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Non-Volatile Resistive Switching of Polymer Residues in 2D Material Memristors
Authors:
Dennis Braun,
Mohit D. Ganeriwala,
Lukas Völkel,
Ke Ran,
Sebastian Lukas,
Enrique G. Marín,
Oliver Hartwig,
Maximilian Prechtl,
Thorsten Wahlbrink,
Joachim Mayer,
Georg S. Duesberg,
Andrés Godoy,
Alwin Daus,
Max C. Lemme
Abstract:
Two-dimensional (2D) materials are popular candidates for emerging nanoscale devices, including memristors. Resistive switching (RS) in such 2D material memristors has been attributed to the formation and dissolution of conductive filaments created by the diffusion of metal ions between the electrodes. However, the area-scalable fabrication of patterned devices involves polymers that are difficult…
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Two-dimensional (2D) materials are popular candidates for emerging nanoscale devices, including memristors. Resistive switching (RS) in such 2D material memristors has been attributed to the formation and dissolution of conductive filaments created by the diffusion of metal ions between the electrodes. However, the area-scalable fabrication of patterned devices involves polymers that are difficult to remove from the 2D material interfaces without damage. Remaining polymer residues are often overlooked when interpreting the RS characteristics of 2D material memristors. Here, we demonstrate that the parasitic residues themselves can be the origin of RS. We emphasize the necessity to fabricate appropriate reference structures and employ atomic-scale material characterization techniques to properly evaluate the potential of 2D materials as the switching layer in vertical memristors. Our polymer-residue-based memristors exhibit RS typical for a filamentary mechanism with metal ion migration, and their performance parameters are strikingly similar to commonly reported 2D material memristors. This reveals that the exclusive consideration of electrical data without a thorough verification of material interfaces can easily lead to misinterpretations about the potential of 2D materials for memristor applications.
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Submitted 25 September, 2023;
originally announced September 2023.
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Exploiting ambipolarity in graphene field-effect transistors for novel designs on high-frequency analog electronics
Authors:
Francisco Pasadas,
Alberto Medina-Rull,
Francisco G. Ruiz,
Javier Noe Ramos-Silva,
Anibal Pacheco-Sanchez,
Mari Carmen Pardo,
Alejandro Toral-Lopez,
Andrés Godoy,
Eloy Ramírez-García,
David Jiménez,
Enrique G. Marin
Abstract:
Exploiting ambipolar electrical conductivity based on graphene field-effect transistors has raised enormous interest for high-frequency (HF) analog electronics. Controlling the device polarity, by biasing the graphene transistor around the vertex of the V-shaped transfer curve, enables to redesign and highly simplify conventional analog circuits, and simultaneously to seek for multifunctionalities…
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Exploiting ambipolar electrical conductivity based on graphene field-effect transistors has raised enormous interest for high-frequency (HF) analog electronics. Controlling the device polarity, by biasing the graphene transistor around the vertex of the V-shaped transfer curve, enables to redesign and highly simplify conventional analog circuits, and simultaneously to seek for multifunctionalities specially in the HF domain. We present, here, new insights for the design of different HF applications such as power amplifiers, mixers, frequency multipliers, phase shifters, and modulators that specifically leverage the inherent ambipolarity of graphene-based transistors.
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Submitted 15 September, 2023;
originally announced September 2023.
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CVD Graphene Contacts for Lateral Heterostructure MoS${_2}$ Field Effect Transistors
Authors:
Daniel S. Schneider,
Leonardo Lucchesi,
Eros Reato,
Zhenyu Wang,
Agata Piacentini,
Jens Bolten,
Damiano Marian,
Enrique G. Marin,
Aleksandra Radenovic,
Zhenxing Wang,
Gianluca Fiori,
Andras Kis,
Giuseppe Iannaccone,
Daniel Neumaier,
Max C. Lemme
Abstract:
Intensive research is carried out on two-dimensional materials, in particular molybdenum disulfide, towards high-performance transistors for integrated circuits. Fabricating transistors with ohmic contacts is challenging due to the high Schottky barrier that severely limits the transistors' performance. Graphene-based heterostructures can be used in addition or as a substitute for unsuitable metal…
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Intensive research is carried out on two-dimensional materials, in particular molybdenum disulfide, towards high-performance transistors for integrated circuits. Fabricating transistors with ohmic contacts is challenging due to the high Schottky barrier that severely limits the transistors' performance. Graphene-based heterostructures can be used in addition or as a substitute for unsuitable metals. We present lateral heterostructure transistors made of scalable chemical vapor-deposited molybdenum disulfide and chemical vapor-deposited graphene with low contact resistances of about 9 k$Ω$$μ$m and high on/off current ratios of 10${^8}$. We also present a theoretical model calibrated on our experiments showing further potential for scaling transistors and contact areas into the few nanometers range and the possibility of a strong performance enhancement by means of layer optimizations that would make transistors promising for use in future logic circuits.
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Submitted 5 April, 2024; v1 submitted 3 April, 2023;
originally announced April 2023.
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Compact Modeling of pH-Sensitive FETs Based on Two-Dimensional Semiconductors
Authors:
Tarek El Grour,
Francisco Pasadas,
Alberto Medina-Rull,
Montassar Najari,
Enrique G. Marin,
Alejandro Toral-Lopez,
Francisco G. Ruiz,
Andrés Godoy,
David Jiménez,
Lassaad El-Mir
Abstract:
We present a physics-based circuit-compatible model for pH-sensitive field-effect transistors based on two-dimensional (2D) materials. The electrostatics along the electrolyte-gated 2D-semiconductor stack is treated by solving the Poisson equation including the Site-Binding model and the Gouy-Chapman-Stern approach, while the carrier transport is described by the drift-diffusion theory. The propos…
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We present a physics-based circuit-compatible model for pH-sensitive field-effect transistors based on two-dimensional (2D) materials. The electrostatics along the electrolyte-gated 2D-semiconductor stack is treated by solving the Poisson equation including the Site-Binding model and the Gouy-Chapman-Stern approach, while the carrier transport is described by the drift-diffusion theory. The proposed model is provided in an analytical form and then implemented in Verilog-A, making it compatible with standard technology computer-aided design tools employed for circuit simulation. The model is benchmarked against two experimental transition-metal-dichalcogenide (MoS2 and ReS2) based ion sensors, showing excellent agreement when predicting the drain current, threshold voltage shift, and current/voltage sensitivity measurements for different pH concentrations.
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Submitted 14 September, 2021;
originally announced September 2021.
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Unveiling the impact of the bias-dependent charge neutrality point on graphene-based multi-transistor applications
Authors:
Francisco Pasadas,
Alberto Medina-Rull,
Pedro Carlos Feijoo,
Anibal Pacheco-Sanchez,
Enrique G. Marin,
Francisco G. Ruiz,
Noel Rodriguez,
Andrés Godoy,
David Jiménez
Abstract:
The Dirac voltage of a graphene field-effect transistor (GFET) stands for the gate bias that sets the charge neutrality condition in the channel, thus resulting in a minimum conductivity. Controlling its dependence on the terminal biases is crucial for the design and optimization of radio-frequency applications based on multiple GFETs. However, the previous analysis of such dependence carried out…
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The Dirac voltage of a graphene field-effect transistor (GFET) stands for the gate bias that sets the charge neutrality condition in the channel, thus resulting in a minimum conductivity. Controlling its dependence on the terminal biases is crucial for the design and optimization of radio-frequency applications based on multiple GFETs. However, the previous analysis of such dependence carried out for a single device can lead to confusion and if not properly understood could result in circuit designs with poor performance. The control of the Dirac point shift (DPS) is particularly important for the deployment of graphene-based differential circuit topologies where kee** a strict symmetry between the electrical balanced branches is crucial for exploiting the advantages of such topologies. This note sheds light on the impact of terminal biases on the DPS in a real device and sets a rigorous methodology to control it so to eventually optimize and exploit the performance of radio-frequency applications based on GFETs.
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Submitted 14 May, 2021;
originally announced May 2021.
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Multi-scale analysis of radio-frequency performance of 2D-material based field-effect transistors
Authors:
A. Toral-Lopez,
F. Pasadas,
E. G. Marin,
A. Medina-Rull,
J. M. Gonzalez-Medina,
F. G. Ruiz,
D. Jiménez,
A. Godoy
Abstract:
Two-dimensional materials (2DMs) are a promising alternative to complement and upgrade high-frequency electronics. However, in order to boost their adoption, the availability of numerical tools and physically-based models able to support the experimental activities and to provide them with useful guidelines becomes essential. In this context, we propose a theoretical approach that combines numeric…
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Two-dimensional materials (2DMs) are a promising alternative to complement and upgrade high-frequency electronics. However, in order to boost their adoption, the availability of numerical tools and physically-based models able to support the experimental activities and to provide them with useful guidelines becomes essential. In this context, we propose a theoretical approach that combines numerical simulations and small-signal modeling to analyze 2DM-based FETs for radio-frequency applications. This multi-scale scheme takes into account non-idealities, such as interface traps, carrier velocity saturation, or short channel effects, by means of self-consistent physics-based numerical calculations that later feed the circuit level via a small-signal model based on the dynamic intrinsic capacitances of the device. At the circuit stage, the possibilities range from the evaluation of the performance of a single device to the design of complex circuits combining multiple transistors. In this work, we validate our scheme against experimental results and exemplify its use and capability assessing the impact of the channel scaling on the performance of MoS2-based FETs targeting RF applications.
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Submitted 16 March, 2021; v1 submitted 15 March, 2021;
originally announced March 2021.
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A Graphene Field-Effect Transistor Based Analogue Phase Shifter for High-Frequency Applications
Authors:
A. Medina-Rull,
F. Pasadas,
E. G. Marin,
A. Toral-Lopez,
J. Cuesta,
A. Godoy,
D. Jiménez,
F. G. Ruiz
Abstract:
We present a graphene-based phase shifter for radio-frequency (RF) phase-array applications. The core of the designed phase-shifting system consists of a graphene field-effect transistor (GFET) used in a common source amplifier configuration. The phase of the RF signal is controlled by exploiting the quantum capacitance of graphene and its dependence on the terminal transistor biases. In particula…
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We present a graphene-based phase shifter for radio-frequency (RF) phase-array applications. The core of the designed phase-shifting system consists of a graphene field-effect transistor (GFET) used in a common source amplifier configuration. The phase of the RF signal is controlled by exploiting the quantum capacitance of graphene and its dependence on the terminal transistor biases. In particular, by independently tuning the applied gate-to-source and drain-to-source biases, we observe that the phase of the signal, in the super-high frequency band, can be varied nearly 200 degrees with a constant gain of 2.5 dB. Additionally, if only the gate bias is used as control signal, and the drain is biased linearly dependent on the former (i.e., in a completely analogue operation), a phase shift of 85 degrees can be achieved making use of just one transistor and kee** a gain of 0 dB with a maximum variation of 1.3 dB. The latter design can be improved by applying a balanced branch-line configuration showing to be competitive against other state-of-the-art phase shifters. This work paves the way towards the exploitation of graphene technology to become the core of active analogue phase shifters for high-frequency operation.
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Submitted 15 March, 2021; v1 submitted 10 March, 2021;
originally announced March 2021.
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Flexible One-Dimensional Metal-Insulator-Graphene Diode
Authors:
Zhenxing Wang,
Burkay Uzlu,
Mehrdad Shaygan,
Martin Otto,
Mário Ribeiro,
Enrique González Marín,
Giuseppe Iannaccone,
Gianluca Fiori,
Mohamed Saeed Elsayed,
Renato Negra,
Daniel Neumaier
Abstract:
In this work, a novel one-dimensional geometry for metal-insulator-graphene (1D-MIG) diode with low capacitance is demonstrated. The junction of the 1D-MIG diode is formed at the 1D edge of Al2O3-encapsulated graphene with TiO2 that acts as barrier material. The diodes demonstrate ultra-high current density since the transport in the graphene and through the barrier is in plane. The geometry deliv…
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In this work, a novel one-dimensional geometry for metal-insulator-graphene (1D-MIG) diode with low capacitance is demonstrated. The junction of the 1D-MIG diode is formed at the 1D edge of Al2O3-encapsulated graphene with TiO2 that acts as barrier material. The diodes demonstrate ultra-high current density since the transport in the graphene and through the barrier is in plane. The geometry delivers very low capacitive coupling between the cathode and anode of the diode, which shows frequency response up to 100 GHz and ensures potential high frequency performance up to 2.4 THz. The 1D-MIG diodes are demonstrated to function uniformly and stable under bending conditions down to 6.4 mm bending radius on flexible substrate.
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Submitted 18 March, 2020;
originally announced March 2020.
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Large-signal model of 2DFETs: compact modeling of terminal charges and intrinsic capacitances
Authors:
Francisco Pasadas,
Enrique G. Marin,
Alejandro Toral-Lopez,
Francisco G. Ruiz,
Andrés Godoy,
Saungeun Park,
Deji Akinwande,
David Jiménez
Abstract:
We present a physics-based circuit-compatible model for double-gated two-dimensional semiconductor based field effect transistors, which provides explicit expressions for the drain current, terminal charges and intrinsic capacitances. The drain current model is based on the drift-diffusion mechanism for the carrier transport and considers Fermi-Dirac statistics coupled with an appropriate field-ef…
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We present a physics-based circuit-compatible model for double-gated two-dimensional semiconductor based field effect transistors, which provides explicit expressions for the drain current, terminal charges and intrinsic capacitances. The drain current model is based on the drift-diffusion mechanism for the carrier transport and considers Fermi-Dirac statistics coupled with an appropriate field-effect approach. The terminal charge and intrinsic capacitance models are calculated adopting a Ward-Dutton linear charge partition scheme that guarantees charge-conservation. It has been implemented in Verilog-A to make it compatible with standard circuit simulators. In order to benchmark the proposed modeling framework we also present experimental DC and high-frequency measurements of a purposely fabricated monolayer MoS2 FET showing excellent agreement between the model and the experiment and thus demonstrating the capabilities of the combined approach to predict the performance of 2DFETs.
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Submitted 4 February, 2020;
originally announced February 2020.
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Lateral Heterostructure Field-Effect Transistors Based on 2D-Material Stacks With Varying Thickness and Energy Filtering Source
Authors:
Enrique G. Marin,
Damiano Marian,
Marta Perucchini,
Gianluca Fiori,
Giuseppe Iannaccone
Abstract:
The bandgap dependence on the number of atomic layers of some families of 2D-materials, can be exploited to engineer and use lateral heterostructures (LHs) as high-performance Field-Effect Transistors (FET). This option can provide very good lattice matching as well as high heterointerface quality. More importantly, this bandgap modulation with layer stacking can give rise to steep transitions in…
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The bandgap dependence on the number of atomic layers of some families of 2D-materials, can be exploited to engineer and use lateral heterostructures (LHs) as high-performance Field-Effect Transistors (FET). This option can provide very good lattice matching as well as high heterointerface quality. More importantly, this bandgap modulation with layer stacking can give rise to steep transitions in the density of states (DOS) of the 2D material, that can eventually be used to achieve sub-60 mV/decade subthreshold swing in LH-FETs thanks to an energy-filtering source. We have observed this effect in the case of a PdS2 LH-FET due to the particular density of states of its bilayer configuration. Our results are based on ab initio and multiscale materials and device modeling, and incite the exploration of the 2D-material design space in order to find more abrupt DOS transitions and better suitable candidates.
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Submitted 9 January, 2020;
originally announced January 2020.
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GFET Asymmetric Transfer Response Analysis through Access Region Resistances
Authors:
A. Toral-Lopez,
E. G. Marin,
F. Pasadas,
J. M. Gonzalez-Medina,
F. G. Ruiz,
D. Jiménez,
A. Godoy
Abstract:
Graphene-based devices are planned to augment the functionality of Si and III-V based technology in radio-frequency (RF) electronics. The expectations in designing graphene {field-effect} transistors (GFETs) with enhanced RF performance have attracted significant experimental efforts, mainly concentrated on achieving high mobility samples. However, little attention has been paid, so far, to the ro…
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Graphene-based devices are planned to augment the functionality of Si and III-V based technology in radio-frequency (RF) electronics. The expectations in designing graphene {field-effect} transistors (GFETs) with enhanced RF performance have attracted significant experimental efforts, mainly concentrated on achieving high mobility samples. However, little attention has been paid, so far, to the role of the access regions in these devices. \mbox{Here, we analyse} in detail, via numerical simulations, how the GFET transfer response is severely impacted by these regions, showing that they play a significant role in the asymmetric saturated behaviour commonly observed in GFETs. We also investigate how the modulation of the access region conductivity (i.e., by the influence of a back gate) and the presence of imperfections in the graphene layer (e.g., charge puddles) affects the transfer response. The analysis is extended to assess the application of GFETs for RF applications, by~evaluating their cut-off frequency.
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Submitted 14 November, 2019;
originally announced November 2019.
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Physical insights into the operation of a 1-nm gate length transistor based on MoS2 with metallic carbon nanotube gate
Authors:
Marta Perucchini,
Enrique G. Marin,
Damiano Marian,
Giuseppe Iannaccone,
Gianluca Fiori
Abstract:
Low-dimensional materials such as layered semiconductors or carbon nanotubes (CNTs) have been attracting increasing attention in the last decades due to their inherent scaling properties, which become fundamental to sustain the scaling in electronic devices. Inspired by recent experimental results (S.B. Desai, S.R. Madhvapathy, A.B. Sachid, J.P. Llinas, Q. Wang, G.H. Ahn, G. Pitner, M.J. Kim, J. B…
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Low-dimensional materials such as layered semiconductors or carbon nanotubes (CNTs) have been attracting increasing attention in the last decades due to their inherent scaling properties, which become fundamental to sustain the scaling in electronic devices. Inspired by recent experimental results (S.B. Desai, S.R. Madhvapathy, A.B. Sachid, J.P. Llinas, Q. Wang, G.H. Ahn, G. Pitner, M.J. Kim, J. Bokor, C. Hu, H.-S. P. Wong, and A. Javey, Science 354, 99 (2016)), in this work we examined the ultimate performance of of MoS$_2$-channel Field Effect Transistors with 1-nm gate length by means of quantum transport simulations based on Poisson equation and Non-equilibrium Green's function formalism. We considered uniformly scaled devices, with channel lengths ranging from 5 to 20 nm controlled by a cylindrical gate with a 1-nm diameter, as would be required in realistic integrated circuits. Moreover, we also evaluated the effect of the finite density of states of a carbon nanotube gate on the loss of device performance. We noticed that the sub-threshold swing for all short-channel structures was greater than the ideal limit of thermionic devices and we attributed this to the presence of tunneling currents and gate-drain interactions. We tailored the transistor architecture in order to improve the gate control. We concluded that the limited CNT-channel capacitive coupling poses severe limitations on the operation and thus exploitation of the device.
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Submitted 20 April, 2019;
originally announced April 2019.
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Tunnel-Field-Effect Spin Filter from Two-Dimensional Antiferromagnetic Stanene
Authors:
Enrique G. Marin,
Damiano Marian,
Giuseppe Iannaccone,
Gianluca Fiori
Abstract:
We propose a device concept, based on monolayer stanene, able to provide highly polarized spin currents (up to a $98\%$) with voltage-controlled spin polarization operating at room temperature and with small operating voltage ($0.3$ V). The concept exploits the presence of spin-polarized edge states in a stanene nanoribbon. The spin polarization of the total current can be modulated by a different…
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We propose a device concept, based on monolayer stanene, able to provide highly polarized spin currents (up to a $98\%$) with voltage-controlled spin polarization operating at room temperature and with small operating voltage ($0.3$ V). The concept exploits the presence of spin-polarized edge states in a stanene nanoribbon. The spin polarization of the total current can be modulated by a differential tuning of the transmission properties, and of the occupation of edge states of different spin, via the application of an in-plane electric field. We demonstrate device operation using ab-initio and quantum transport simulations.
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Submitted 19 April, 2019;
originally announced April 2019.
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Ultra Low Specific Contact Resistivity in Metal-Graphene Junctions via Atomic Orbital Engineering
Authors:
Vikram Passi,
Amit Gahoi,
Enrique G. Marin,
Teresa Cusati,
Alessandro Fortunelli,
Giuseppe Iannaccone,
Gianluca Fiori,
Max C. Lemme
Abstract:
A systematic investigation of graphene edge contacts is provided. Intentionally patterning monolayer graphene at the contact region creates well-defined edge contacts that lead to a 67% enhancement in current injection from a gold contact. Specific contact resistivity is reduced from 1372 Ωm for a device with surface contacts to 456 Ωm when contacts are patterned with holes. Electrostatic do** o…
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A systematic investigation of graphene edge contacts is provided. Intentionally patterning monolayer graphene at the contact region creates well-defined edge contacts that lead to a 67% enhancement in current injection from a gold contact. Specific contact resistivity is reduced from 1372 Ωm for a device with surface contacts to 456 Ωm when contacts are patterned with holes. Electrostatic do** of the graphene further reduces contact resistivity from 519 Ωm to 45 Ωm, a substantial decrease of 91%. The experimental results are supported and understood via a multi-scale numerical model, based on density-functional-theory calculations and transport simulations. The data is analyzed with regards to the edge perimeter and hole-to-graphene ratio, which provides insights into optimized contact geometries. The current work thus indicates a reliable and reproducible approach for fabricating low resistance contacts in graphene devices. We provide a simple guideline for contact design that can be exploited to guide graphene and 2D material contact engineering.
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Submitted 12 July, 2018;
originally announced July 2018.
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First principle investigation of Tunnel FET based on nanoribbons from topological two-dimensional material
Authors:
Enrique G. Marin,
Damiano Marian,
Giuseppe Iannaccone,
Gianluca Fiori
Abstract:
We explore nanoribbons from topological two-dimensional stanene as channel material in tunnel field effect transistors. This novel technological option offers the possibility to build pure one-dimensional (1D) channel devices (comprised of a 1D chain of atoms) due to localized states in correspondence of the nanoribbon edges. The investigation is based on first-principle calculations and multi-sca…
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We explore nanoribbons from topological two-dimensional stanene as channel material in tunnel field effect transistors. This novel technological option offers the possibility to build pure one-dimensional (1D) channel devices (comprised of a 1D chain of atoms) due to localized states in correspondence of the nanoribbon edges. The investigation is based on first-principle calculations and multi-scale transport simulations to assess devices performance against industry requirements and their robustness with respect to technological issues like line edge roughness, detrimental for nanoribbons. We will show that edges states are robust with respect to the presence of non-idealities (e.g., atoms vacancies at the edges), and that 1D-channel TFETs exhibit interesting potential for digital applications and room for optimization in order to improve the Ion/Ioff at the levels required by the ITRS, while opening a path for the exploration of new device concepts at the ultimate scaling limits.
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Submitted 10 April, 2018;
originally announced April 2018.
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Transistor concepts based on lateral heterostructures of metallic and semiconducting phases of MoS$_2$
Authors:
Damiano Marian,
Elias Dib,
Teresa Cusati,
Enrique G. Marin,
Alessandro Fortunelli,
Giuseppe Iannaccone,
Gianluca Fiori
Abstract:
In this paper we propose two transistor concepts based on lateral heterostructures of monolayer MoS$_2$, composed of adjacent regions of 1T (metallic) and 2H (semiconducting) phases, inspired by recent research showing the possibility to obtain such heterostructures by electron beam irradiation. The first concept, the lateral heterostructure field-effect transistor, exhibits potential of better pe…
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In this paper we propose two transistor concepts based on lateral heterostructures of monolayer MoS$_2$, composed of adjacent regions of 1T (metallic) and 2H (semiconducting) phases, inspired by recent research showing the possibility to obtain such heterostructures by electron beam irradiation. The first concept, the lateral heterostructure field-effect transistor, exhibits potential of better performance with respect to the foreseen evolution of CMOS technology, both for high performance and low power applications. Performance potential has been evaluated by means of detailed multi-scale materials and device simulations. The second concept, the planar barristor, also exhibits potential competitive performance with CMOS, and an improvement of orders of magnitude in terms of the main figures of merit with respect to the recently proposed vertical barristor.
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Submitted 31 March, 2018;
originally announced April 2018.
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Electrostatic Performance of InSb, GaSb, Si and Ge p-channel Nanowires
Authors:
Celso Martinez-Blanque,
Enrique G. Marin,
Alejandro Toral,
Jose M. Gonzalez-Medina,
Francisco G. Ruiz,
Andres Godoy,
Francisco Gamiz
Abstract:
The electrostatic performance of p-type nanowires (NWs) made of InSb and GaSb, with special focus on their gate capacitance behavior, is analyzed and compared to that achieved by traditional semiconductors usually employed for p-MOS such as Si and Ge. To do so, a self-consistent kp simulator has been implemented to achieve an accurate description of the Valence Band and evaluate the charge behavio…
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The electrostatic performance of p-type nanowires (NWs) made of InSb and GaSb, with special focus on their gate capacitance behavior, is analyzed and compared to that achieved by traditional semiconductors usually employed for p-MOS such as Si and Ge. To do so, a self-consistent kp simulator has been implemented to achieve an accurate description of the Valence Band and evaluate the charge behavior as a function of the applied gate bias. The contribution and role of the constituent capacitances, namely the insulator, centroid and quantum ones are assessed. It is demonstrated that the centroid and quantum capacitances are strongly dependent on the semiconductor material. We find a good inherent electrostatic performance of GaSb and InSb NWs, comparable to their Ge and Si counterparts making these III-Sb compounds good candidates for future technological nodes.
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Submitted 25 April, 2017;
originally announced April 2017.
