Structural characterization of APPJ treated Bismaleimide coatings and heat treated Titania-BMI
Authors:
S. Shrinidhi,
S. Suman,
A. Shah,
P. Prabhakar,
A. Chaurasia A. Kumar,
K. G. Chauhan,
A. S. Bhattacharyya
Abstract:
Bismaleimide (BMI) are thermosetting polymers mainly used in aerospace applications having properties of dimensional stability, low shrinkage, chemical resistance, fire resistance, good mechanical properties and high resistance against various solvents, acids, and water. BMI is commercially available as Homide 250. BMI coating has also been used for the corrosion protection. Metallization (AL) of…
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Bismaleimide (BMI) are thermosetting polymers mainly used in aerospace applications having properties of dimensional stability, low shrinkage, chemical resistance, fire resistance, good mechanical properties and high resistance against various solvents, acids, and water. BMI is commercially available as Homide 250. BMI coating has also been used for the corrosion protection. Metallization (AL) of BMI using vacuum evaporation was done which serves the purpose of prevention of space charge accumulation in aircraft bodies. Addition of inorganic materials like metal oxides can influence the properties of the polymer as an inorganic-organic composite. The organic-ionorganic composites have wide applications in electronics, optics, chemistry and medicine. Titanium dioxide (TiO2, Titania) has a wide range of applications starting from photocatalysis, dye-sensitized solar cells to optical coatings and electronics. A BMI-TiO2 composite was prepared by chemical route. Atmospheric Plasma Jet (APPJ) using Helium gas was also treated on BMI. XRD and FTIR studies of the composite system prepared at different temperatures showed its crystalline and structural configuration.
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Submitted 6 April, 2016;
originally announced April 2016.
Some aspects of epitaxial thin film growth
Authors:
A. S. Bhattacharyya,
Rishdeo Kumar,
Vikrant Raj,
S. Shrinidhi,
Shrishti Suman,
Asmita Shah,
Ramgiri P. Kumar
Abstract:
The article consists of four sections all dealing with the computational modeling of the sputtering process. The first section deals with the difference in Bismuth atomic layer deposition at different polar angle and ion flounce. In the second section, atomic layer deposition was studied as a function of incident Argon ion energy at different pressure conditions. A curve analogous to Bragg curve w…
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The article consists of four sections all dealing with the computational modeling of the sputtering process. The first section deals with the difference in Bismuth atomic layer deposition at different polar angle and ion flounce. In the second section, atomic layer deposition was studied as a function of incident Argon ion energy at different pressure conditions. A curve analogous to Bragg curve was obtained .In the third section TiOx films was developed by simulations. The sputtering parameters were varied to get different atomic layers. The variation of coverage with sticking coefficient was shown. The last section deals with sputter based deposition of TiN films. The rate of change of partial sputtering yield with coverage was considered. The deposition pressure and time were varied to get films of different thickness. All the sections are stored separately
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Submitted 6 April, 2016;
originally announced April 2016.
