Effect of magnetic field configuration on double layer formation and reverse discharge ignition in bipolar HiPIMS
Authors:
M. Farahani,
T. Kozák,
A. D. Pajdarová,
J. Čapek
Abstract:
The reverse discharge (RD) phenomenon in bipolar HiPIMS has been observed when a sufficiently long positive pulse is applied to the magnetron. Due to the magnetic field, electrons accumulated behind the magnetic trap are prevented from reaching the positive target. Consequently, a space charge double layer (DL) is formed between the positive target and the plasma behind the magnetic trap, leading…
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The reverse discharge (RD) phenomenon in bipolar HiPIMS has been observed when a sufficiently long positive pulse is applied to the magnetron. Due to the magnetic field, electrons accumulated behind the magnetic trap are prevented from reaching the positive target. Consequently, a space charge double layer (DL) is formed between the positive target and the plasma behind the magnetic trap, leading to electron acceleration across the DL and RD ignition. This study reveals the significant impact of the magnetic field configuration on RD ignition. Experiments are performed using a Ti target involving magnetic field variation, wire probe measurements of floating potential, and optical emission spectroscopy imaging. It is found that adjusting the magnetic field to a more balanced configuration leads to earlier RD ignition, while a more unbalanced one delays or even prevents it. Specifically, the time of RD ignition decreases with an increase in the magnetic null point distance from the target. Moreover, the size and shape of optical emission in the RD varies with nearby probe placement, suggesting sensitivity to external electrodes.
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Submitted 23 May, 2024;
originally announced May 2024.
On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge
Authors:
Andrea Dagmar Pajdarová,
Tomáš Kozák,
Tomáš Tölg,
Jiří Čapek
Abstract:
Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35mm, 60mm, and 100mm) was carried out during long positive voltage pulses (a duration of 500$μ$s and a preset positive voltage of 100V) in bipolar High-Power Impulse Magnetron Sputtering of a Ti target (a diameter of 100mm) using an unbalanced magnetron. Fast-camera spectroscopy imaging re…
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Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35mm, 60mm, and 100mm) was carried out during long positive voltage pulses (a duration of 500$μ$s and a preset positive voltage of 100V) in bipolar High-Power Impulse Magnetron Sputtering of a Ti target (a diameter of 100mm) using an unbalanced magnetron. Fast-camera spectroscopy imaging recorded light emission from Ar and Ti atoms and singly charged ions during positive voltage pulses. It was found that during the long positive voltage pulse, the floating and the plasma potentials suddenly decrease, which is accompanied by the presence of anode light located on the discharge centerline between the target center and the magnetic null of the magnetron's magnetic field. These light patterns are related to the ignition of a reverse discharge, which leads to the subsequent rise in the plasma and the floating potentials. The reversed discharge is burning up to the end of the positive voltage pulse, but the plasma and floating potentials have lower values than the values from the initial part of the positive voltage pulse. Secondary electron emission induced by the im**ing Ar$^+$ ions to the grounded surfaces in the vicinity of the discharge plasma together with the mirror configuration of the magnetron magnetic field are identified as the probable causes of the charge double-layer structure formation in front of the target and the ignition of the reverse discharge.
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Submitted 27 March, 2024;
originally announced March 2024.
