Showing 1–2 of 2 results for author: Nogami, J
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Hindered surface diffusion of bonded molecular clusters mediated by surface defects
Authors:
William S. Huxter,
Chandra Veer Singh,
Jun Nogami
Abstract:
The design of low dimensional materials through surface assisted self-assembly requires a better understanding of the factors that limit and control surface diffusion. We reveal how substrate surface defects hinder the mobility of sub-monolayer organic adsorbates on a metal surface with the model CuPc/Cu(111) system. Post-deposition annealing bonds CuPc molecules into dendritelike clusters that ar…
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The design of low dimensional materials through surface assisted self-assembly requires a better understanding of the factors that limit and control surface diffusion. We reveal how substrate surface defects hinder the mobility of sub-monolayer organic adsorbates on a metal surface with the model CuPc/Cu(111) system. Post-deposition annealing bonds CuPc molecules into dendritelike clusters that are often mobile at room temperature. Surface defects on Cu(111) create energetic barriers that prevent CuPc cluster motion on the metal surface. This phenomenon was unveiled by the motion of small clusters that show rigid-body diffusion solely in the available space in between defects. When clusters are sufficiently surrounded by defects, they become completely pinned in place and become immobilized.
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Submitted 26 September, 2020; v1 submitted 5 February, 2020;
originally announced February 2020.
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Length Scale Dependence of Periodic Textures for Photoabsorption Enhancement in Ultra-thin Silicon Foils and Thick Wafers
Authors:
K Kumar,
A Khalatpour,
G Liu,
J Nogami,
N P Kherani
Abstract:
In this paper, we simulate a front surface inverted pyramidal grating texture on 2 to 400 micron thick silicon and optimize it to derive maximum photocurrent density from the cell. We identify a one size fits all front grating period of 1000 nm that leads to maximum photo-absorption of normally incident AM1.5g solar spectrum in silicon (configured with a back surface reflector) irrespective of the…
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In this paper, we simulate a front surface inverted pyramidal grating texture on 2 to 400 micron thick silicon and optimize it to derive maximum photocurrent density from the cell. We identify a one size fits all front grating period of 1000 nm that leads to maximum photo-absorption of normally incident AM1.5g solar spectrum in silicon (configured with a back surface reflector) irrespective of the thickness of the crystalline silicon absorbing layer. With the identification of such universally optimized periodicity for the case of an inverted pyramidal grating texture, a common fabrication process can be designed to manufacture high-efficiency devices on crystalline silicon regardless of wafer thickness. In order to validate the results of the simulation, we fabricated high resolution inverted pyramidal textures on a 400 micron thick silicon wafer with electron beam lithography to compare the reflectance from submicron and wavelength scale periodic textures. The experimental reflectance measurements on textures confirm that a 1000 nm period grating texture performs better than a 500 nm period texture in reducing reflectance, in agreement with the simulations.
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Submitted 6 June, 2016;
originally announced June 2016.