Impact of cation redox chemistry on continuous hydrothermal synthesis of 2D-Ni(Co/Fe) hydroxides
Authors:
Massimo Rosa,
Debora Marani,
Giovanni Perin,
Søren Bredmose Simonsen,
Philipp Zielke,
Antonella Glisenti,
Ragnar Kiebach,
Andreas Lesch,
Vincenzo Esposito
Abstract:
Continuous hydrothermal flow synthesis (CHFS) is a facile, upscalable and cost-efficient synthetic method enabling the nanostructuring of advanced functional materials in steady conditions, i.e. not in batch synthesis. In this paper, we use CHFS to crystallize NiCo- and NiFe-hydroxides in water solution with 2D nanofeatures. By tuning the synthetic parameters, we disclose the key role of the catio…
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Continuous hydrothermal flow synthesis (CHFS) is a facile, upscalable and cost-efficient synthetic method enabling the nanostructuring of advanced functional materials in steady conditions, i.e. not in batch synthesis. In this paper, we use CHFS to crystallize NiCo- and NiFe-hydroxides in water solution with 2D nanofeatures. By tuning the synthetic parameters, we disclose the key role of the cation redox chemistry in the transition between two competitive phases: from 2D-nanoplatelets of brucite to layered double hydroxides (LDH). For controlling the precipitation of different Ni, Fe, Co-hydroxide phases, we propose the combined use of an oxidizing (H2O2) and a complexing (NH3) agent. At temperatures as low as 80 °C, the presence of H2O2 and a low concentration of NH3 favour the Ni2+/Co3+ over Ni2+/Co2+ oxidation states, shifting the product structure from brucite phase (temperatures > 80 °C) to LDH. Conversely, for the NiFe-hydroxides the transition from LDH (temperatures < 80 °C) to brucite phase (temperatures > 80 °C) is controlled by the reaction temperature only. Due to the high stability of Fe3+, the synthesis of NiFe products by CHFS does not require oxidizing and complexing agents, resulting in a robust process for large-scale production.
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Submitted 11 October, 2019;
originally announced October 2019.
Aqueous metal-organic solutions for YSZ thin film inkjet deposition
Authors:
C. Gadea,
Q. Hanniet,
A. Lesch,
D. Marani,
S. H. Jensen,
V. Esposito
Abstract:
Inkjet printing of 8% Y2O3-stabilized ZrO2 (YSZ) thin films is achieved by designing a novel water-based reactive ink for Drop-on-Demand (DoD) inkjet printing. The ink formulation is based on a novel chemical strategy that consists of a combination of metal oxide precursors (zirconium alkoxide and yttrium salt), water and a nucleophilic agent, i.e. n-methyldiethanolamine (MDEA). This chemistry lea…
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Inkjet printing of 8% Y2O3-stabilized ZrO2 (YSZ) thin films is achieved by designing a novel water-based reactive ink for Drop-on-Demand (DoD) inkjet printing. The ink formulation is based on a novel chemical strategy that consists of a combination of metal oxide precursors (zirconium alkoxide and yttrium salt), water and a nucleophilic agent, i.e. n-methyldiethanolamine (MDEA). This chemistry leads to metal-organic complexes with long term ink stability and high precision printability. Ink rheology and chemical reactivity are analyzed and controlled in terms of metal-organic interactions in the solutions. Thin dense nanocrystalline YSZ film below 150 nm are obtained by low temperature calcination treatments (400-500 °C), making the deposition suitable for a large variety of substrates, including silicon, glass and metals. Thin films and printed patterns achieve full densification with no lateral shrinkage and high ionic conductivity.
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Submitted 17 April, 2019;
originally announced April 2019.
