro-Raman scattering experiments, when a DC electric field is applied to a Mott insulator VO_2 based two-terminal device. An abrupt current jump is measured at a critical electric field. The Raman-shift frequency and the bandwidth of the most predominant Raman-active A_g mode, excited by the electric field, do not change through the abrupt MIT, while, they, excited by temperature, pronouncedly soften and damp (structural MIT), respectively. This structural MIT is found to occur secondarily.
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Submitted 22 February, 2004; v1 submitted 18 February, 2004;
originally announced February 2004.
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Temperature dependence and control of the Mott transition in VO_2 based devices
Authors:
Hyun-Tak Kim,
B. G. Chae,
D. H. Youn,
S. L. Maeng,
K. Y. Kang
Abstract:
The transition voltage of an abrupt metal-insulator transition (MIT), observed by applying an electric field to two-terminal devices fabricated on a Mott insulator VO_2 film, decreases with increasing temperature up to 334K. The abrupt current jump disappears above 334 K near the MIT temperature. These results suggest that the mechanism of the abrupt MIT induced by temperature is the same as tha…
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The transition voltage of an abrupt metal-insulator transition (MIT), observed by applying an electric field to two-terminal devices fabricated on a Mott insulator VO_2 film, decreases with increasing temperature up to 334K. The abrupt current jump disappears above 334 K near the MIT temperature. These results suggest that the mechanism of the abrupt MIT induced by temperature is the same as that by an electric field. The magnitude of the current jump (a large current) decreases with increasing external resistance; this is an important observation in terms of applying the abrupt MIT to device applications. Furthermore, the temperature and resistance dependence of the MIT cannot be explained by the dielectric breakdown although a current jump known as breakdown is similar to that observed in an abrupt MIT.
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Submitted 2 December, 2003;
originally announced December 2003.
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Fabrication and Electrical Properties of Pure VO2 Phase Films
Authors:
B. G. Chae,
D. H. Youn,
H. T. Kim,
S. Y. Maeng,
K. Y. Kang
Abstract:
We have grown VO2 thin films by laser ablation for electronic device applications. In obtaining the thin films of the pure VO2 phase, oxygen partial pressure is a critical parameter because vanadium oxides have several phases with the oxygen concentration. It is found that the pure VO2 films are epitaxially grown on Al2O3 substrate in the narrow ranges of 55-60 mTorr in an Ar+10% O2 ambient, and…
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We have grown VO2 thin films by laser ablation for electronic device applications. In obtaining the thin films of the pure VO2 phase, oxygen partial pressure is a critical parameter because vanadium oxides have several phases with the oxygen concentration. It is found that the pure VO2 films are epitaxially grown on Al2O3 substrate in the narrow ranges of 55-60 mTorr in an Ar+10% O2 ambient, and that the mixed phase films are synthesized when the deposition pressure slightly deviates from the optimum pressure. The (100) oriented VO2 films undergo an abrupt metal-insulator transition (MIT) with resistance change of an order of 104 at 338K. In the films of mixed phases, the small change of the resistance is observed at the same temperature. The polycrystalline films grown on SiO2/Si substrate undergo a broaden MIT of the resistance. Furthermore, the abrupt MIT and collective current motion appearing in metal are observed when the electric field is applied to the film.
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Submitted 28 November, 2003; v1 submitted 26 November, 2003;
originally announced November 2003.
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Observation of Mott Transition in VO_2 Based Transistors
Authors:
Hyun-Tak Kim,
B. G. Chae,
D. H. Youn,
S. L. Maeng,
K. Y. Kang
Abstract:
An abrupt Mott metal-insulator transition (MIT) rather than the continuous Hubbard MIT near a critical on-site Coulomb energy U/U_c=1 is observed for the first time in VO_2, a strongly correlated material, by inducing holes of about 0.018% into the conduction band. As a result, a discontinuous jump of the density of states on the Fermi surface is observed and inhomogeneity inevitably occurs. The…
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An abrupt Mott metal-insulator transition (MIT) rather than the continuous Hubbard MIT near a critical on-site Coulomb energy U/U_c=1 is observed for the first time in VO_2, a strongly correlated material, by inducing holes of about 0.018% into the conduction band. As a result, a discontinuous jump of the density of states on the Fermi surface is observed and inhomogeneity inevitably occurs. The gate effect in fabricated transistors is clear evidence that the abrupt MIT is induced by the excitation of holes.
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Submitted 3 August, 2003;
originally announced August 2003.
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Gate-Induced Mott Transition
Authors:
Hyun-Tak Kim,
B. G. Chae,
D. H. Youn,
S. L. Maeng,
K. Y. Kang
Abstract:
For a strongly correlated material, VO2, near a critical on-site Coulomb energy U/Uc=1, the abrupt Mott metal-insulator transition (MIT) rather than the continuous Hubbard MIT is observed by inducing internal optical phonon-coupled holes (hole inducing of 0.018%) into conduction band, with a gate field of fabricated transistors. Observed gate effects, change of the MIT drain-source voltage cause…
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For a strongly correlated material, VO2, near a critical on-site Coulomb energy U/Uc=1, the abrupt Mott metal-insulator transition (MIT) rather than the continuous Hubbard MIT is observed by inducing internal optical phonon-coupled holes (hole inducing of 0.018%) into conduction band, with a gate field of fabricated transistors. Observed gate effects, change of the MIT drain-source voltage caused by a gate field, are the effect of measurement due to inhomogeneity of channel material and is an average over the measurement region of the true gate effect based on the large conductivity (or effective mass) near the MIT predicted by the Brinkman-Rice picture. A discontinuous gate effect such as digital is observed, which is a characteristic of the transistor and a possible condition of a very high-speed switching transistor.
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Submitted 16 September, 2003; v1 submitted 28 May, 2003;
originally announced May 2003.
