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Ultralow temperature NMR of CeCoIn$_5$
Authors:
M. Yamashita,
M. Tashiro,
K. Saiki,
S. Yamada,
M. Akazawa,
M. Shimozawa,
T. Taniguchi,
H. Takeda,
M. Takigawa,
H. Shishido
Abstract:
We have performed $^{59}$Co NMR measurements of CeCoIn$_5$ down to ultralow temperatures. We find that the temperature dependence of the spin-echo intensity provides a good measure of the sample temperature, enabling us to determine a pulse condition not heating up the sample by the NMR pulses down to ultralow temperatures. From the longitudinal relaxation time ($T_1$) measurements at 5 T applied…
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We have performed $^{59}$Co NMR measurements of CeCoIn$_5$ down to ultralow temperatures. We find that the temperature dependence of the spin-echo intensity provides a good measure of the sample temperature, enabling us to determine a pulse condition not heating up the sample by the NMR pulses down to ultralow temperatures. From the longitudinal relaxation time ($T_1$) measurements at 5 T applied along the $c$ axis, a pronounced peak in $1/T_1T$ is observed at 20 mK, implying an appearance of magnetic order as suggested by the recent quantum oscillation measurements [H. Shishido {\it et al.}, Phys. Rev. Lett. {\bf 120}, 177201 (2018)]. On the other hand, the NMR spectrum shows no change below 20 mK. Moreover, the peak in $1/T_1 T$ disappears at 6 and 8 T in contrast to the results of the quantum oscillation. We discuss that an antiferromagnetic state with a moment lying in the $a$--$b$ plane can be a possible origin for the peak in $1/T_1 T$ at 5 T.
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Submitted 29 October, 2020; v1 submitted 24 April, 2020;
originally announced April 2020.
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Conductive Atomic Force Microscopy of Chemically Synthesized Graphene Oxide and Interlayer Conduction
Authors:
Yoshio Kanamori,
Seiji Obata,
Koichiro Saiki
Abstract:
Graphene oxide (GO) is one of chemically modified graphenes and has been extensively investigated worldwide. A monolayer sheet of GO can be chemically produced in solution and it has been expected to be adaptable to a wide variety of applications. Most of works have focused on fabrication and reduction processes of GO, while its intrinsic property has not been explored in detail. We have succeeded…
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Graphene oxide (GO) is one of chemically modified graphenes and has been extensively investigated worldwide. A monolayer sheet of GO can be chemically produced in solution and it has been expected to be adaptable to a wide variety of applications. Most of works have focused on fabrication and reduction processes of GO, while its intrinsic property has not been explored in detail. We have succeeded in fabricating large scale GO nanosheets reproducibly. In the present work, we observed GO nanosheets by conductive atomic force microscopy. The current image is useful to monitor the GO thickness as well as wrinkles and folds in the nanosheet with high contrast. In addition to the current images, local I-V characteristics of the GO sheet were measured with the conductive cantilever. Based on the applied electric filed dependence, the conduction normal to the GO sheet could be described in terms of Poole Frenkel emission mechanism and the relative permittivity of GO is evaluated to be 4.8.
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Submitted 10 February, 2011; v1 submitted 8 February, 2011;
originally announced February 2011.
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Reduction of a Single Layer Graphene Oxide Film on Pt(111)
Authors:
Seiji Obata,
Hiroshige Tanaka,
Koichiro Saiki
Abstract:
Graphene oxide (GO) is one of chemically modified graphenes and has been extensively studied worldwide. A monolayer sheet of GO which is chemically produced in solution can be deposited on various substrates. We have proved that use of graphite powder with a large grain size enables preparation of a single layer GO film that is larger than 100 micrometers easily and reproducibly. If it is possible…
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Graphene oxide (GO) is one of chemically modified graphenes and has been extensively studied worldwide. A monolayer sheet of GO which is chemically produced in solution can be deposited on various substrates. We have proved that use of graphite powder with a large grain size enables preparation of a single layer GO film that is larger than 100 micrometers easily and reproducibly. If it is possible to reduce the GO film completely, one can obtain graphene without mechanical exfoliation. However, the reduction methods employed so far have been insufficient to remove oxygen or to restore the long range order in graphene lattice. In the present work we annealed the GO sheet which was placed on Pt(111) in ultrahigh vacuum. The STM observation of the annealed specimen reveals that a honeycomb lattice appears together with moire structures of long range ordering. The XPS result indicated complete removal of oxygen from the GO sheet. These results would open a new way to synthesize a high quality graphene film, which replaces the conventional CVD method.
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Submitted 16 January, 2011;
originally announced January 2011.
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Structure and properties of chemically prepared nanographene islands characterized by scanning tunneling microscopy
Authors:
Mayu Yamamoto,
Seiji Obata,
Koichiro Saiki
Abstract:
Single layer graphene islands with a typical diameter of several nanometers were grown on a Pt (111) substrate. Scanning tunneling microscopy (STM) analysis showed most of islands are hexagonally shaped and the zigzag-type edge predominates over the armchair-type edge. The apparent height at the atoms on the zigzag edge is enhanced with respect to the inside atoms for a small sample bias voltage,…
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Single layer graphene islands with a typical diameter of several nanometers were grown on a Pt (111) substrate. Scanning tunneling microscopy (STM) analysis showed most of islands are hexagonally shaped and the zigzag-type edge predominates over the armchair-type edge. The apparent height at the atoms on the zigzag edge is enhanced with respect to the inside atoms for a small sample bias voltage, while such an enhancement was not observed at the atoms on the armchair edge. This result provides an experimental evidence of spatially (at the zigzag edge) and energetically (at the Fermi level) localized edge state in the nanographene islands, which were prepared chemically on Pt (111).
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Submitted 14 June, 2010;
originally announced June 2010.
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Electronic properties of metal-induced gap states formed at alkali-halide/metal interfaces
Authors:
Manabu Kiguchi,
Genki Yoshikawa,
Susumu Ikeda,
Koichiro Saiki
Abstract:
The spatial distribution and site- distribution of metal induced gap states (MIGS) are studied by thickness dependent near edge x-ray absorption fine structure (NEXAFS) and comparing the cation and anion edge NEXAFS. The thickness dependent NEXAFS shows that the decay length of MIGS depends on rather an alkali halide than a metal, and it is larger for alkali halides with smaller band gap energy.…
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The spatial distribution and site- distribution of metal induced gap states (MIGS) are studied by thickness dependent near edge x-ray absorption fine structure (NEXAFS) and comparing the cation and anion edge NEXAFS. The thickness dependent NEXAFS shows that the decay length of MIGS depends on rather an alkali halide than a metal, and it is larger for alkali halides with smaller band gap energy. By comparing the Cl edge and K edge NEXAFS for KCl/Cu(001), MIGS are found to be states localizing at anion sites.
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Submitted 2 February, 2005;
originally announced February 2005.
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Electric field induced charge injection or exhaustion in organic thin film transistor
Authors:
Manabu Kiguchi,
Manabu Nakayama,
Toshihiro Shimada,
Koichiro Saiki
Abstract:
The conductivity of organic semiconductors is measured {\it in-situ} and continuously with a bottom contact configuration, as a function of film thickness at various gate voltages. The depletion layer thickness can be directly determined as a shift of the threshold thickness at which electric current began to flow. The {\it in-situ} and continuous measurement can also determine qualitatively the…
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The conductivity of organic semiconductors is measured {\it in-situ} and continuously with a bottom contact configuration, as a function of film thickness at various gate voltages. The depletion layer thickness can be directly determined as a shift of the threshold thickness at which electric current began to flow. The {\it in-situ} and continuous measurement can also determine qualitatively the accumulation layer thickness together with the distribution function of injected carriers. The accumulation layer thickness is a few mono layers, and it does not depend on gate voltages, rather depends on the chemical species.
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Submitted 18 November, 2004;
originally announced November 2004.
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Metal-induced gap states in epitaxial organic-insulator/metal interfaces
Authors:
Manabu Kiguchi,
Ryotaro Arita,
Genki Yoshikawa,
Yoshiaki Tanida,
Susumu Ikeda,
Shiro Entani,
Ikuyo Nakai,
Hiroshi Kondoh,
Toshiaki Ohta,
Koichiro Saiki,
Hideo Aoki
Abstract:
We have shown, both experimentally and theoretically, that the metal-induced gap states (MIGS) can exist in epitaxially grown organic insulator/metal interfaces. The experiment is done for alkane/Cu(001) with an element-selective near edge x-ray absorption fine structure (NEXAFS), which exhibits a pre-peak indicative of MIGS. An {\it ab initio} electronic structure calculation supports the exist…
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We have shown, both experimentally and theoretically, that the metal-induced gap states (MIGS) can exist in epitaxially grown organic insulator/metal interfaces. The experiment is done for alkane/Cu(001) with an element-selective near edge x-ray absorption fine structure (NEXAFS), which exhibits a pre-peak indicative of MIGS. An {\it ab initio} electronic structure calculation supports the existence of the MIGS. When the Cu substrate is replaced with Ni, an interface magnetism (spin-polarized organic crystal at the interface) is predicted to be possible with a carrier do**.
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Submitted 31 August, 2004;
originally announced August 2004.
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One-dimensional ordered structure of a-sexithienyl on Cu(110)
Authors:
Manabu Kiguchi,
Shiro Entani,
Genki Yoshikawa,
Koichiro Saiki
Abstract:
We have studied atomic structures of a-sexithienyl (6T) films grown on Cu(110) by near-edge x-ray absorption fine structure (NEXAFS). A one-dimensional (1D) ordered structure of 6T with its molecular long axis parallel to the Cu[001] direction could be fabricated by deposition at 300 K and subsequent annealing at 360 K. Polarization and azimuth-dependent NEXAFS revealed the formation process of…
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We have studied atomic structures of a-sexithienyl (6T) films grown on Cu(110) by near-edge x-ray absorption fine structure (NEXAFS). A one-dimensional (1D) ordered structure of 6T with its molecular long axis parallel to the Cu[001] direction could be fabricated by deposition at 300 K and subsequent annealing at 360 K. Polarization and azimuth-dependent NEXAFS revealed the formation process of the 1D structure and showed the molecular orientation in the in-plane direction directly. We propose here a method to obtain the orientation distribution function of molecules using NEXAFS.
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Submitted 26 March, 2004;
originally announced March 2004.
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Polar surface engineering in ultra-thin MgO(111)/Ag(111) -- possibility of metal-insulator transition and magnetism
Authors:
Ryotaro Arita,
Yoshiaki Tanida,
Shiro Entani,
Manabu Kiguchi,
Koichiro Saiki,
Hideo Aoki
Abstract:
A recent report [Kiguchi {\it et al.}, Phys. Rev. B {\bf 68}, 115402 (2003)] that the (111) surface of 5 MgO layers grown epitaxially on Ag(111) becomes metallic to reduce the electric dipole moment raises a question of what will happen when we have fewer MgO layers. Here we have revealed, first experimentally with electron energy-loss spectroscopy, that MgO(111) remains metallic even when one-l…
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A recent report [Kiguchi {\it et al.}, Phys. Rev. B {\bf 68}, 115402 (2003)] that the (111) surface of 5 MgO layers grown epitaxially on Ag(111) becomes metallic to reduce the electric dipole moment raises a question of what will happen when we have fewer MgO layers. Here we have revealed, first experimentally with electron energy-loss spectroscopy, that MgO(111) remains metallic even when one-layer thick, and theoretically with the density functional theory that the metallization should depend on the nature of the substrate. We further show, with a spin-density functional calculation, that a ferromagnetic instability may be expected for thicker films.
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Submitted 5 January, 2004;
originally announced January 2004.
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Accumulation and depletion layer thicknesses in organic field effect transistors
Authors:
Manabu Kiguchi,
Manabu Nakayama,
Kohei Fujiwara,
Keiji Ueno,
Toshihiro Shimada,
Koichiro Saiki
Abstract:
We present a simple but powerful method to determine the thicknesses of the accumulation and depletion layers and the distribution curve of injected carriers in organic field effect transistors. The conductivity of organic semiconductors in thin film transistors was measured in-situ and continuously with a bottom contact configuration, as a function of film thickness at various gate voltages. Us…
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We present a simple but powerful method to determine the thicknesses of the accumulation and depletion layers and the distribution curve of injected carriers in organic field effect transistors. The conductivity of organic semiconductors in thin film transistors was measured in-situ and continuously with a bottom contact configuration, as a function of film thickness at various gate voltages. Using this method, the thicknesses of the accumulation and depletion layers of pentacene were determined to be 0.9 nm (VG=-15 V) and 5 nm (VG=15 V).
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Submitted 31 October, 2003;
originally announced October 2003.
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Atomic and Electronic Structures of Unreconstructed Polar MgO(111) Thin Film on Ag(111)
Authors:
Manabu Kiguchi,
Shiro Entani,
Koichiro Saiki,
Takayuki Goto,
Atsushi Koma
Abstract:
Atomic and electronic structures of a polar surface of MgO formed on Ag(111) was investigated by using reflection high energy electron diffraction (RHEED), Auger electron spectroscopy, electron energy loss spectroscopy (EELS), and ultraviolet photoemission spectroscopy (UPS). A rather flat unreconstructed polar MgO(111) 1$\times$1 surface could be grown by alternate adsorption of Mg and O$_{2}$…
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Atomic and electronic structures of a polar surface of MgO formed on Ag(111) was investigated by using reflection high energy electron diffraction (RHEED), Auger electron spectroscopy, electron energy loss spectroscopy (EELS), and ultraviolet photoemission spectroscopy (UPS). A rather flat unreconstructed polar MgO(111) 1$\times$1 surface could be grown by alternate adsorption of Mg and O$_{2}$ on Ag(111). The stability of the MgO(111) surface was discussed in terms of interaction between Ag and Mg atoms at the interface, and charge state of the surface atoms. EELS of this surface did not show a band gap region, and finite density of states appeared at the Fermi level in UPS. These results suggest that a polar MgO(111) surface was not an insulating surface but a semiconducting or metallic surface.
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Submitted 13 July, 2003;
originally announced July 2003.
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Metal-Induced Gap States at Well Defined Alkali-Halide/Metal Interfaces
Authors:
Manabu Kiguchi,
Ryotaro Arita,
Genki Yoshikawa,
Yoshiaki Tanida,
Masao Katayama,
Koichiro Saiki,
Atsushi Koma,
Hideo Aoki
Abstract:
In order to search for states specific to insulator/metal interfaces, we have studied epitaxially grown interfaces with element-selective near edge X-ray absorption fine structure (NEXAFS). An extra peak is observed below the bulk edge onset for LiCl films on Cu and Ag substrates. The nature of chemical bonds as probed by X-ray photoemission spectroscopy and Auger electron spectroscopy remains u…
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In order to search for states specific to insulator/metal interfaces, we have studied epitaxially grown interfaces with element-selective near edge X-ray absorption fine structure (NEXAFS). An extra peak is observed below the bulk edge onset for LiCl films on Cu and Ag substrates. The nature of chemical bonds as probed by X-ray photoemission spectroscopy and Auger electron spectroscopy remains unchanged, so we regard this as evidence for metal-induced gap states(MIGS) formed by the proximity to a metal, rather than local bonds at the interface. The dependence on the film thickness shows that the MIGS are as thin as one monolayer. An ab initio electronic structure calculation supports the existence of the MIGS that are strongly localized at the interface.
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Submitted 1 April, 2003;
originally announced April 2003.