Skip to main content

Showing 1–12 of 12 results for author: Reuther, H

.
  1. InP nanocrystals on silicon for optoelectronic applications

    Authors: Slawomir Prucnal, Shengqiang Zhou, Xin Ou, Helfried Reuther, Maciej Oskar Liedke, Arndt Mücklich, Manfred Helm, Jerzy Zuk, Marcin Turek, Krzysztof Pyszniak, Wolfgang Skorupa

    Abstract: One of the solutions enabling performance progress, which can overcome the downsizing limit in silicon technology, is the integration of different functional optoelectronic devices within a single chip. Silicon with its indirect band gap has poor optical properties, which is its main drawback. Therefore, a different material has to be used for the on-chip optical interconnections, e.g. a direct ba… ▽ More

    Submitted 11 November, 2012; originally announced November 2012.

    Comments: 13 pages, 7 figures

    Journal ref: Nanotechnology 23, 485204 (2012)

  2. arXiv:1209.5868  [pdf

    cond-mat.mtrl-sci

    Substrate effect on the resistive switching in BiFeO3 thin films

    Authors: Yao Shuai, Xin Ou, Chuangui Wu, Wanli Zhang, Shengqiang Zhou, Danilo Buerger, Helfried Reuther, Stefan Slesazeck, Thomas Mikolajick, Manfred Helm, Heidemarie Schmidt

    Abstract: BiFeO3 thin films have been deposited on Pt/sapphire and Pt/Ti/SiO2/Si substrates with pulsed laser deposition using the same growth conditions, respectively. Au was sputtered as the top electrode. The microscopic structure of the thin film varies by changing the underlying substrate. Thin films on Pt/sapphire are not resistively switchable due to the formation of Schottky contacts at both the top… ▽ More

    Submitted 26 September, 2012; originally announced September 2012.

    Comments: 11 pages, 3 figures

    Journal ref: J. Appl. Phys. 111, 07D906 (2012)

  3. Effect of He-ion irradiation on Fe-Cr alloys: Mössbauer - effect study

    Authors: S. M. Dubiel, J. Cieslak, H. Reuther

    Abstract: Effect of He ion irradiation on three model Fe(100-x)Cr(x) alloys (x =5.8, 10.75 and 15.15) was investigated with the conversion electron Mössbauer spectroscopy. The study of the alloys irradiated with 25 keV ions revealed that the strongest effect occured in the Fe(84.85)Cr(15.15) sample where an inversion of a short-range-order (SRO) parameter was found. Consequently, the investigation of the in… ▽ More

    Submitted 23 May, 2012; originally announced May 2012.

    Comments: 10 pages, 6 figures

    Journal ref: J. Nucl. Mater., 434, 235 (2013)

  4. arXiv:1205.3475  [pdf, ps, other

    cond-mat.mtrl-sci

    GaMnN epitaxial films with high magnetization

    Authors: Gerd Kunert, Sylwia Dobkowska, Tian Li, Helfried Reuther, Carsten Kruse, Stephan Figge, Rafal Jakiela, Alberta Bonanni, Jörg Grenzer, Wiktor Stefanowicz, Maciej Sawicki, Tomasz Dietl, Detlef Hommel

    Abstract: We report on the fabrication of pseudomorphic wurtzite GaMnN grown on GaN with Mn concentrations up to 10% using molecular beam epitaxy. According to Rutherford backscattering the Mn ions are mainly at the Ga-substitutional positions, and they are homogeneously distributed according to depth-resolved Auger-electron spectroscopy and secondary-ion mass-spectroscopy measurements. A random Mn distribu… ▽ More

    Submitted 17 May, 2012; v1 submitted 15 May, 2012; originally announced May 2012.

    Comments: 5 pages, 5 postscript figures, typo corrected, to appear in Applied Physics Letters Journal

    Journal ref: Appl. Phys. Lett. 101, 022413 (2012)

  5. arXiv:1105.3825  [pdf

    cond-mat.mtrl-sci

    Reduced leakage current in BiFeO3 thin films with rectifying contacts

    Authors: Yao Shuai, Shengqiang Zhou, Stephan Streit, Helfried Reuther, Danilo Bürger, Stefan Slesazeck, Thomas Mikolajick, Manfred Helm, Heidemarie Schmidt

    Abstract: BiFeO3 thin films were grown on Pt/c-sapphire substrates by pulsed laser deposition with different growth rates. With increasing growth rate the leakage current is decreased and the conduction mechanism changes from bulk-limited Poole-Frenkel emission to interface-limited Schottky emission. In the present work, we show that only the growth rate of the BiFeO3 films close to the metal contacts has t… ▽ More

    Submitted 19 May, 2011; originally announced May 2011.

    Comments: 15 pages, 4 figures, accepted by Appl. Phys. Lett

    Journal ref: Appl. Phys. Lett. 98, 232901 (2011)

  6. arXiv:1104.5103  [pdf

    cond-mat.mtrl-sci

    Decisive role of oxygen vacancy in ferroelectric vs. ferromagnetic Mn-doped BaTiO3 thin films

    Authors: Yao Shuai, Shengqiang Zhou, Danilo Bürger, Helfried Reuther, Ilona Skorupa, Varun John, Manfred Helm, Heidemarie Schmidt

    Abstract: Single-phase perovskite 5 at.% Mn-doped and undoped polycrystalline BaTiO3 thin films have been grown under different oxygen partial pressures by pulsed laser deposition on platinum-coated sapphire substrates. Ferroelectricity is only observed for the Mn-doped and undoped BaTiO3 thin films grown under relatively high oxygen partial pressure. Compared to undoped BaTiO3, Mn-doped BaTiO3 reveals a lo… ▽ More

    Submitted 27 April, 2011; originally announced April 2011.

    Comments: 36 pages, 11 figures

    Journal ref: J. Appl. Phys. 109, 084105 (2011)

  7. arXiv:0908.0405  [pdf, ps, other

    cond-mat.mtrl-sci

    Fe-implanted ZnO: Magnetic precipitates versus dilution

    Authors: Shengqiang Zhou, K. Potzger, G. Talut, H. Reuther, J. von Borany, R. Groetzschel, W. Skorupa, M. Helm, J. Fassbender, N. Volbers, M. Lorenz, T. Herrmannsdoerfer

    Abstract: Nowadays ferromagnetism is often found in potential diluted magnetic semiconductor systems. However, many authors argue that the observed ferromagnetism stems from ferromagnetic precipitates or spinodal decomposition rather than from carrier mediated magnetic impurities, as required for a diluted magnetic semiconductor. In the present paper we answer this question for Fe-implanted ZnO single cry… ▽ More

    Submitted 4 August, 2009; originally announced August 2009.

    Comments: 14 pages, 17 figures

    Journal ref: J. Appl. Phys. 103, 023902 (2008)

  8. Ferromagnetism and suppression of metallic clusters in Fe implanted ZnO - a phenomenon related to defects?

    Authors: Shengqiang Zhou, K. Potzger, G. Talut, H. Reuther, K. Kuepper, J. Grenzer, Qingyu Xu, A. Muecklich M. Helm, J. Fassbender, E. Arenholz

    Abstract: We investigated ZnO(0001) single crystals annealed in high vacuum with respect to their magnetic properties and cluster formation tendency after implant-do** with Fe. While metallic Fe cluster formation is suppressed, no evidence for the relevance of the Fe magnetic moment for the observed ferromagnetism was found. The latter along with the cluster suppression is discussed with respect to defe… ▽ More

    Submitted 4 August, 2009; originally announced August 2009.

    Comments: 20 pages, 6 figures

    Journal ref: J. Phys. D: Appl. Phys. 41 105011 (2008)

  9. arXiv:0908.0396  [pdf

    cond-mat.mtrl-sci

    Suppression of secondary phase formation in Fe implanted ZnO single crystals

    Authors: K. Potzger, Shengqiang Zhou, H. Reuther, K. Kuepper, G. Talut, M. Helm, J. Fassbender, J. D. Denlinger

    Abstract: Unwanted secondary phases are one of the major problems in diluted magnetic semiconductor creation. Here, the authors show possibilities to avoid such phases in Fe implanted and postannealed ZnO(0001) single crystals. While -Fe nanoparticles are formed after such do** in as-polished crystals, high temperature (1273 K) annealing in O2 or high vacuum before implantation suppresses these phases.… ▽ More

    Submitted 4 August, 2009; originally announced August 2009.

    Comments: 6 pages, 4 figures

    Journal ref: Appl. Phys. Lett. 91, 062107 (2007)

  10. Crystallographically oriented magnetic ZnFe2O4 nanoparticles synthesized by Fe implantation into ZnO

    Authors: Shengqiang Zhou, K. Potzger, H. Reuther, G. Talut, F. Eichhorn, J. von Borany, W. Skorupa, M. Helm, J. Fassbender

    Abstract: In this paper, a correlation between structural and magnetic properties of Fe implanted ZnO is presented. High fluence Fe^+ implantation into ZnO leads to the formation of superparamagnetic alpha-Fe nanoparticles. High vacuum annealing at 823 K results in the growth of alpha-Fe particles, but the annealing at 1073 K oxidized the majority of the Fe nanoparticles. After a long term annealing at 10… ▽ More

    Submitted 18 December, 2006; originally announced December 2006.

    Comments: 21 pages, 7 figures, accepted by J. Phys. D: Appl. Phys

    Journal ref: J. Phys. D: Appl. Phys. 40 964-969 (2007)

  11. arXiv:cond-mat/0612356  [pdf

    cond-mat.mtrl-sci

    Absence of ferromagnetism in V-implanted ZnO single crystals

    Authors: Shengqiang Zhou, K. Potzger, H. Reuther, K. Kuepper, W. Skorupa, M. Helm, J. Fassbender

    Abstract: The structural and magnetic properties of V doped ZnO are presented. V ions were introduced into hydrothermal ZnO single crystals by ion implantation with fluences of 1.2*10^16 to 6*10^16 cm^-2. Post-implantation annealing was performed in high vacuum from 823 K to 1023 K. The ZnO host material still partly remains in a crystalline state after irradiation, and is partly recovered by annealing. T… ▽ More

    Submitted 14 December, 2006; originally announced December 2006.

    Comments: 13 pages, 4 figs, MMM conference 2007, accepted by J. Appl. Phys

  12. arXiv:cond-mat/0512267  [pdf

    cond-mat.mtrl-sci

    Fe implanted ferromagnetic ZnO

    Authors: K. Potzger, Shengqiang Zhou, H. Reuther, A. Muecklich, F. Eichhorn, N. Schell, W. Skorupa, M. Helm, J. Fassbender, T. Herrmannsdoerfer, T. P. Papageorgiou

    Abstract: Room-temperature ferromagnetism has been induced within ZnO single crystals by implant-do** with Fe ions. For an implantation temperature of 620 K and an ion fluence of 4x10^16 cm^-2, very tiny Fe particles, formed inside the host matrix, are responsible for the ferromagnetic properties. They were identified using synchrotron X-ray diffraction and Moessbauer spectroscopy. On the other hand, Fe… ▽ More

    Submitted 13 December, 2005; originally announced December 2005.

    Comments: 13 pages, 2 figs, to be published in Appl. Phys. Lett

    Journal ref: Appl. Phys. Lett. 88, 052508 (2006)