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Phase transformation-induced superconducting aluminium-silicon alloy rings
Authors:
B. C. Johnson,
M. Stuiber,
D. L. Creedon,
A. Berhane,
L. H. Willems van Beveren,
S. Rubanov,
J. H. Cole,
V. Mourik,
A. R. Hamilton,
T. L. Duty,
J. C. McCallum
Abstract:
The development of a materials platform that exhibits both superconducting and semiconducting properties is an important endeavour for a range of emerging quantum technologies. We investigate the formation of superconductivity in nanowires fabricated with silicon-on-insulator (SOI). Aluminium from deposited contact electrodes is found to interdiffuses with the Si nanowire structures to form an Al-…
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The development of a materials platform that exhibits both superconducting and semiconducting properties is an important endeavour for a range of emerging quantum technologies. We investigate the formation of superconductivity in nanowires fabricated with silicon-on-insulator (SOI). Aluminium from deposited contact electrodes is found to interdiffuses with the Si nanowire structures to form an Al-Si alloy along the entire length of the predefined nanowire device over micron length scales at temperatures well below that of the Al-Si eutectic. The resultant transformed nanowire structures are layered in geometry with a continuous Al-Si alloy wire sitting on the buried oxide of the SOI and a residual Si cap sitting on top of the wire. The phase transformed material is conformal with any predefined device patterns and the resultant structures are exceptionally smooth-walled compared to similar nanowire devices formed by silicidation processes. The superconducting properties of a mesoscopic AlSi ring formed on a SOI platform are investigated. Low temperature magnetoresistance oscillations, quantized in units of the fluxoid, h/2e, are observed.
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Submitted 12 July, 2022;
originally announced July 2022.
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Isotopic enrichment of silicon by high fluence $^{28}$Si$^-$ ion implantation
Authors:
D. Holmes,
B. C. Johnson,
C. Chua,
B. Voisin,
S. Kocsis,
S. Rubanov,
S. G. Robson,
J. C. McCallum,
D. R McCamey,
S. Rogge,
D. N. Jamieson
Abstract:
Spins in the `semiconductor vacuum' of silicon-28 ($^{28}$Si) are suitable qubit candidates due to their long coherence times. An isotopically purified substrate of $^{28}$Si is required to limit the decoherence pathway caused by magnetic perturbations from surrounding $^{29}$Si nuclear spins (I=1/2), present in natural Si (nat Si) at an abundance of 4.67%. We isotopically enrich surface layers of…
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Spins in the `semiconductor vacuum' of silicon-28 ($^{28}$Si) are suitable qubit candidates due to their long coherence times. An isotopically purified substrate of $^{28}$Si is required to limit the decoherence pathway caused by magnetic perturbations from surrounding $^{29}$Si nuclear spins (I=1/2), present in natural Si (nat Si) at an abundance of 4.67%. We isotopically enrich surface layers of nat Si by sputtering using high fluence $^{28}$Si$^-$ implantation. Phosphorus (P) donors implanted into one such $^{28}$Si layer with ~3000 ppm $^{29}$Si, produced by implanting 30 keV $^{28}$Si$^-$ ions at a fluence of 4x10^18 cm^-2, were measured with pulsed electron spin resonance, confirming successful donor activation upon annealing. The mono-exponential decay of the Hahn echo signal indicates a depletion of $^{29}$Si. A coherence time of T2 = 285 +/- 14 us is extracted, which is longer than that obtained in nat Si for similar do** concentrations and can be increased by reducing the P concentration in future. The isotopic enrichment was improved by employing one-for-one ion sputtering using 45 keV $^{28}$Si$^-$ implantation. A fluence of 2.63x10^18 cm^-2 $^{28}$Si$^-$ ions were implanted at this energy into nat Si, resulting in an isotopically enriched surface layer ~100 nm thick; suitable for providing a sufficient volume of $^{28}$Si for donor qubits implanted into the near-surface region. We observe a depletion of $^{29}$Si to 250 ppm as measured by secondary ion mass spectrometry. The impurity content and the crystallization kinetics via solid phase epitaxy are discussed. The $^{28}$Si layer is confirmed to be a single crystal using transmission electron microscopy. This method of Si isotopic enrichment shows promise for incorporating into the fabrication process flow of Si spin qubit devices.
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Submitted 17 September, 2020;
originally announced September 2020.
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Epitaxial growth of SiC on (100) Diamond
Authors:
A. Tsai,
A. Aghajamali,
N. Dontschuk,
B. C. Johnson,
M. Usman,
A. K. Schenk,
M. Sear,
C. I. Pakes,
L. C. L. Hollenberg,
J. C. McCallum,
S. Rubanov,
A. Tadich,
N. A. Marks,
A. Stacey
Abstract:
We demonstrate locally coherent heteroepitaxial growth of silicon carbide (SiC) on diamond, a result contrary to current understanding of heterojunctions as the lattice mismatch exceeds $20\%$. High-resolution transmission electron microscopy (HRTEM) confirms the quality and atomic structure near the interface. Guided by molecular dynamics simulations, a theoretical model is proposed for the inter…
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We demonstrate locally coherent heteroepitaxial growth of silicon carbide (SiC) on diamond, a result contrary to current understanding of heterojunctions as the lattice mismatch exceeds $20\%$. High-resolution transmission electron microscopy (HRTEM) confirms the quality and atomic structure near the interface. Guided by molecular dynamics simulations, a theoretical model is proposed for the interface wherein the large lattice strain is alleviated via point dislocations in a two-dimensional plane without forming extended defects in three dimensions. The possibility of realising heterojunctions of technologically important materials such as SiC with diamond offers promising pathways for thermal management of high power electronics. At a fundamental level, the study redefines our understanding of heterostructure formation with large lattice mismatch.
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Submitted 17 February, 2020;
originally announced February 2020.
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Characterization of Three-Dimensional Microstructures in Single Crystal Diamond
Authors:
P. Olivero,
S. Rubanov,
P. Reichart,
B. C. Gibson,
S. T. Huntington,
J. R. Rabeau,
A. D. Greentree,
J. Salzman,
D. Moore,
D. N. Jamieson,
S. Prawer
Abstract:
We report on the Raman and photoluminescence characterization of three-dimensional microstructures created in single crystal diamond with a Focused Ion Beam (FIB) assisted lift-off technique. The method is based on MeV ion implantation to create a buried etchable layer, followed by FIB patterning and selective etching. In the applications of such microstructures where the properties of high qualit…
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We report on the Raman and photoluminescence characterization of three-dimensional microstructures created in single crystal diamond with a Focused Ion Beam (FIB) assisted lift-off technique. The method is based on MeV ion implantation to create a buried etchable layer, followed by FIB patterning and selective etching. In the applications of such microstructures where the properties of high quality single crystal diamond are most relevant, residual damage after the fabrication process represents a critical technological issue. The results of Raman and photoluminescence characterization indicate that the partial distortion of the sp3-bonded lattice and the formation of isolated point defects are effectively removed after thermal annealing, leaving low amounts of residual damage in the final structures. Three-dimensional microstructures in single-crystal diamond offer a large range of applications, such as quantum optics devices and fully integrated opto mechanical assemblies.
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Submitted 1 September, 2016;
originally announced September 2016.
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Fabrication of Ultrathin Single-Crystal Diamond Membranes
Authors:
B. A. Fairchild,
P. Olivero,
S. Rubanov,
A. D. Greentree,
F. Waldermann,
R. A. Taylor,
I. Walmsley,
J. M. Smith,
S. Huntington,
B. C. Gibson,
D. N. Jamieson,
S. Prawer
Abstract:
We demonstrate the fabrication of sub-micron layers of single-crystal diamond suitable for subsequent processing as demonstrated by this test ring structure. This method is a significant enabling technology for nanomechanical and photonic structures incorporating colour-centres. The process uses a novel double implant process, annealing and chemical etching to produce membranes of diamond from sin…
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We demonstrate the fabrication of sub-micron layers of single-crystal diamond suitable for subsequent processing as demonstrated by this test ring structure. This method is a significant enabling technology for nanomechanical and photonic structures incorporating colour-centres. The process uses a novel double implant process, annealing and chemical etching to produce membranes of diamond from single-crystal starting material, the thinnest layers achieved to date are 210 nm thick.
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Submitted 31 August, 2016;
originally announced August 2016.
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Structural transformation of implanted diamond layers during high temperature annealing
Authors:
S. Rubanov,
B. A. Fairchild,
A. Suvorova,
P. Olivero,
S. Prawer
Abstract:
In the recent years graphitization of ion-beam induced amorphous layers became the basic tool for device fabrication in diamond. The etchable graphitic layers can be removed to form free-standing membranes into which the desired structures can be sculpted using FIB milling. The optical properties of the devices fabricated using this method are assumed on the model of sharp diamond-air interface. T…
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In the recent years graphitization of ion-beam induced amorphous layers became the basic tool for device fabrication in diamond. The etchable graphitic layers can be removed to form free-standing membranes into which the desired structures can be sculpted using FIB milling. The optical properties of the devices fabricated using this method are assumed on the model of sharp diamond-air interface. The real quality of this interface could depend on degree of graphitization of the amorphous damage layers after annealing. In the present work the graphitization process was studied using conventional and analytical TEM. It was found that annealing at 550 °C results in a partial graphitization of the implanted volume with formation of the nano-crystalline graphitic phase sandwiched between layers of tetrahedral amorphous carbon. Annealing at 1400 °C resulted in complete graphitization of the amorphous layers. The average size of graphite nano-crystals did not exceed 5 nm with predominant orientation of c-planes normal to the sample surface.
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Submitted 25 August, 2016;
originally announced August 2016.
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Effects of high-power laser irradiation on sub-superficial graphitic layers in single crystal diamond
Authors:
F. Picollo,
S. Rubanov,
C. Tomba,
A. Battiato,
E. Enrico,
A. Perrat-Mabilon,
C. Peaucelle,
T. N. Tran Thi,
L. Boarino,
E. Gheeraert,
P. Olivero
Abstract:
We report on the structural modifications induced by a lambda = 532 nm ns-pulsed high-power laser on sub-superficial graphitic layers in single-crystal diamond realized by means of MeV ion implantation. A systematic characterization of the structures obtained under different laser irradiation conditions (power density, number of pulses) and subsequent thermal annealing was performed by different e…
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We report on the structural modifications induced by a lambda = 532 nm ns-pulsed high-power laser on sub-superficial graphitic layers in single-crystal diamond realized by means of MeV ion implantation. A systematic characterization of the structures obtained under different laser irradiation conditions (power density, number of pulses) and subsequent thermal annealing was performed by different electron microscopy techniques. The main feature observed after laser irradiation is the thickening of the pre-existing graphitic layer. Cross sectional SEM imaging was performed to directly measure the thickness of the modified layers, and subsequent selective etching of the buried layers was employed to both assess their graphitic nature and enhance the SEM imaging contrast. In particular, it was found that for optimal irradiation parameters the laser processing induces a six-fold increase the thickness of sub superficial graphitic layers without inducing mechanical failures in the surrounding crystal. TEM microscopy and EELS spectroscopy allowed a detailed analysis of the internal structure of the laser irradiated layers, highlighting the presence of different nano graphitic and amorphous layers. The obtained results demonstrate the effectiveness and versatility of high-power laser irradiation for an accurate tuning of the geometrical and structural features of graphitic structures embedded in single crystal diamond, and open new opportunities in diamond fabrication.
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Submitted 25 August, 2016;
originally announced August 2016.
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A TEM study of Si-SiO2 interfaces in silicon nanodevices
Authors:
Paul Spizzirri,
Sergey Rubanov,
Eric Gauja,
Laurens Willems van Beveren,
Rolf Brenner,
Steven Prawer
Abstract:
The fabrication of micro- and nano-scale silicon electronic devices requires precision lithography and controlled processing to ensure that the electronic properties of the device are optimized. Importantly, the Si-SiO2 interface plays a crucial role in defining these properties. While transmission electron microscopy (TEM) can be used to observe the device architecture, substrate / contact crysta…
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The fabrication of micro- and nano-scale silicon electronic devices requires precision lithography and controlled processing to ensure that the electronic properties of the device are optimized. Importantly, the Si-SiO2 interface plays a crucial role in defining these properties. While transmission electron microscopy (TEM) can be used to observe the device architecture, substrate / contact crystallinity and interfacial roughness, the preparation and isolation of the device active area is problematic. In this work, we describe the use of focussed ion beam technologies to isolate and trench-cut targeted device structures for subsequent TEM analysis. Architectures studied include radio frequency, single electron transistors and electrically detected, magnetic resonance devices that have also undergone ion implantation, rapid thermal and forming gas anneals.
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Submitted 2 March, 2015;
originally announced March 2015.
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Direct measurement and modelling of internal strains in ion-implanted diamond
Authors:
Federico Bosia,
Nicola Argiolas,
Marco Bazzan,
Barbara A. Fairchild,
Andrew D. Greentree,
Desmond W. M. Lau,
Paolo Olivero,
Federico Picollo,
Sergey Rubanov,
Steven Prawer
Abstract:
We present a phenomenological model and Finite Element simulations to describe the depth variation of mass density and strain of ion-implanted single-crystal diamond. Several experiments are employed to validate the approach: firstly, samples implanted with 180 keV B ions at relatively low fluences are characterized using high-resolution X-ray diffraction (HR-XRD); secondly, the mass density varia…
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We present a phenomenological model and Finite Element simulations to describe the depth variation of mass density and strain of ion-implanted single-crystal diamond. Several experiments are employed to validate the approach: firstly, samples implanted with 180 keV B ions at relatively low fluences are characterized using high-resolution X-ray diffraction (HR-XRD); secondly, the mass density variation of a sample implanted with 500 keV He ions well above its amorphization threshold is characterized with Electron Energy Loss Spectroscopy (EELS). At high damage densities, the experimental depth profiles of strain and density display a saturation effect with increasing damage and a shift of the damage density peak towards greater depth values with respect to those predicted by TRIM simulations, which are well accounted for in the model presented here. The model is then further validated by comparing TEM-measured and simulated thickness values of a buried amorphous carbon layer formed at different depths by implantation of 500 keV He ions through a variable-thickness mask to simulate the simultaneous implantation of ions at different energies.
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Submitted 1 March, 2013;
originally announced March 2013.
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Fabrication and electrical characterization of three-dimensional graphitic microchannels in single crystal diamond
Authors:
F. Picollo,
D. Gatto Monticone,
P. Olivero,
B. A. Fairchild,
S. Rubanov,
S. Prawer,
E. Vittone
Abstract:
We report on the systematic characterization of conductive micro-channels fabricated in single-crystal diamond with direct ion microbeam writing. Focused high-energy (~MeV) helium ions are employed to selectively convert diamond with micrometric spatial accuracy to a stable graphitic phase upon thermal annealing, due to the induced structural damage occurring at the end-of-range. A variable-thickn…
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We report on the systematic characterization of conductive micro-channels fabricated in single-crystal diamond with direct ion microbeam writing. Focused high-energy (~MeV) helium ions are employed to selectively convert diamond with micrometric spatial accuracy to a stable graphitic phase upon thermal annealing, due to the induced structural damage occurring at the end-of-range. A variable-thickness mask allows the accurate modulation of the depth at which the microchannels are formed, from several μm deep up to the very surface of the sample. By means of cross-sectional transmission electron microscopy (TEM) we demonstrate that the technique allows the direct writing of amorphous (and graphitic, upon suitable thermal annealing) microstructures extending within the insulating diamond matrix in the three spatial directions, and in particular that buried channels embedded in a highly insulating matrix emerge and electrically connect to the sample surface at specific locations. Moreover, by means of electrical characterization both at room temperature and variable temperature, we investigate the conductivity and the charge-transport mechanisms of microchannels obtained by implantation at different ion fluences and after subsequent thermal processes, demonstrating that upon high-temperature annealing, the channels implanted above a critical damage density convert to a stable graphitic phase. These structures have significant impact for different applications, such as compact ionizing radiation detectors, dosimeters, bio-sensors and more generally diamond-based devices with buried three-dimensional all-carbon electrodes.
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Submitted 13 April, 2012;
originally announced April 2012.
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Reply on the comment on the paper "Superconducting transition in Nb nanowires fabricated using focused ion beam"
Authors:
G. C. Tettamanzi,
A. Potenza,
S. Rubanov,
C. H. Marrows,
S. Prawer
Abstract:
In this communication we present our response to the recent comment of A. Engel regarding our paper on FIB- fabricated Nb nanowires (see Vol. 20 (2009) Pag. 465302). After further analysis and additional experimental evidence, we conclude that our interpretation of the experimental results in light of QPS theory is still valid when compared with the alternative proximity-based model as proposed by…
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In this communication we present our response to the recent comment of A. Engel regarding our paper on FIB- fabricated Nb nanowires (see Vol. 20 (2009) Pag. 465302). After further analysis and additional experimental evidence, we conclude that our interpretation of the experimental results in light of QPS theory is still valid when compared with the alternative proximity-based model as proposed by A. Engel.
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Submitted 29 March, 2010;
originally announced March 2010.
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Superconducting transition in Nb nanowires fabricated using focused ion beam
Authors:
G. C. Tettamanzi,
C. I. Pakes,
A. Potenza,
S. Rubanov,
C. H. Marrows,
S. Prawer
Abstract:
Making use of focused Ga-ion beam (FIB) fabrication technology, the evolution with device dimension of the low-temperature electrical properties of Nb nanowires has been examined in a regime where crossover from Josephson-like to insulating behaviour is evident. Resistance-temperature data for devices with a physical width of order 100 nm demonstrate suppression of superconductivity, leading to di…
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Making use of focused Ga-ion beam (FIB) fabrication technology, the evolution with device dimension of the low-temperature electrical properties of Nb nanowires has been examined in a regime where crossover from Josephson-like to insulating behaviour is evident. Resistance-temperature data for devices with a physical width of order 100 nm demonstrate suppression of superconductivity, leading to dissipative behaviour that is shown to be consistent with the activation of phase-slip below Tc. This study suggests that by exploiting the Ga-impurity poisoning introduced by the FIB into the periphery of the nanowire, a central superconducting phase-slip nanowire with sub-10 nm dimensions may be engineered within the core of the nanowire.
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Submitted 29 March, 2010;
originally announced March 2010.
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Nano-Raman spectroscopy of silicon surfaces
Authors:
P. G. Spizzirri,
J. -H. Fang,
S. Rubanov,
E. Gauja,
S. Prawer
Abstract:
Near-field enhanced, nano-Raman spectroscopy has been successfully used to probe the surface chemistry of silicon prepared using standard wafer cleaning and processing techniques. The results demonstrate the utility of this measurement for probing the local surface chemical nano-environment with very high sensitivity. Enhancements were observed for the vibrational (stretching) modes of Si-H, F-S…
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Near-field enhanced, nano-Raman spectroscopy has been successfully used to probe the surface chemistry of silicon prepared using standard wafer cleaning and processing techniques. The results demonstrate the utility of this measurement for probing the local surface chemical nano-environment with very high sensitivity. Enhancements were observed for the vibrational (stretching) modes of Si-H, F-Si-H and possibly also B-O-Si consistent with the surface treatments applied. The nano-probes did not enhance the phononic features of the silicon substrate.
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Submitted 13 February, 2010;
originally announced February 2010.
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Electrostically defined few-electron double quantum dot in silicon
Authors:
W. H. Lim,
H. Huebl,
L. H. Willems van Beveren,
S. Rubanov,
P. G. Spizzirri,
S. J. Angus,
R. G. Clark,
A. S. Dzurak
Abstract:
A few-electron double quantum dot was fabricated using metal-oxide-semiconductor(MOS)-compatible technology and low-temperature transport measurements were performed to study the energy spectrum of the device. The double dot structure is electrically tunable, enabling the inter-dot coupling to be adjusted over a wide range, as observed in the charge stability diagram. Resonant single-electron tu…
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A few-electron double quantum dot was fabricated using metal-oxide-semiconductor(MOS)-compatible technology and low-temperature transport measurements were performed to study the energy spectrum of the device. The double dot structure is electrically tunable, enabling the inter-dot coupling to be adjusted over a wide range, as observed in the charge stability diagram. Resonant single-electron tunneling through ground and excited states of the double dot was clearly observed in bias spectroscopy measurements.
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Submitted 2 April, 2009;
originally announced April 2009.
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Coherent Population Trap** in Diamond N-V Centers at Zero Magnetic Field
Authors:
Charles Santori,
David Fattal,
Sean M. Spillane,
Marco Fiorentino,
Raymond G. Beausoleil,
Andrew D. Greentree,
Paolo Olivero,
Martin Draganski,
James R. Rabeau,
Patrick Reichart,
Brant C. Gibson,
Sergey Rubanov,
David N. Jamieson,
Steven Prawer
Abstract:
Coherent population trap** at zero magnetic field was observed for nitrogen-vacancy centers in diamond under optical excitation. This was measured as a reduction in photoluminescence when the detuning between two excitation lasers matched the 2.88 GHz crystal-field splitting of the color center ground states. This behavior is highly sensitive to strain, which modifies the excited states, and w…
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Coherent population trap** at zero magnetic field was observed for nitrogen-vacancy centers in diamond under optical excitation. This was measured as a reduction in photoluminescence when the detuning between two excitation lasers matched the 2.88 GHz crystal-field splitting of the color center ground states. This behavior is highly sensitive to strain, which modifies the excited states, and was unexpected following recent experiments demonstrating optical readout of single nitrogen-vacancy electron spins based on cycling transitions. These results demonstrate for the first time that three-level Lambda configurations suitable for proposed quantum information applications can be realized simultaneously for all four orientations of nitrogen-vacancy centers at zero magnetic field.
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Submitted 31 May, 2006; v1 submitted 23 February, 2006;
originally announced February 2006.
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Stabilization of amorphous GaN by oxygen
Authors:
F. Budde,
B. J. Ruck,
A. Koo,
S. Granville,
H. J. Trodahl,
A. Bittar,
G. V. M. Williams,
M. J. Ariza,
B. Bonnet,
D. J. Jones,
J. B. Metson,
S. Rubanov,
P. Munroe
Abstract:
Ion assisted deposition (IAD) has been investigated for the growth of GaN, and the resulting films studied by x-ray diffraction and absorption spectroscopy and by transmission electron microscopy. IAD grown stoichiometric GaN consists of random-stacked quasicrystals of some 3 nm diameter. Amorphous material is formed only by incorporation of 15% or more oxygen, which we attribute to the presence…
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Ion assisted deposition (IAD) has been investigated for the growth of GaN, and the resulting films studied by x-ray diffraction and absorption spectroscopy and by transmission electron microscopy. IAD grown stoichiometric GaN consists of random-stacked quasicrystals of some 3 nm diameter. Amorphous material is formed only by incorporation of 15% or more oxygen, which we attribute to the presence of non-tetrahedral bonds centered on oxygen. The ionic favourability of heteropolar bonds and its strikingly simple constraint to even-membered rings is the likely cause of the instability of stoichiometric a-GaN.
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Submitted 26 July, 2004;
originally announced July 2004.
