-
ZnO-Based Polariton Laser Operating at Room Temperature: From Excitonic to Photonic Condensate
Authors:
Feng Li,
Laurent Orosz,
Olfa Kamoun,
Sophie Bouchoule,
Christelle Brimont,
Pierre Disseix,
Thierry Guillet,
Xavier Lafosse,
Mathieu Leroux,
Joel Leymarie,
Meletis Mexis,
Martine Mihailovic,
François Réveret,
Dmitry Solnyshkov,
Jesus Zuniga-Perez,
Guillaume Malpuech
Abstract:
A laser threshold is determined by the gain condition, which has been progressively reduced by the use of heterostructures and of quantum confinement. The polariton laser is the ultimate step of this evolution: coherent emission is obtained from the spontaneous decay of an exciton-polariton condensate, without the achievement of any gain condition. ZnO, with its unique excitonic properties, is the…
▽ More
A laser threshold is determined by the gain condition, which has been progressively reduced by the use of heterostructures and of quantum confinement. The polariton laser is the ultimate step of this evolution: coherent emission is obtained from the spontaneous decay of an exciton-polariton condensate, without the achievement of any gain condition. ZnO, with its unique excitonic properties, is the best choice for a blue/UV-emitting polariton laser device. We report on the fabrication of a new family of fully hybrid microcavities that combine the best-quality ZnO material available (bulk substrate) and two dielectric distributed Bragg reflectors, demonstrating large quality factors (>2500) and Rabi splittings (~200 meV). Low threshold polariton lasing is achieved between 4 and 300 K and for excitonic fractions ranging between 12% and 96 %. A phase diagram highlighting the role of LO phonon-assisted relaxation in this polar semiconductor is established, and a remarkable switching between polariton modes is demonstrated.
△ Less
Submitted 31 July, 2012;
originally announced July 2012.
-
LO-phonon assisted polariton lasing in a ZnO based microcavity
Authors:
L. Orosz,
F. Réveret,
F. Médard,
P. Disseix,
J. Leymarie,
M. Mihailovic,
D. Solnyshkov,
G. Malpuech,
J. Zuniga-Pérez,
F. Semond,
M. Leroux,
S. Bouchoule,
X. Lafosse,
M. Mexis,
C. Brimont,
T. Guillet
Abstract:
Polariton relaxation mechanisms are analysed experimentally and theoretically in a ZnO-based polariton laser. A minimum lasing threshold is obtained when the energy difference between the exciton reservoir and the bottom of the lower polariton branch is resonant with the LO phonon energy. Tuning off this resonance increases the threshold, and exciton-exciton scattering processes become involved in…
▽ More
Polariton relaxation mechanisms are analysed experimentally and theoretically in a ZnO-based polariton laser. A minimum lasing threshold is obtained when the energy difference between the exciton reservoir and the bottom of the lower polariton branch is resonant with the LO phonon energy. Tuning off this resonance increases the threshold, and exciton-exciton scattering processes become involved in the polariton relaxation. These observations are qualitatively reproduced by simulations based on the numerical solution of the semi-classical Boltzmann equations.
△ Less
Submitted 30 November, 2011;
originally announced December 2011.
-
Fabrication and Optical Properties of a Fully Hybrid Epitaxial ZnO-Based Microcavity in the Strong Coupling Regime
Authors:
L. Orosz,
F. Réveret,
S. Bouchoule,
J. Zúñiga-Pérez,
F. Médard,
J. Leymarie,
P. Disseix,
M. Mihailovic,
E. Frayssinet,
F. Semond,
M. Leroux,
M. Mexis,
C. Brimont,
T. Guillet
Abstract:
In order to achieve polariton lasing at room temperature, a new fabrication methodology for planar microcavities is proposed: a ZnO-based microcavity in which the active region is epitaxially grown on an AlGaN/AlN/Si substrate and in which two dielectric mirrors are used. This approach allows as to simultaneously obtain a high-quality active layer together with a high photonic confinement as demon…
▽ More
In order to achieve polariton lasing at room temperature, a new fabrication methodology for planar microcavities is proposed: a ZnO-based microcavity in which the active region is epitaxially grown on an AlGaN/AlN/Si substrate and in which two dielectric mirrors are used. This approach allows as to simultaneously obtain a high-quality active layer together with a high photonic confinement as demonstrated through macro-, and micro-photoluminescence (μ-PL) and reflectivity experiments. A quality factor of 675 and a maximum PL emission at k=0 are evidenced thanks to μ-PL, revealing an efficient polaritonic relaxation even at low excitation power.
△ Less
Submitted 13 June, 2011; v1 submitted 4 May, 2011;
originally announced May 2011.