Showing 1–8 of 8 results for author: Vila-Comamala, J

Directly observing atomic-scale relaxations of a glass forming liquid using femtosecond X-ray photon correlation spectroscopy

Authors: Tomoki Fujita, Yanwen Sun, Haoyuan Li, Thies J. Albert, Sanghoon Song, Takahiro Sato, Jens Moesgaard, Antoine Cornet, Peihao Sun, Ying Chen, Mianzhen Mo, Narges Amini, Fan Yang, Arune Makareviciute, Garrett Coleman, Pierre Lucas, Jan Peter Embs, Vincent Esposito, Joan Vila-Comamala, Nan Wang, Talgat Mamyrbayev, Christian David, Jerome Hastings, Beatrice Ruta, Paul Fuoss , et al. (3 additional authors not shown)

Abstract: Glass forming liquids exhibit structural relaxation behaviors, reflecting underlying atomic rearrangements on a wide range of timescales. These behaviors play a crucial role in determining many material properties. However, the relaxation processes on the atomic scale are not well understood due to the experimental difficulties in directly characterizing the evolving correlations of atomic order i… ▽ More Glass forming liquids exhibit structural relaxation behaviors, reflecting underlying atomic rearrangements on a wide range of timescales. These behaviors play a crucial role in determining many material properties. However, the relaxation processes on the atomic scale are not well understood due to the experimental difficulties in directly characterizing the evolving correlations of atomic order in disordered systems. Here, taking the model system Ge15Te85, we demonstrate an experimental approach that probes the relaxation dynamics by scattering the coherent X-ray pulses with femtosecond duration produced by X-ray free electron lasers (XFELs). By collecting the summed speckle patterns from two rapidly successive, nearly identical X-ray pulses generated using a split-delay system, we can extract the contrast decay of speckle patterns originating from sample dynamics and observe the full decorrelation of local order on the sub-picosecond timescale. This provides the direct atomic-level evidence of fragile liquid behavior of Ge15Te85. Our results demonstrate the strategy for XFEL-based X-ray photon correlation spectroscopy (XPCS), attaining femtosecond temporal and atomic-scale spatial resolutions. This twelve orders of magnitude extension from the millisecond regime of synchrotron-based XPCS opens a new avenue of experimental studies of relaxation dynamics in liquids, glasses, and other highly disordered systems. △ Less

Submitted 8 June, 2024; v1 submitted 13 December, 2023; originally announced December 2023.

Generation of highly mutually coherent hard x-ray pulse pairs with an amplitude-splitting delay line

Authors: Haoyuan Li, Yanwen Sun, Joan Vila-Comamala, Takahiro Sato, Sanghoon Song, Peihao Sun, Matthew H Seaberg, Nan Wang, Jerome Hastings, Mike Dunne, Paul Fuoss, Christian David, Mark Sutton, Diling Zhu

Abstract: Beam splitters and delay lines are among the key building blocks of modern-day optical laser technologies. Progress in x-ray free electron laser source development and applications over the past decade is calling for their counter part operating in the Angstrom wavelength regime. Recent efforts in x-ray optics development have demonstrated relatively stable delay lines that most often adopted the… ▽ More Beam splitters and delay lines are among the key building blocks of modern-day optical laser technologies. Progress in x-ray free electron laser source development and applications over the past decade is calling for their counter part operating in the Angstrom wavelength regime. Recent efforts in x-ray optics development have demonstrated relatively stable delay lines that most often adopted the division of wavefront approach for the beam splitting and recombination configuration. However, the two recombined beams have yet to achieve sufficient mutual coherence to enable applications such as interferometry, correlation spectroscopy, and nonlinear spectroscopy. We present the first experimental realization of the generation of highly mutually coherent pulse pairs using an amplitude-split delay line design based on transmission grating beam splitters and channel-cut crystal optic delay lines. The performance of the prototype system was analyzed in the context of x-ray coherent scattering and correlation spectroscopy, where we obtained nearly identical high-contrast speckle patterns from both branches. We show in addition the high level of dynamical stability during continuous delay scans, a capability essential for high sensitivity ultra-fast measurements. △ Less

Submitted 5 April, 2022; v1 submitted 19 April, 2021; originally announced April 2021.

Comments: 16 pages, 9 gigures

Journal ref: Physical Review Research 3.4 (2021): 043050

High aspect ratio silicon structures by Displacement Talbot lithography and Bosch etching

Authors: Konstantins Jefimovs, Lucia Romano, Joan Vila-Comamala, Matias Kagias, Zhentian Wang, Li Wang, Christian Dais, Harun Solak, Marco Stampanoni

Abstract: Despite the fact that the resolution of conventional contact/proximity lithography can reach feature sizes down to ~0.5-0.6 micrometers, the accurate control of the linewidth and uniformity becomes already very challenging for gratings with periods in the range of 1-2 μm. This is particularly relevant for the exposure of large areas and wafers thinner than 300μm. If the wafer or mask surface is no… ▽ More Despite the fact that the resolution of conventional contact/proximity lithography can reach feature sizes down to ~0.5-0.6 micrometers, the accurate control of the linewidth and uniformity becomes already very challenging for gratings with periods in the range of 1-2 μm. This is particularly relevant for the exposure of large areas and wafers thinner than 300μm. If the wafer or mask surface is not fully flat due to any kind of defects, such as bowing/warpage or remaining topography of the surface in case of overlay exposures, noticeable linewidth variations or complete failure of lithography step will occur. We utilized the newly developed Displacement Talbot lithography to pattern gratings with equal lines and spaces and periods in the range of 1.0 to 2.4 μm. The exposures in this lithography process do not require contact between the mask and the wafer, which makes it essentially insensitive to surface planarity and enables exposures with very high linewidth uniformity on thin and even slightly deformed wafers. We demonstrated pattern transfer of such exposures into Si substrates by reactive ion etching using the Bosch process. An etching depth of 30 μm or more for the whole range of periods was achieved, which corresponds to very high aspect ratios up to 60:1. The application of the fabricated gratings in phase contrast x-ray imaging is presented. △ Less

Submitted 31 October, 2018; originally announced October 2018.

Journal ref: Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460L (27 March 2017)

Hot embossing of Au- and Pb- based alloys for X ray grating fabrication

Authors: Lucia Romano, Joan Vila-Comamala, Helmut Schift, Marco Stampanoni

Abstract: Grating-based X-ray phase-contrast interferometry has a high application impact in material science and medicine for imaging of weakly absorbing (low Z) materials and soft tissues. For the absorbing gratings, casting of highly x-ray absorbing metals, such as Au and Pb alloys, has proven to be a viable way to generate large area periodic high aspect ratio microstructures. In this paper, we review t… ▽ More Grating-based X-ray phase-contrast interferometry has a high application impact in material science and medicine for imaging of weakly absorbing (low Z) materials and soft tissues. For the absorbing gratings, casting of highly x-ray absorbing metals, such as Au and Pb alloys, has proven to be a viable way to generate large area periodic high aspect ratio microstructures. In this paper, we review the grating fabrication strategy with a special focus on a novel approach of casting low temperature melting alloys (Au-Sn and Pbbased alloy) into Si grating templates using hot embossing. The process, similar to nanoimprint lithography, requires particular adjusting efforts of process parameters as a function of the metal alloy and the grating feature size. The transition between solid and liquid state depends on the alloy phase diagram, the applied pressure can damage the high aspect ratio Si lamellas and the microstructure of the solid metal can affect the grating structure. We demonstrate that metal casting by hot embossing can be used to fabricate gratings on large area (up to 70x70 mm2) with aspect ratio up to 50:1 and pitch in the range of 1-20 μm. △ Less

Submitted 30 October, 2018; originally announced October 2018.

Journal ref: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 35 (2017) 06G302

Towards Sub-micrometer High Aspect Ratio X-ray Gratings by Atomic Layer Deposition of Iridium

Authors: Joan Vila-Comamala, Lucia Romano, Vitaliy Guzenko, Matias Kagias, Marco Stampanoni, Konstantins Jefimovs

Abstract: X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a pe… ▽ More X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of one micrometer and a depth of 30 micrometer combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications. △ Less

Submitted 29 October, 2018; originally announced October 2018.

Journal ref: Microelectronic Engineering 192 (2018) Pages 19-24

High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication

Authors: Lucia Romano, Joan Vila-Comamala, Matias Kagias, Konrad Vogelsang, Helmut Schift, Marco Stampanoni, Konstantins Jefimovs

Abstract: Metal microstructured optical elements for grating-based X-ray phase-contrast interferometry were fabricated by using an innovative approach of microcasting: hot embossing technology with low melting temperature (280°C) metal alloy foils and silicon etched templates. A gold-tin alloy (80w%Au / 20w%Sn) was used to cast micro-gratings with pitch sizes in the range of 2 to 20 micrometers and depth of… ▽ More Metal microstructured optical elements for grating-based X-ray phase-contrast interferometry were fabricated by using an innovative approach of microcasting: hot embossing technology with low melting temperature (280°C) metal alloy foils and silicon etched templates. A gold-tin alloy (80w%Au / 20w%Sn) was used to cast micro-gratings with pitch sizes in the range of 2 to 20 micrometers and depth of the structures up to 80 micrometers. The metal filling of the silicon template strongly depends on the wetting properties of the liquid metal on the groove surface. A thin metal wetting layer (20 nm of Ir or Au) was deposited before the casting in order to turn the template surface into hydrophilic with respect of the melted metal alloy. Temperature and pressure of the hot embossing process were optimized for a complete filling of the cavities in a low viscosity regime of the liquid metal, and for minimizing the shear force that might damage the silicon structures for small pitch grating. The new method has relevant advantages, such as being a low cost technique, fast and easily scalable to large area fabrication. △ Less

Submitted 23 June, 2017; originally announced June 2017.

Journal ref: Microelectronic Engineering 176 (2017) 6-10

Systematic efficiency study of line-doubled zone plates

Authors: Felix Marschall, Joan Vila-Comamala, Vitaliy A. Guzenko, Christian David

Abstract: Line-doubled Fresnel zone plates provide nanoscale, high aspect ratio structures required for efficient high resolution imaging in the multi-keV x-ray range. For the fabrication of such optics a high aspect ratio HSQ resist template is produced by electron-beam lithography and then covered with Ir by atomic layer deposition (ALD). Line-doubled Fresnel zone plates provide nanoscale, high aspect ratio structures required for efficient high resolution imaging in the multi-keV x-ray range. For the fabrication of such optics a high aspect ratio HSQ resist template is produced by electron-beam lithography and then covered with Ir by atomic layer deposition (ALD). △ Less

Submitted 8 May, 2017; originally announced May 2017.

Ion beam lithography for Fresnel zone plates in X-ray microscopy

Authors: Kahraman Keskinbora, Corinne Grévent, Michael Bechtel, Markus Weigand, Eberhard Goering, Achim Nadzeyka, Lloyd Peto, Stefan Rehbein, Gerd Schneider, Rolf Follath, Joan Vila-Comamala, Hanfei Yan, Gisela Schütz

Abstract: Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezo… ▽ More Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezoidal profile of the FZP favorably activates its 2nd order focus. The FZP with an outermost zone width of 100 nm allows the visualization of features down to 61, 31 and 21 nm in the 1st, 2nd and 3rd order focus respectively. Measured efficiencies in the 1st and 2nd order of diffraction reach the theoretical predictions. △ Less

Submitted 3 April, 2014; v1 submitted 21 May, 2012; originally announced May 2012.

Journal ref: Opt. Express 2013, 21 (10), 11747-11756