Showing 1–1 of 1 results for author: Peng, N H
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Josephson effects in MgB2 meta masked ion damage junctions
Authors:
D. -J. Kang,
N. H. Peng,
R. Webb,
C. Jeynes,
J. H. Yun,
S. H. Moon,
D. Oh,
G. Burnell,
E. J. Tarte,
D. F. Moore,
M. G. Blamire
Abstract:
Ion beam damage combined with nanoscale focused ion beam direct milling was used to create manufacturable SNS type Josephson junctions in 100 nm thick MgB$_{2}$ with T$_{C}$ of 38 K. The junctions show non-hysteretic current - voltage characteristics between 36 and 4.2 K. Experimental evidence for the dc and ac Josephson effects in MgB$_{2}$ metal masked ion damage junctions are presented. This…
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Ion beam damage combined with nanoscale focused ion beam direct milling was used to create manufacturable SNS type Josephson junctions in 100 nm thick MgB$_{2}$ with T$_{C}$ of 38 K. The junctions show non-hysteretic current - voltage characteristics between 36 and 4.2 K. Experimental evidence for the dc and ac Josephson effects in MgB$_{2}$ metal masked ion damage junctions are presented. This technique is particularly useful for prototy** devices due to its simplicity and flexibility of fabrication and has a great potential for high-density integration.
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Submitted 12 June, 2002;
originally announced June 2002.
