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Geometrical magnetoresistance effect and mobility in graphene field-effect transistors
Authors:
Isabel Harrysson Rodrigues,
Andrey Generalov,
Anamul Md Hoque,
Miika Soikkeli,
Anton Murros,
Sanna Arpiainen,
Andrei Vorobiev
Abstract:
Further development of the graphene field-effect transistors (GFETs) for high-frequency electronics requires accurate evaluation and study of the mobility of charge carriers in a specific device. Here, we demonstrate that the mobility in the GFETs can be directly characterized and studied using the geometrical magnetoresistance (gMR) effect. The method is free from the limitations of other approac…
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Further development of the graphene field-effect transistors (GFETs) for high-frequency electronics requires accurate evaluation and study of the mobility of charge carriers in a specific device. Here, we demonstrate that the mobility in the GFETs can be directly characterized and studied using the geometrical magnetoresistance (gMR) effect. The method is free from the limitations of other approaches since it does not require an assumption of the constant mobility and the knowledge of the gate capacitance. Studies of a few sets of GFETs in the wide range of transverse magnetic fields indicate that the gMR effect dominates up to approximately 0.55 T. In higher fields, the physical magnetoresistance effect starts to contribute. The advantages of the gMR approach allowed us to interpret the measured dependencies of mobility on the gate voltage, i.e., carrier concentration, and identify the corresponding scattering mechanisms. In particular, the range of the fairly constant mobility is associated with the dominating Coulomb scattering. The decrease in mobility at higher carrier concentrations is associated with the contribution of the phonon scattering. Analysis shows that the gMR mobility is typically 2-3 times higher than that found via the commonly used drain resistance model. The latter underestimates the mobility since it does not take the interfacial capacitance into account.
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Submitted 6 June, 2022; v1 submitted 30 May, 2022;
originally announced May 2022.
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On the Angular Dependence of InP High Electron Mobility Transistors for Cryogenic Low Noise Amplifiers in a Magnetic Field
Authors:
Isabel Harrysson Rodrigues,
David Niepce,
Arsalan Pourkabirian,
Giuseppe Moschetti,
Joel Schleeh,
Thilo Bauch,
Jan Grahn
Abstract:
The InGaAs-InAlAs-InP high electron mobility transistor (InP HEMT) is the preferred active device used in a cryogenic low noise amplifier (LNA) for sensitive detection of microwave signals. We observed that an InP HEMT 0.3-14GHz LNA at 2K, where the in-going transistors were oriented perpendicular to a magnetic field, heavily degraded in gain and average noise temperature already up to 1.5T. Dc me…
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The InGaAs-InAlAs-InP high electron mobility transistor (InP HEMT) is the preferred active device used in a cryogenic low noise amplifier (LNA) for sensitive detection of microwave signals. We observed that an InP HEMT 0.3-14GHz LNA at 2K, where the in-going transistors were oriented perpendicular to a magnetic field, heavily degraded in gain and average noise temperature already up to 1.5T. Dc measurements for InP HEMTs at 2K revealed a strong reduction in the transistor output current as a function of static magnetic field up to 14T. In contrast, the current reduction was insignificant when the InP HEMT was oriented parallel to the magnetic field. Given the transistor layout with large gate width/gate length ratio, the results suggest a strong geometrical magnetoresistance effect occurring in the InP HEMT. This was confirmed in the angular dependence of the transistor output current with respect to the magnetic field. Key device parameters such as transconductance and on-resistance were significantly affected at small angles and magnetic fields. The strong angular dependence of the InP HEMT output current in a magnetic field has important implications for the alignment of cryogenic LNAs in microwave detection experiments involving magnetic fields.
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Submitted 29 April, 2019;
originally announced April 2019.
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Origin and evolution of surface spin current in topological insulators
Authors:
André Dankert,
Priyamvada Bhaskar,
Dmitrii Khokhriakov,
Isabel H. Rodrigues,
Bogdan Karpiak,
M. Venkata Kamalakar,
Sophie Charpentier,
Ion Garate,
Saroj P. Dash
Abstract:
The Dirac surface states of topological insulators offer a unique possibility for creating spin polarized charge currents due to the spin-momentum locking. Here we demonstrate that the control over the bulk and surface contribution is crucial to maximize the charge-to-spin conversion efficiency. We observe an enhancement of the spin signal due to surface-dominated spin polarization while freezing…
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The Dirac surface states of topological insulators offer a unique possibility for creating spin polarized charge currents due to the spin-momentum locking. Here we demonstrate that the control over the bulk and surface contribution is crucial to maximize the charge-to-spin conversion efficiency. We observe an enhancement of the spin signal due to surface-dominated spin polarization while freezing out the bulk conductivity in semiconducting Bi1.5Sb0.5Te1.7Se1.3 below 100K. Detailed measurements up to room temperature exhibit a strong reduction of the magnetoresistance signal between 2 and 100K, which we attribute to the thermal excitation of bulk carriers and to the electron-phonon coupling in the surface states. The presence and dominance of this effect up to room temperature is promising for spintronic science and technology.
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Submitted 26 April, 2018;
originally announced April 2018.