Showing 1–2 of 2 results for author: Vosse, G
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Spectrally resolved free electron-light coupling strength in a transition metal dichalcogenide
Authors:
Niklas Müller,
Soufiane el Kabil,
Gerrit Vosse,
Lina Hansen,
Christopher Rathje,
Sascha Schäfer
Abstract:
Recent advancements in electron microscopy have introduced innovative techniques enabling the inelastic interaction of fast electrons with tightly confined and intense light fields. These techniques, commonly summarized under the term photon-induced nearfield electron microscopy now offer unprecedented capabilities for a precise map** of the characteristics of optical near-fields with remarkable…
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Recent advancements in electron microscopy have introduced innovative techniques enabling the inelastic interaction of fast electrons with tightly confined and intense light fields. These techniques, commonly summarized under the term photon-induced nearfield electron microscopy now offer unprecedented capabilities for a precise map** of the characteristics of optical near-fields with remarkable spatial resolution but their spectral resolution were only scarcely investigated. In this study, we employ a strongly chirped and temporally broadband light pulse to investigate the interaction between free electrons and light at the edge of a MoS2 thin film. Our approach unveils the details of electron-light coupling, revealing a pronounced dependence of the coupling strength on both the position and photon energy. Employing numerical simulations of a simplified model system we identify these modulations to be caused by optical interferences between the incident and reflected field as well as an optical mode guided within the transition metal dichalcogenide film.
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Submitted 20 May, 2024;
originally announced May 2024.
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Inelastic electron-light scattering at dielectric thin films
Authors:
Niklas Müller,
Gerrit Vosse,
Ferdinand Evers,
Sascha Schäfer
Abstract:
In a recently developed methodology termed photon induced near-field electron microscopy (PINEM), the inelastic scattering of electrons off illuminated nanostructures provides direct experimental access to the structure of optical near-field modes and their population. Whereas the inelastic scattering probability can be quantitatively linked to the near field distribution, analytical results for s…
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In a recently developed methodology termed photon induced near-field electron microscopy (PINEM), the inelastic scattering of electrons off illuminated nanostructures provides direct experimental access to the structure of optical near-field modes and their population. Whereas the inelastic scattering probability can be quantitatively linked to the near field distribution, analytical results for simple light scattering geometries are scarce. Here we derive a fully analytical expression for the coupling strength between free electrons and optical near-fields in planar geometries representing dielectric thin films. Contributions to the overall coupling from the electric field above, below and within the sample are analyzed in detail. By carefully choosing the relative angles between electron beam, light and thin film and by accounting for a broad spectrum of photon energies, we demonstrate that one can imprint optical material properties like the reflectivity onto the electron energy distribution.
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Submitted 19 May, 2024;
originally announced May 2024.
