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Next-Generation Superconducting RF Technology based on Advanced Thin Film Technologies and Innovative Materials for Accelerator Enhanced Performance and Energy Reach
Authors:
A. - M. Valente-Feliciano,
C. Antoine,
S. Anlage,
G. Ciovati,
J. Delayen,
F. Gerigk,
A. Gurevich,
T. Junginger,
S. Keckert,
G. Keppe,
J. Knobloch,
T. Kubo,
O. Kugeler,
D. Manos,
C. Pira,
T. Proslier,
U. Pudasaini,
C. E. Reece,
R. A. Rimmer,
G. J. Rosaz,
T. Saeki,
R. Vaglio,
R. Valizadeh,
H. Vennekate,
W. Venturini Delsolaro
, et al. (3 additional authors not shown)
Abstract:
Superconducting RF is a key technology for future particle accelerators, now relying on advanced surfaces beyond bulk Nb for a leap in performance and efficiency. The SRF thin film strategy aims at transforming the current SRF technology by using highly functional materials, addressing all the necessary functions. The community is deploying efforts in three research thrusts to develop next-generat…
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Superconducting RF is a key technology for future particle accelerators, now relying on advanced surfaces beyond bulk Nb for a leap in performance and efficiency. The SRF thin film strategy aims at transforming the current SRF technology by using highly functional materials, addressing all the necessary functions. The community is deploying efforts in three research thrusts to develop next-generation thin-film based cavities. Nb on Cu cavities are developed to perform as good as or better than bulk Nb at reduced cost and with better thermal stability. Recent results showing improved accelerating field and dramatically reduced Q slope show their potential for many applications. The second research thrust is to develop cavities coated with materials that can operate at higher temperatures or sustain higher fields. Proof of principle has been established for the merit of Nb3Sn for SRF application. Research is now needed to further exploit the material and reach its full potential with novel deposition techniques. The third line of research is to push SRF performance beyond the capabilities of the superconductors alone with multilayered coatings. In parallel, developments are needed to provide quality substrates, cooling schemes and cryomodule design tailored to thin film cavities. Recent results in these three research thrusts suggest that SRF thin film technologies are at the eve of a technological revolution. For them to mature, active community support and sustained funding are needed to address fundamental developments supporting material deposition techniques, surface and RF research, technical challenges associated with scaling and industrialization. With dedicated and sustained investment, next-generation thin-film based cavities will become a reality with high performance and efficiency, facilitating energy sustainable science while enabling higher luminosity, and higher energy.
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Submitted 5 April, 2022;
originally announced April 2022.
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Key directions for research and development of superconducting radio frequency cavities
Authors:
S. Belomestnykh,
S. Posen,
D. Bafia,
S. Balachandran,
M. Bertucci,
A. Burrill,
A. Cano,
M. Checchin,
G. Ciovati,
L. D. Cooley,
G. Dalla Lana Semione,
J. Delayen,
G. Eremeev,
F. Furuta,
F. Gerigk,
B. Giaccone,
D. Gonnella,
A. Grassellino,
A. Gurevich,
W. Hillert,
M. Iavarone,
J. Knobloch,
T. Kubo,
W. K. Kwok,
R. Laxdal
, et al. (31 additional authors not shown)
Abstract:
Radio frequency superconductivity is a cornerstone technology for many future HEP particle accelerators and experiments from colliders to proton drivers for neutrino facilities to searches for dark matter. While the performance of superconducting RF (SRF) cavities has improved significantly over the last decades, and the SRF technology has enabled new applications, the proposed HEP facilities and…
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Radio frequency superconductivity is a cornerstone technology for many future HEP particle accelerators and experiments from colliders to proton drivers for neutrino facilities to searches for dark matter. While the performance of superconducting RF (SRF) cavities has improved significantly over the last decades, and the SRF technology has enabled new applications, the proposed HEP facilities and experiments pose new challenges. To address these challenges, the field continues to generate new ideas and there seems to be a vast room for improvements. In this paper we discuss the key research directions that are aligned with and address the future HEP needs.
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Submitted 21 August, 2022; v1 submitted 3 April, 2022;
originally announced April 2022.
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Possible existence of a filamentary state in type-II superconductors
Authors:
V. Kozhevnikov,
A. -M. Valente-Feliciano,
P. J. Curran,
A. Suter,
A. H. Liu,
G. Richter,
E. Morenzoni,
S. J. Bending,
C. Van Haesendonck
Abstract:
The standard interpretation of the phase diagram of type-II superconductors was developed in 1960s and has since been considered a well-established part of classical superconductivity. However, upon closer examination a number of fundamental issues arise that leads one to question this standard picture. To address these issues we studied equilibrium properties of niobium samples near and above the…
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The standard interpretation of the phase diagram of type-II superconductors was developed in 1960s and has since been considered a well-established part of classical superconductivity. However, upon closer examination a number of fundamental issues arise that leads one to question this standard picture. To address these issues we studied equilibrium properties of niobium samples near and above the upper critical field Hc2 in parallel and perpendicular magnetic fields. The samples investigated were very high quality films and single crystal discs with the Ginzburg-Landau parameters 0.8 and 1.3, respectively. A range of complementary measurements have been performed, which include dc magnetometry, electrical transport, muSR spectroscopy and scanning Hall-probe microscopy. Contrarily to the standard scenario, we observed that a superconducting phase is present in the sample bulk above Hc2 and the field Hc3 is the same in both parallel and perpendicular fields. Our findings suggest that above Hc2 the superconducting phase forms filaments parallel to the field regardless on the field orientation. Near Hc2 the filaments preserve the hexagonal structure of the preceding vortex lattice of the mixed state and the filament density continuously falls to zero at Hc3. Our work has important implications for the correct interpretation of properties of type-II superconductors and can also be essential for practical applications of these materials.
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Submitted 9 May, 2017;
originally announced May 2017.
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Cryogenic rf test of the first plasma etched SRF cavity
Authors:
J. Upadhyay,
A. Palczewski,
S. Popović,
A. -M. Valente-Feliciano,
D. Im,
L. Phillips,
L. Vušković
Abstract:
Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used. The single cell cavity is mechanically polished, buffer chemic…
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Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used. The single cell cavity is mechanically polished, buffer chemically etched afterwards and rf tested at cryogenic temperatures for a baseline test. This cavity is then plasma processed. The processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise manner to establish segmented plasma processing. The cavity is rf tested afterwards at cryogenic temperatures. The rf test and surface condition results are presented.
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Submitted 20 May, 2016;
originally announced May 2016.
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Equilibrium properties of the mixed state in superconducting niobium in a transverse magnetic field: Experiment and theoretical model
Authors:
V. Kozhevnikov,
A. -M. Valente-Feliciano,
P. J. Curran,
G. Richter,
A. Volodin,
A. Suter,
S. Bending,
C. Van Haesendonck
Abstract:
Equilibrium magnetic properties of the mixed state in type-II superconductors were measured with high purity bulk and film niobium samples in parallel and perpendicular magnetic fields using dc magnetometry and scanning Hall-probe microscopy. Equilibrium magnetization data for the perpendicular geometry were obtained for the first time. It was found that none of the existing theories is consistent…
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Equilibrium magnetic properties of the mixed state in type-II superconductors were measured with high purity bulk and film niobium samples in parallel and perpendicular magnetic fields using dc magnetometry and scanning Hall-probe microscopy. Equilibrium magnetization data for the perpendicular geometry were obtained for the first time. It was found that none of the existing theories is consistent with these new data. To address this problem, a theoretical model is developed and experimentally validated. The new model describes the mixed state in an averaged limit, i.e. %without detailing the samples' magnetic structure and therefore ignoring interactions between vortices. It is quantitatively consistent with the data obtained in a perpendicular field and provides new insights on properties of vortices. % and the entire mixed state. At low values of the Ginzburg-Landau parameter, the model converts to that of Peierls and London for the intermediate state in type-I superconductors. It is shown that description of the vortex matter in superconductors in terms of a 2D gas is more appropriate than the frequently used crystal- and glass-like scenarios.
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Submitted 2 March, 2018; v1 submitted 13 March, 2016;
originally announced March 2016.
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Apparatus and method for plasma processing of SRF cavities
Authors:
J. Upadhyay,
Do Im,
J. Peshl,
M. Bašović,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vuškovića
Abstract:
An apparatus and a method are described for plasma etching of the inner surface of superconducting radio frequency (SRF) cavities. Accelerator SRF cavities are formed into a variable-diameter cylindrical structure made of bulk niobium, for resonant generation of the particle accelerating field. The etch rate non-uniformity due to depletion of the radicals has been overcome by the simultaneous move…
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An apparatus and a method are described for plasma etching of the inner surface of superconducting radio frequency (SRF) cavities. Accelerator SRF cavities are formed into a variable-diameter cylindrical structure made of bulk niobium, for resonant generation of the particle accelerating field. The etch rate non-uniformity due to depletion of the radicals has been overcome by the simultaneous movement of the gas flow inlet and the inner electrode. An effective shape of the inner electrode to reduce the plasma asymmetry for the coaxial cylindrical rf plasma reactor is determined and implemented in the cavity processing method. The processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise way to establish segmented plasma columns. The test structure was a pillbox cavity made of steel of similar dimension to the standard SRF cavity. This was adopted to experimentally verify the plasma surface reaction on cylindrical structures with variable diameter using the segmented plasma generation approach. The pill box cavity is filled with niobium ring- and disk-type samples and the etch rate of these samples was measured.
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Submitted 13 November, 2015;
originally announced November 2015.
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Reversal of the Asymmetry in a Cylindrical Coaxial Capacitively Coupled Ar/Cl2 Plasma
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
The reduction of the asymmetry in the plasma sheath voltages of a cylindrical coaxial capacitively coupled plasma is crucial for efficient surface modification of the inner surfaces of concave three-dimensional structures, including superconducting radio frequency cavities. One critical asymmetry effect is the negative dc self-bias, formed across the inner electrode plasma sheath due to its lower…
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The reduction of the asymmetry in the plasma sheath voltages of a cylindrical coaxial capacitively coupled plasma is crucial for efficient surface modification of the inner surfaces of concave three-dimensional structures, including superconducting radio frequency cavities. One critical asymmetry effect is the negative dc self-bias, formed across the inner electrode plasma sheath due to its lower surface area compared to the outer electrode. The effect on the self-bias potential with the surface enhancement by geometric modification on the inner electrode structure is studied. The shapes of the inner electrodes are chosen as cylindrical tube, large and small pitch bellows, and disc-loaded corrugated structure (DLCS). The dc self-bias measurements for all these shapes were taken at different process parameters in Ar/Cl2 discharge. The reversal of the negative dc self-bias potential to become positive for a DLCS inner electrode was observed and the best etch rate is achieved due to the reduction in plasma asymmetry.
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Submitted 30 June, 2015;
originally announced July 2015.
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Self-bias Dependence on Process Parameters in Asymmetric Cylindrical Coaxial Capacitively Coupled Plasma
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
An rf coaxial capacitively coupled Ar/Cl2 plasma is applied to processing the inner wall of superconducting radio frequency cavities. A dc self-bias potential is established across the inner electrode sheath due to the surface area difference between inner and outer electrodes of the coaxial plasma. The self-bias potential measurement is used as an indication of the plasma sheath voltage asymmetry…
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An rf coaxial capacitively coupled Ar/Cl2 plasma is applied to processing the inner wall of superconducting radio frequency cavities. A dc self-bias potential is established across the inner electrode sheath due to the surface area difference between inner and outer electrodes of the coaxial plasma. The self-bias potential measurement is used as an indication of the plasma sheath voltage asymmetry. The understanding of the asymmetry in sheath voltage distribution in coaxial plasma is important for the modification of the inner surfaces of three dimensional objects. The plasma sheath voltages were tailored to process the outer wall by providing an additional dc current to the inner electrode with the help of an external dc power supply. The dc self-bias potential is measured for different diameter electrodes and its variation on process parameters such as gas pressure, rf power and percentage of chlorine in the Ar/Cl2 gas mixture is studied. The dc current needed to overcome the self-bias potential to make it zero is measured for the same process parameters.
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Submitted 16 June, 2015;
originally announced June 2015.
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Etching Mechanism of Niobium in Coaxial Ar/Cl2 RF Plasma
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
The understanding of the Ar/Cl2 plasma etching mechanism is crucial for the desired modification of inner surface of the three dimensional niobium (Nb) superconductive radio frequency cavities. Uniform mass removal in cylindrical shaped structures is a challenging task, because the etch rate varies along the direction of gas flow. The study is performed in the asymmetric coaxial RF discharge with…
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The understanding of the Ar/Cl2 plasma etching mechanism is crucial for the desired modification of inner surface of the three dimensional niobium (Nb) superconductive radio frequency cavities. Uniform mass removal in cylindrical shaped structures is a challenging task, because the etch rate varies along the direction of gas flow. The study is performed in the asymmetric coaxial RF discharge with two identical Nb rings acting as a part of the outer electrode. The dependence of etch rate uniformity on pressure, RF power, DC bias, Cl2 concentration, diameter of the inner electrode, temperature of the outer cylinder and position of the samples in the structure is determined. To understand the plasma etching mechanisms, we have studied several factors that have important influence on the etch rate and uniformity, which include the plasma sheath potential, Nb surface temperature, and the gas flow rate.
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Submitted 1 November, 2014;
originally announced November 2014.
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Plasma Processing of Large Curved Surfaces for SRF Cavity Modification
Authors:
J. Upadhyay,
Do Im,
S. Popović,
A. -M. Valente-Feliciano,
L. Phillips,
L. Vušković
Abstract:
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which influence the etching rate and surface roughness, and eventually, determine cavity performance. This includes dependence of the process on the freque…
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Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which influence the etching rate and surface roughness, and eventually, determine cavity performance. This includes dependence of the process on the frequency of the RF generator, gas pressure, power level, the driven (inner) electrode configuration, and the chlorine concentration in the gas mixture during plasma processing. To demonstrate surface layer removal in the asymmetric non-planar geometry, we are using a simple cylindrical cavity with 8 ports symmetrically distributed over the cylinder. The ports are used for diagnosing the plasma parameters and as holders for the samples to be etched. The etching rate is highly correlated with the shape of the inner electrode, radio-frequency (RF) circuit elements, chlorine concentration in the Cl2/Ar gas mixtures, residence time of reactive species and temperature of the cavity. Using cylindrical electrodes with variable radius, large-surface ring-shaped samples and d.c. bias implementation in the external circuit we have demonstrated substantial average etching rates and outlined the possibility to optimize plasma properties with respect to maximum surface processing effect.
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Submitted 1 November, 2014;
originally announced November 2014.
