Programmable activation of quantum emitters in high-purity silicon with focused carbon ion beams
Authors:
M. Hollenbach,
N. Klingner,
P. Mazarov,
W. Pilz,
A. Nadzeyka,
F. Mayer,
N. V. Abrosimov,
L. Bischoff,
G. Hlawacek,
M. Helm,
G. V. Astakhov
Abstract:
Carbon implantation at the nanoscale is highly desired for the engineering of defect-based qubits in a variety of materials, including silicon, diamond, SiC and hBN. However, the lack of focused carbon ion beams does not allow for the full disclosure of their potential for application in quantum technologies. Here, we develop and use a carbon source for focused ion beams for the simultaneous creat…
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Carbon implantation at the nanoscale is highly desired for the engineering of defect-based qubits in a variety of materials, including silicon, diamond, SiC and hBN. However, the lack of focused carbon ion beams does not allow for the full disclosure of their potential for application in quantum technologies. Here, we develop and use a carbon source for focused ion beams for the simultaneous creation of two types of quantum emitters in silicon, the W and G centers. Furthermore, we apply a multi-step implantation protocol for the programmable activation of the G centers with sub-100- nm resolution. This approach provides a route for significant enhancement of the creation yield of single G centers in carbon-free silicon wafers. Our experimental demonstration is an important step towards nanoscale engineering of telecom quantum emitters in silicon of high crystalline quality and isotope purity.
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Submitted 30 April, 2024;
originally announced April 2024.
Boron Liquid Metal Alloy Ion Sources For Special FIB Applications
Authors:
Lothar Bischoff,
Nico Klingner,
Paul Mazarov,
Wolfgang Pilz,
Florian Meyer
Abstract:
Focused Ion Beam (FIB) processing has been established as a well-suited and promising technique in R&D in nearly all fields of nanotechnology for patterning and prototy** on the micro and nanometer scale and below. Among other concepts, liquid metal alloy ion sources (LMAIS) are one of the alternatives to conventional gallium beams to extend the FIB application field. To meet the rising demand f…
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Focused Ion Beam (FIB) processing has been established as a well-suited and promising technique in R&D in nearly all fields of nanotechnology for patterning and prototy** on the micro and nanometer scale and below. Among other concepts, liquid metal alloy ion sources (LMAIS) are one of the alternatives to conventional gallium beams to extend the FIB application field. To meet the rising demand for light ions, different boron containing alloys were investigated in this work. A promising solution was found in a Co31Nd64B5 based LMAIS which will be introduced in more detail. Besides cobalt as a ferromagnetic element and the rare earth element neodymium, boron in particular is of interest for special FIB applications like local p-type do**, for which resolution of about 30 nm has been achieved so far.
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Submitted 27 April, 2020;
originally announced April 2020.