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Showing 1–3 of 3 results for author: Varahramyan, K M

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  1. arXiv:1207.0781  [pdf

    cond-mat.mes-hall

    Raman spectroscopy and strain map** in individual Ge-SixGe1-x core-shell nanowires

    Authors: D. C. Dillen, K. M. Varahramyan, C. M. Corbet, E. Tutuc

    Abstract: Core-shell Ge-SixGe1-x nanowires (NWs) are expected to contain large strain fields due to the lattice-mismatch at the core/shell interface. Here we report the measurement of core strain in a NW heterostructure using Raman spectroscopy. We compare the Raman spectra, and the frequency of the Ge-Ge mode measured in individual Ge-Si0.5Ge0.5 core-shell, and bare Ge NWs. We find that the Ge-Ge mode freq… ▽ More

    Submitted 3 July, 2012; originally announced July 2012.

    Comments: 9 pages, 5 figures

    Journal ref: Phys. Rev. B 86, 045311 (2012)

  2. arXiv:1003.3787  [pdf

    cond-mat.mes-hall cond-mat.mtrl-sci

    Lateral Spin Injection in Germanium Nanowires

    Authors: En-Shao Liu, Junghyo Nah, Kamran M. Varahramyan, Emanuel Tutuc

    Abstract: Electrical injection of spin-polarized electrons into a semiconductor, large spin diffusion length, and an integration friendly platform are desirable ingredients for spin-based devices. Here we demonstrate lateral spin injection and detection in germanium nanowires, by using ferromagnetic metal contacts and tunnel barriers for contact resistance engineering. Using data measured from over 80 sampl… ▽ More

    Submitted 24 August, 2010; v1 submitted 19 March, 2010; originally announced March 2010.

    Journal ref: Nano Lett. 10, 3297 (2010)

  3. arXiv:0912.1827  [pdf

    cond-mat.mes-hall cond-mat.mtrl-sci

    Scaling Properties of Ge-SixGe1-x Core-Shell Nanowire Field Effect Transistors

    Authors: Junghyo Nah, En-Shao Liu, Kamran M. Varahramyan, Davood Shahrjerdi, Sanjay K. Banerjee, Emanuel Tutuc

    Abstract: We demonstrate the fabrication of high-performance Ge-SixGe1-x core-shell nanowire field-effect transistors with highly doped source and drain, and systematically investigate their scaling properties. Highly doped source and drain regions are realized by low energy boron implantation, which enables efficient carrier injection with a contact resistance much lower than the nanowire resistance. We… ▽ More

    Submitted 9 December, 2009; originally announced December 2009.

    Comments: 5 pages, 4 figures. IEEE Transactions on Electron Devices (in press)

    Journal ref: IEEE Transactions on Electron Devices 57, pp. 491-495 (2010)