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NV microscopy of thermally controlled stresses caused by Cr$_2$O$_3$ thin films
Authors:
Andris Berzins,
Janis Smits,
Andrejs Petruhins,
Roberts Rimsa,
Gatis Mozolevskis,
Martins Zubkins,
Ilja Fescenko
Abstract:
Many modern applications, including quantum computing and quantum sensing, use substrate-film interfaces. Particularly, thin films of chromium or titanium and their oxides are commonly used to bind various structures, such as resonators, masks, or microwave antennas, to a diamond surface. Due to different thermal expansions of involved materials, such films and structures could produce significant…
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Many modern applications, including quantum computing and quantum sensing, use substrate-film interfaces. Particularly, thin films of chromium or titanium and their oxides are commonly used to bind various structures, such as resonators, masks, or microwave antennas, to a diamond surface. Due to different thermal expansions of involved materials, such films and structures could produce significant stresses, which need to be measured or predicted. In this paper, we demonstrate imaging of stresses in the top layer of diamond with deposited structures of Cr$_2$O$_3$ at temperatures 19$^{\circ}$C and 37$^{\circ}$C by using stress-sensitive optically detected magnetic resonances (ODMR) in NV centers. We also calculated stresses in the diamond-film interface by using finite-element analysis and correlated them to measured ODMR frequency shifts. As predicted by the simulation, the measured high-contrast frequency-shift patterns are only due to thermal stresses, whose spin-stress coupling constant along the NV axis is 21$\pm$1 MHz/GPa, that is in agreement with constants previously obtained from single NV centers in diamond cantilever. We demonstrate that NV microscopy is a convenient platform for optically detecting and quantifying spatial distributions of stresses in diamond-based photonic devices with micrometer precision and propose thin films as a means for local application of temperature-controlled stresses. Our results also show that thin film structures produce significant stresses in diamond substrates, which should be accounted for in NV-based applications.
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Submitted 9 February, 2023; v1 submitted 25 November, 2021;
originally announced November 2021.
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Surface magnetic structure investigation of a nanolaminated Mn$_2$GaC thin film using a magnetic field microscope based on Nitrogen-Vacancy centers
Authors:
Andris Berzins,
Janis Smits,
Andrejs Petruhins,
Hugo Grube
Abstract:
This work presents a magnetic field imaging method based on color centers in diamond crystal applied to a thin film of a nanolaminated Mn$_2$GaC MAX phase. Magnetic properties of the surface related structures have been described around the first order transition at 214 K by performing measurements in the temperature range between 200 K and 235 K with the surface features fading out by increasing…
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This work presents a magnetic field imaging method based on color centers in diamond crystal applied to a thin film of a nanolaminated Mn$_2$GaC MAX phase. Magnetic properties of the surface related structures have been described around the first order transition at 214 K by performing measurements in the temperature range between 200 K and 235 K with the surface features fading out by increasing temperature above the transition temperature. The results presented here demonstrate how Nitrogen-Vacancy center based magnetic microscopy can supplement the traditionally used set of experimental techniques, giving additional information of microscopic scale magnetic field features, and allowing to investigate the temperature dependent magnetic behavior. The additional information acquired in this way is relevant to applications where surface magnetic properties are of essence.
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Submitted 11 November, 2020;
originally announced November 2020.
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Characterization of microscopic ferromagnetic defects in thin films using magnetic microscope based on Nitrogen-Vacancy centres
Authors:
Andris Berzins,
Janis Smits,
Andrejs Petruhins
Abstract:
In this work we present results acquired by applying magnetic field imaging technique based on Nitrogen-Vacancy centres in diamond crystal for characterization of magnetic thin films defects. We used the constructed wide-field magnetic microscope for measurements of two kinds of magnetic defects in thin films. One family of defects under study was a result of non-optimal thin film growth condition…
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In this work we present results acquired by applying magnetic field imaging technique based on Nitrogen-Vacancy centres in diamond crystal for characterization of magnetic thin films defects. We used the constructed wide-field magnetic microscope for measurements of two kinds of magnetic defects in thin films. One family of defects under study was a result of non-optimal thin film growth conditions. The magnetic field maps of several regions of the thin films created under very similar conditions to previously published research revealed microscopic impurity islands of ferromagnetic defects, that potentially could disturb the magnetic properties of the surface. The second part of the measurements was dedicated to defects created post deposition - mechanical defects introduced in ferromagnetic thin films. In both cases, the measurements identify the magnetic field amplitude and distribution of the magnetic defects. In addition, the magnetic field maps were correlated with the corresponding optical images. As this method has great potential for quality control of different stages of magnetic thin film manufacturing process and it can rival other widely used measurement techniques, we also propose solutions for the optimization of the device in the perspective of high throughput.
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Submitted 30 October, 2020;
originally announced October 2020.
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Investigation of temperature dependence of magnetic properties of Cr$_2$O$_3$ thin film structure using a magnetic field imaging technique based on Nitrogen-Vacancy centres in diamond crystal
Authors:
Andris Berzins,
Janis Smits,
Andrejs Petruhins,
Roberts Rimsa,
Martins Zubkins,
Gatis Mozolevskis
Abstract:
This work presents a magnetic field imaging method based on color centres in diamond crystal applied to thin film structure. To demonstrate the capacity of our device we have used it for characterization of magnetic properties in microscopic scale of Cr$_2$O$_3$ thin film structure above and below Néel temperature. The obtained measurement results clearly identify the detection of the magnetic pha…
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This work presents a magnetic field imaging method based on color centres in diamond crystal applied to thin film structure. To demonstrate the capacity of our device we have used it for characterization of magnetic properties in microscopic scale of Cr$_2$O$_3$ thin film structure above and below Néel temperature. The obtained measurement results clearly identify the detection of the magnetic phase transition of Cr$_2$O$_3$ thin film with an unexpected diamagnetic like behaviour at 19$^{\circ}$C (below the Néel temperature of Cr$_2$O$_3$). To have better insights in the magnetic fields created by the thin films we present simulations of the magnetic fields near the thin film surface. We also analysed the optically detected magnetic resonance (ODMR) profiles to be sure that the measured property is related only to the shift of the optically detected magnetic resonance. We demonstrate how Nitrogen-Vacancy centre based magnetometry can deliver a convenient platform for research of phase transition dynamics and spatial magnetic field distributions of thin films, that can rival other widely used measurement techniques.
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Submitted 17 December, 2021; v1 submitted 10 August, 2020;
originally announced August 2020.
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Deposition of MAX phase containing thin films from a (Ti,Zr)2AlC compound target
Authors:
Clio Azina,
Bensu Tunca,
Andrejs Petruhins,
Binbin Xin,
Melike Yildizhan,
Per O. Å. Persson,
Jozef Vleugels,
Konstantina Lambrinou,
Johanna Rosén,
Per Eklund
Abstract:
This work reports on sputter depositions carried out from a compound (Ti,Zr)2AlC target, whereupon Al-containing (Ti,Zr)C thin films (30-40 nm in thickness) were deposited on MgO(111) and Al2O3(0001) substrates at temperatures ranging between 500 and 900 °C. The presence of Al within the carbide structure was evidenced by lattice parameter variations. Furthermore, chemical analyses showed that the…
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This work reports on sputter depositions carried out from a compound (Ti,Zr)2AlC target, whereupon Al-containing (Ti,Zr)C thin films (30-40 nm in thickness) were deposited on MgO(111) and Al2O3(0001) substrates at temperatures ranging between 500 and 900 °C. The presence of Al within the carbide structure was evidenced by lattice parameter variations. Furthermore, chemical analyses showed that the Al distribution throughout the film thickness was fairly homogeneous. Thicker films (80-90 nm) deposited from the same compound target consisted of the pseudo-binary (Ti,Zr)C and intermetallic compounds in the Ti-Zr-Al system up to 800 °C, as well as solid solution MAX phases with different Ti:Zr ratios at 900 °C. X-ray diffraction and transmission electron microscopy showed that both (Ti,Zr)2AlC and (Ti,Zr)3AlC2 solid solution MAX phases were formed. Moreover, this work discusses the growth mechanism of the thicker films, which started with the formation of the mixed (Ti,Zr)C carbide, followed by the nucleation and growth of aluminides, eventually leading to the formation of the MAX phases, which was the primary objective of the sputter depositions.
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Submitted 12 August, 2020; v1 submitted 9 September, 2019;
originally announced September 2019.
