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Demonstration and STEM Analysis of Ferroelectric Switching in MOCVD-Grown Single Crystalline Al$_{0.85}$Sc$_{0.15}$N
Authors:
Niklas Wolff,
Georg Schoenweger,
Isabel Streicher,
Md Redwanul Islam,
Nils Braun,
Patrik Stranak,
Lutz Kirste,
Mario Prescher,
Andriy Lotnyk,
Hermann Kohlstedt,
Stefano Leone,
Lorenz Kienle,
Simon Fichtner
Abstract:
Wurtzite-type Al$_{1-x}$Sc$_x$N solid solutions grown by metal organic chemical vapour deposition are for the first time confirmed to be ferroelectric. The film with 230 nm thickness and x = 0.15 exhibits a coercive field of 5.5 MV/cm at a measurement frequency of 1.5 kHz. Single crystal quality and homogeneous chemical composition of the film was confirmed by X-ray diffraction spectroscopic metho…
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Wurtzite-type Al$_{1-x}$Sc$_x$N solid solutions grown by metal organic chemical vapour deposition are for the first time confirmed to be ferroelectric. The film with 230 nm thickness and x = 0.15 exhibits a coercive field of 5.5 MV/cm at a measurement frequency of 1.5 kHz. Single crystal quality and homogeneous chemical composition of the film was confirmed by X-ray diffraction spectroscopic methods such as time of flight secondary ion mass spectrometry. Annular bright field scanning transmission electron microscopy served to proof the ferroelectric polarization inversion on unit cell level. The single crystal quality further allowed to image the large-scale domain pattern of a wurtzite-type ferroelectric for the first time, revealing a predominantly cone-like domain shape along the c-axis of the material. As in previous work, this again implies the presence of strong polarization discontinuities along this crystallographic axis, which could be suitable for current transport. The domains are separated by narrow domain walls, for which an upper thickness limit of 3 nm was deduced, but which could potentially be atomically sharp. We are confident that these results will advance the commencing integration of wurtzite-type ferroelectrics to GaN as well as generally III-N based heterostructures and devices.
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Submitted 21 December, 2023;
originally announced December 2023.
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In-Grain Ferroelectric Switching in Sub-5 nm Thin AlScN Films at 1 V
Authors:
Georg Schönweger,
Niklas Wolff,
Md Redwanul Islam,
Maike Gremmel,
Adrian Petraru,
Lorenz Kienle,
Hermann Kohlstedt,
Simon Fichtner
Abstract:
Analog switching in ferroelectric devices promises neuromorphic computing with highest energy efficiency, if limited device scalability can be overcome. To contribute to a solution, we report on the ferroelectric switching characteristics of sub-5 nm thin Al$_{0.74}$Sc$_{0.26}$N films grown on Pt/Ti/SiO2/Si and epitaxial Pt/GaN/sapphire templates by sputter-deposition. In this context, we focus on…
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Analog switching in ferroelectric devices promises neuromorphic computing with highest energy efficiency, if limited device scalability can be overcome. To contribute to a solution, we report on the ferroelectric switching characteristics of sub-5 nm thin Al$_{0.74}$Sc$_{0.26}$N films grown on Pt/Ti/SiO2/Si and epitaxial Pt/GaN/sapphire templates by sputter-deposition. In this context, we focus on the following major achievements compared to previously available wurtzite-type ferroelectrics: 1) Record low switching voltages down to 1 V are achieved, which is in a range that can be supplied by standard on-chip voltage sources. 2) Compared to the previously investigated deposition of thinnest Al$_{1-x}$Sc$_x$N films on epitaxial templates, a significantly larger coercive field to breakdown field ratio is observed for Al$_{0.74}$Sc$_{0.26}$N films grown on silicon substrates, the technologically most relevant substrate-type. 3) The formation of true ferroelectric domains in wurtzite-type materials is for the first time demonstrated on the atomic scale by scanning transmission electron microscopy investigations of a sub-5 nm thin partially switched film. The direct observation of inversion domain boundaries within single nm-sized grains supports the theory of a gradual domain-wall motion limited switching process in wurtzite-type ferroelectrics. Ultimately, this should enable the analog switching necessary for mimicking neuromorphic concepts also in highly scaled devices.
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Submitted 6 April, 2023;
originally announced April 2023.
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Control of magnetoelastic coupling in Ni/Fe multilayers using He$^+$ ion irradiation
Authors:
Giovanni Masciocchi,
Johannes Wilhelmus van der Jagt,
Maria-Andromachi Syskaki,
Alessio Lamperti,
Niklas Wolff,
Andriy Lotnyk,
Jürgen Langer,
Lorenz Kienle,
Gerhard Jakob,
Benjamin Borie,
Andreas Kehlberger,
Dafine Ravelosona,
Mathias Kläui
Abstract:
This study reports the effects of post-growth He$^+$ irradiation on the magneto-elastic properties of a $Ni$ /$Fe$ multi-layered stack. The progressive intermixing caused by He$^+$ irradiation at the interfaces of the multilayer allows us to tune the saturation magnetostriction value with increasing He$^+$ fluences, and even to induce a reversal of the sign of the magnetostrictive effect. Addition…
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This study reports the effects of post-growth He$^+$ irradiation on the magneto-elastic properties of a $Ni$ /$Fe$ multi-layered stack. The progressive intermixing caused by He$^+$ irradiation at the interfaces of the multilayer allows us to tune the saturation magnetostriction value with increasing He$^+$ fluences, and even to induce a reversal of the sign of the magnetostrictive effect. Additionally, the critical fluence at which the absolute value of the magnetostriction is dramatically reduced is identified. Therefore insensitivity to strain of the magnetic stack is nearly reached, as required for many applications. All the above mentioned effects are attributed to the combination of the negative saturation magnetostriction of sputtered Ni, Fe layers and the positive magnetostriction of the Ni$_{x}$Fe$_{1-x}$ alloy at the intermixed interfaces, whose contribution is gradually increased with irradiation. Importantly the irradiation does not alter the layers polycrystalline structure, confirming that post-growth He$^+$ ion irradiation is an excellent tool to tune the magneto-elastic properties of magnetic samples. A new class of spintronic devices can be envisioned with a material treatment able to arbitrarily change the magnetostriction with ion-induced "magnetic patterning".
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Submitted 6 July, 2022;
originally announced July 2022.
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Ultrathin AlScN for low-voltage driven ferroelectric-based devices
Authors:
Georg Schönweger,
Md Redwanul Islam,
Niklas Wolff,
Adrian Petraru,
Lorenz Kienle,
Hermann Kohlstedt,
Simon Fichtner
Abstract:
Thickness scaling of ferroelectricity in AlScN is a determining factor for its potential application in neuromorphic computing and memory devices. In this letter, we report on ultrathin (10 nm) Al0.72Sc0.28N films that are ferroelectrically switchable at room temperature. All-epitaxial Al0.72Sc0.28N/Pt heterostructures are grown by magnetron sputtering onto GaN/sapphire substrates followed by an i…
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Thickness scaling of ferroelectricity in AlScN is a determining factor for its potential application in neuromorphic computing and memory devices. In this letter, we report on ultrathin (10 nm) Al0.72Sc0.28N films that are ferroelectrically switchable at room temperature. All-epitaxial Al0.72Sc0.28N/Pt heterostructures are grown by magnetron sputtering onto GaN/sapphire substrates followed by an in situ Pt cap** approach to avoid oxidation of the Al0.72Sc0.28N film surface. Structural characterization by X-ray diffraction and transmission electron microscopy reveals the established epitaxy. The thus obtained high-quality interfaces in combination with the in situ cap** is expected to facilitate ferroelectric switching of AlScN in the ultrathin regime. The analysis of the relative permittivity and coercive field dependence on the Al0.72Sc0.28N film thicknesses in the range of 100 nm down to 10 nm indicates only moderate scaling effects, suggesting that the critical thickness for ferroelectricity is not yet approached. Furthermore, the deposited layer stack demonstrates the possibility of including ultrathin ferroelectric AlScN into all-epitaxial GaN-based devices using sputter deposition techniques. Thus, our work highlights the integration and scaling potential of all-epitaxial ultrathin AlScN offering high storage density paired with low voltage operation desired for state of the art ferroelectric memory devices.
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Submitted 5 July, 2022;
originally announced July 2022.
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On the exceptional temperature stability of ferroelectric AlScN thin films
Authors:
MD Redwanul Islam,
Niklas Wolff,
Mohammed Yassine,
Georg Schönweger,
Björn Christian,
Hermann Kohlstedt,
Oliver Ambacher,
Fabian Lofink,
Lorenz Kienle,
Simon Fichtner
Abstract:
Through its dependence on low symmetry crystal phases, ferroelectricity is inherently a property tied to the lower temperature ranges of the phase diagram for a given material. This paper presents conclusive evidence that in the case of ferroelectric AlScN, low temperature has to be seen as a purely relative term, since its ferroelectric-to-paraelectric transition temperature is confirmed to surpa…
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Through its dependence on low symmetry crystal phases, ferroelectricity is inherently a property tied to the lower temperature ranges of the phase diagram for a given material. This paper presents conclusive evidence that in the case of ferroelectric AlScN, low temperature has to be seen as a purely relative term, since its ferroelectric-to-paraelectric transition temperature is confirmed to surpass 1100°C and thus the transition temperature of virtually any other thin film ferroelectric. We arrived at this conclusion through investigating the structural stability of 0.4 - 2 $μ$m thick Al$_{0.73}$Sc$_{0.27}$N films grown on Mo bottom electrodes via in situ high-temperature X-ray diffraction and permittivity measurements. Our studies reveal the wurtzite-type structure of Al$_{0.73}$Sc$_{0.27}$N is conserved during the entire 1100°C annealing cycle, apparent through a constant c over a lattice parameter ratio. In situ permittivity measurements performed up to 1000°C strongly support this conclusion and include what could be the onset of a diverging permittivity only at the very upper end of the measurement interval. Our in situ measurements are well-supported by ex situ (scanning) transmission electron microscopy and polarization and capacity hysteresis measurements. These results confirm the structural stability on the sub-$μ$m scale next to the stability of the inscribed polarization during the complete 1100°C annealing treatment. Thus, AlScN is the first readily available thin film ferroelectric with a temperature stability that surpasses virtually all thermal budgets occurring in microtechnology, be it during fabrication or the lifetime of a device - even in harshest environments.
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Submitted 18 May, 2021;
originally announced May 2021.
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Phase diagram studies for the growth of (Mg,Zr):SrGa$_{12}$O$_{19}$ crystals
Authors:
Detlef Klimm,
Bartosz Szczefanowicz,
Nora Wolff,
Matthias Bickermann
Abstract:
By differential thermal analysis a concentration field suitable for the growth of Zr, Mg codoped strontium hexagallate crystals was observed that corresponds well with experimental results from Mateika and Laurien, J. Crystal Growth 52 (1981) 566-572. It was shown that the melting point of doped crystal is ca. 60 K higher than that of undoped crystals. This higher melting points indicates hexagall…
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By differential thermal analysis a concentration field suitable for the growth of Zr, Mg codoped strontium hexagallate crystals was observed that corresponds well with experimental results from Mateika and Laurien, J. Crystal Growth 52 (1981) 566-572. It was shown that the melting point of doped crystal is ca. 60 K higher than that of undoped crystals. This higher melting points indicates hexagallate phase stabilization by Zr, Mg codo**, and increases the growth window, compared to undoped SrO-Ga$_2$O$_3$ melts.
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Submitted 30 November, 2020; v1 submitted 28 September, 2020;
originally announced September 2020.
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Growth of CuFeO$_2$ Single Crystals by the Optical Floating-Zone Technique
Authors:
Nora Wolff,
Tobias Schwaigert,
Dietmar Siche,
Darrell G. Schlom,
Detlef Klimm
Abstract:
CuFeO$_2$ single crystals up to 50 mm in length and up to 10 mm in diameter were grown by the optical floating-zone method. Stoichiometric polycrystalline rods with a diameter of 6-12 mm were used as feed materials to produce crystals of sufficient size to be used as substrates for the growth of thin films of delafossites. For stable growth along the $c$-axis, low growth rates of 0.4 mm/h are nece…
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CuFeO$_2$ single crystals up to 50 mm in length and up to 10 mm in diameter were grown by the optical floating-zone method. Stoichiometric polycrystalline rods with a diameter of 6-12 mm were used as feed materials to produce crystals of sufficient size to be used as substrates for the growth of thin films of delafossites. For stable growth along the $c$-axis, low growth rates of 0.4 mm/h are necessary. Due to the incongruent melting behavior of CuFeO$_2$, a stable melt zone requires adjustment of the lamp power during growth. The melting of CuFeO$_2$ is not simply incongruent because the thermodynamic equilibrium includes more than two solid phases and the melt; the gas phase is also involved. The crystals were characterized by X-ray diffraction and X-ray fluorescence measurements.
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Submitted 20 December, 2019;
originally announced December 2019.
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AlScN: A III-V semiconductor based ferroelectric
Authors:
Simon Fichtner,
Niklas Wolff,
Fabian Lofink,
Lorenz Kienle,
Bernhard Wagner
Abstract:
Ferroelectric switching is unambigiously demonstrated for the first time in a III-V semiconductor based material: AlScN -- A discovery which could help to satisfy the urgent demand for thin film ferroelectrics with high performance and good technological compatibility with generic semiconductor technology which arises from a multitude of memory, micro/nano-actuator and emerging applications based…
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Ferroelectric switching is unambigiously demonstrated for the first time in a III-V semiconductor based material: AlScN -- A discovery which could help to satisfy the urgent demand for thin film ferroelectrics with high performance and good technological compatibility with generic semiconductor technology which arises from a multitude of memory, micro/nano-actuator and emerging applications based on controlling electrical polarization. The appearance of ferroelectricity in AlScN can be related to the continuous distortion of the original wurtzite-type crystal structure towards a layered-hexagonal structure with increasing Sc content and tensile strain, which is expected to be extendable to other III-nitride based solid solutions. Coercive fields which are systematically adjustable by more than 3 MV/cm, high remnant polarizations in excess of 100 μC/cm$^2$ which constitute the first experimental estimate of the previously inaccessible spontaneous polarization in a III-nitride based material, an almost ideally square-like hysteresis resulting in excellent piezoelectric linearity over a wide strain interval from -0.3% to +0.4% as well as a paraelectric transition temperature in excess of 600°C are confirmed. This intriguing combination of properties is to our knowledge as of now unprecedented in the field of polycrystalline ferroelectric thin films and promises to significantly advance the commencing integration of ferroelectric functionality to micro- and nanotechnology, while at the same time providing substantial insight to one of the central open questions of the III-nitride semiconductors - that of their actual spontaneous polarization.
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Submitted 26 November, 2018; v1 submitted 18 October, 2018;
originally announced October 2018.
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On melt solutions for the growth of CaTiO$_3$ crystals
Authors:
Detlef Klimm,
Max Schmidt,
Nora Wolff,
Christo Guguschev,
Steffen Ganschow
Abstract:
When calcium titanate crystals are grown from stoichiometric melts, they crystallize in the cubic perovskite structure. Upon cooling to room temperature they undergo subsequent phase transitions to tetragonal and orthorhombic modifications. These phase transitions are disruptive and result in severely damaged crystals. This paper presents differential thermal analysis data for several prospective…
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When calcium titanate crystals are grown from stoichiometric melts, they crystallize in the cubic perovskite structure. Upon cooling to room temperature they undergo subsequent phase transitions to tetragonal and orthorhombic modifications. These phase transitions are disruptive and result in severely damaged crystals. This paper presents differential thermal analysis data for several prospective solvents, with the aim to identify a system offering the possibility to perform crystal growth of undistorted CaTiO$_3$ crystals by crystallizing them significantly below the melting point directly in the low temperature modification. From mixtures CaF$_2$:TiO$_2$:CaTiO$_3$ = 3:1:1 (molar ratio) the growth of undistorted, at least millimeter-sized CaTiO$_3$ crystals is possible.
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Submitted 1 February, 2018; v1 submitted 12 January, 2018;
originally announced January 2018.
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Thermodynamic investigations on the growth of CuAlO$_2$ delafossite crystals
Authors:
Nora Wolff,
Detlef Klimm,
Dietmar Siche
Abstract:
Simultaneous differential thermal analysis (DTA) and thermogravimetric (TG) measurements with copper oxide/aluminum oxide mixtures were performed in atmospheres with varying oxygen partial pressures and with crucibles made of different materials. Only sapphire and platinum crucibles proved to be stable under conditions that are useful for the growth of CuAlO$_2$ delafossite single crystals. Then t…
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Simultaneous differential thermal analysis (DTA) and thermogravimetric (TG) measurements with copper oxide/aluminum oxide mixtures were performed in atmospheres with varying oxygen partial pressures and with crucibles made of different materials. Only sapphire and platinum crucibles proved to be stable under conditions that are useful for the growth of CuAlO$_2$ delafossite single crystals. Then the ternary phase diagram Al$_2$O$_3$-CuO-Cu and its isopleth section Cu$_2$O-Al$_2$O$_3$ were redetermined. Millimeter sized crystals could be obtained from copper oxide melts with 1-2 mol % addition of aluminum oxide that are stable in platinum crucibles held in oxidizing atmosphere containing 15-21 % oxygen.
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Submitted 20 September, 2017;
originally announced September 2017.
