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Optically Forged Diffraction-Unlimited Ripples in Graphene
Authors:
Pekka Koskinen,
Karoliina Karppinen,
Pasi Myllyperkiö,
Vesa-Matti Hiltunen,
Andreas Johansson,
Mika Pettersson
Abstract:
In nanofabrication, just as in any other craft, the scale of spatial details is limited by the dimensions of the tool at hand. For example, the smallest details for direct laser writing with far-field light are set by the diffraction limit, which is approximately half of the used wavelength. In this work, we overcome this universal assertion by optically forging graphene ripples that show features…
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In nanofabrication, just as in any other craft, the scale of spatial details is limited by the dimensions of the tool at hand. For example, the smallest details for direct laser writing with far-field light are set by the diffraction limit, which is approximately half of the used wavelength. In this work, we overcome this universal assertion by optically forging graphene ripples that show features with dimensions unlimited by diffraction. Thin sheet elasticity simulations suggest that the scaled-down ripples originate from the interplay between substrate adhesion, in-plane strain, and circular symmetry. The optical forging technique thus offers an accurate way to modify and shape two-dimensional materials and facilitates the creation of controllable nanostructures for plasmonics, resonators, and nano-optics.
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Submitted 16 October, 2018;
originally announced October 2018.
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VUV irradiance measurement of a 2.45 GHz microwave-driven hydrogen discharge
Authors:
J. Komppula,
O. Tarvainen,
T. Kalvas,
H. Koivisto,
R. Kronholm,
J. Laulainen,
P. Myllyperkiö
Abstract:
Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the volumetric photon emission rate in the VUV-range (80-250 nm) is $10^{16}$-$10^{17}$ 1/cm$^3$s, which corresponds to approximately 8% dissipation of injected microwave…
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Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the volumetric photon emission rate in the VUV-range (80-250 nm) is $10^{16}$-$10^{17}$ 1/cm$^3$s, which corresponds to approximately 8% dissipation of injected microwave power by VUV photon emission. The volumetric emission of characteristic emission bands was utilized to diagnostics of molecular plasma processes including volumetric rates of ionization, dissociation and excitation to high vibrational levels and metastable states. The estimated reaction rates imply that each injected molecule experiences several inelastic electron impact collisions. The upper limit for the total density of metastable neutrals ($2S$ atoms and $c^3Π_u$ molecules) was estimated to be approximately 0.5% of the neutral gas density.
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Submitted 8 October, 2015;
originally announced October 2015.
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Patterning and tuning of electrical and optical properties of graphene by laser induced two-photon oxidation
Authors:
Jukka Aumanen,
Andreas Johansson,
Juha Koivistoinen,
Pasi Myllyperkiö,
Mika Pettersson
Abstract:
Graphene, being an ultrathin, durable, flexible, transparent material with superior conductivity and unusual optical properties, promises many novel applications in electronics, photonics and optoelectronics. For applications in electronics, patterning and modification of electrical properties is very desirable since pristine graphene has no band gap. Here we demonstrate a simple all-optical patte…
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Graphene, being an ultrathin, durable, flexible, transparent material with superior conductivity and unusual optical properties, promises many novel applications in electronics, photonics and optoelectronics. For applications in electronics, patterning and modification of electrical properties is very desirable since pristine graphene has no band gap. Here we demonstrate a simple all-optical patterning method for graphene, based on laser induced two-photon oxidation. By tuning the intensity of irradiation and the number of pulses the level of oxidation can be controlled to high precision and, therefore, a band gap can be introduced and electrical and optical properties can be continuously tuned. Arbitrary complex patterning can be performed for air-suspended monolayer graphene or for graphene on substrates. The method works at room temperature in ambient air and no additional processing step is needed. The presented concept allows development of all-graphene electronic and optoelectronic devices and complex circuits with an all-optical method.
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Submitted 5 August, 2014;
originally announced August 2014.
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Measurement of optical second-harmonic generation from an individual single-walled carbon nanotube
Authors:
M. J. Huttunen,
O. Herranen,
A. Johansson,
H. Jiang,
P. R. Mudimela,
P. Myllyperkiö,
G. Bautista,
A. G. Nasibulin,
E. I. Kauppinen,
M. Ahlskog,
M. Kauranen,
M. Pettersson
Abstract:
We show that optical second-harmonic generation (SHG) can be observed from individual single-walled carbon nanotubes (SWCNTs) and, furthermore, allows imaging of individual tubes. Detailed analysis of our results suggests that the structural noncentrosymmetry, as required for SHG, arises from the non-zero chiral angle of the SWCNT. SHG thus has potential as a fast, non-destructive, and simple meth…
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We show that optical second-harmonic generation (SHG) can be observed from individual single-walled carbon nanotubes (SWCNTs) and, furthermore, allows imaging of individual tubes. Detailed analysis of our results suggests that the structural noncentrosymmetry, as required for SHG, arises from the non-zero chiral angle of the SWCNT. SHG thus has potential as a fast, non-destructive, and simple method for imaging of individual nanomolecules and for probing their chiral properties. Even more, it opens the possibility to optically determine the handedness of individual SWCNTs.
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Submitted 20 March, 2013;
originally announced March 2013.
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Fabrication and characterization of vacuum deposited fluorescein thin films
Authors:
Pasi Jalkanen,
Sampo Kulju,
Konstantin Arutyunov,
Liisa Antila,
Pasi Myllyperkiö,
Jouko Korppi-Tommola,
Teemu Ihalainen,
Tommi Kääriäinen,
Marja-Leena Kääriäinen
Abstract:
Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine-tin-oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline…
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Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine-tin-oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline 20 nm thick anatase TiO2 coating. Surface topology, absorption and emission spectra of the films depends on their thickness and the material of supporting substrate. On a smooth glass surface the dye initially formes islands before merging into a uniform layer after 5 to 10 monolayers. On FTO covered glass the absorption spectra are similar to fluorescein solution in ethanol. Absorption spectra on ALD-TiO2 is red shifted compared to the film deposited on bare FTO. The corresponding emission spectra at λ = 458 nm excitation show various thickness and substrate dependent features, while the emission of films deposited on TiO2 is quenched due to the effective electron transfer to the semiconductor conduction band.
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Submitted 20 June, 2011;
originally announced June 2011.
