Coherent control of a triangular exchange-only spin qubit
Authors:
Edwin Acuna,
Joseph D. Broz,
Kaushal Shyamsundar,
Antonio B. Mei,
Colin P. Feeney,
Valerie Smetanka,
Tiffany Davis,
Kangmu Lee,
Maxwell D. Choi,
Brydon Boyd,
June Suh,
Wonill D. Ha,
Cameron Jennings,
Andrew S. Pan,
Daniel S. Sanchez,
Matthew D. Reed,
Jason R. Petta
Abstract:
We demonstrate coherent control of a three-electron exchange-only spin qubit with the quantum dots arranged in a close-packed triangular geometry. The device is tuned to confine one electron in each quantum dot, as evidenced by pairwise charge stability diagrams. Time-domain control of the exchange coupling is demonstrated and qubit performance is characterized using blind randomized benchmarking,…
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We demonstrate coherent control of a three-electron exchange-only spin qubit with the quantum dots arranged in a close-packed triangular geometry. The device is tuned to confine one electron in each quantum dot, as evidenced by pairwise charge stability diagrams. Time-domain control of the exchange coupling is demonstrated and qubit performance is characterized using blind randomized benchmarking, with an average single-qubit gate fidelity F = 99.84%. The compact triangular device geometry can be readily scaled to larger two-dimensional quantum dot arrays with high connectivity.
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Submitted 5 June, 2024;
originally announced June 2024.
Optimization of Quantum-dot Qubit Fabrication via Machine Learning
Authors:
Antonio B. Mei,
Ivan Milosavljevic,
Amanda L. Simpson,
Valerie A. Smetanka,
Colin P. Feeney,
Shay M. Seguin,
Sieu D. Ha,
Wonill Ha,
Matthew D. Reed
Abstract:
Precise nanofabrication represents a critical challenge to develo** semiconductor quantum-dot qubits for practical quantum computation. Here, we design and train a convolutional neural network to interpret in-line scanning electron micrographs and quantify qualitative features affecting device functionality. The high-throughput strategy is exemplified by optimizing a model lithographic process w…
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Precise nanofabrication represents a critical challenge to develo** semiconductor quantum-dot qubits for practical quantum computation. Here, we design and train a convolutional neural network to interpret in-line scanning electron micrographs and quantify qualitative features affecting device functionality. The high-throughput strategy is exemplified by optimizing a model lithographic process within a five-dimensional design space and by demonstrating a new approach to address lithographic proximity effects. The present results emphasize the benefits of machine learning for develo** robust processes, shortening development cycles, and enforcing quality control during qubit fabrication.
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Submitted 15 December, 2020;
originally announced December 2020.
