Showing 1–7 of 7 results for author: Manzo, S

Control of ternary alloy composition during remote epitaxy on graphene

Authors: Zach LaDuca, Katherine Su, Sebastian Manzo, Michael S. Arnold, Jason K. Kawasaki

Abstract: Understanding the sticking coefficient $σ$, i.e., the probability of an adatom sticking to a surface, is essential for controlling the stoichiometry during epitaxial film growth. However, $σ$ on monolayer graphene-covered surfaces and its impact on remote epitaxy are not understood. Here, using molecular-beam epitaxial (MBE) growth of the magnetic shape memory alloy Ni$_2$MnGa, we show that the st… ▽ More Understanding the sticking coefficient $σ$, i.e., the probability of an adatom sticking to a surface, is essential for controlling the stoichiometry during epitaxial film growth. However, $σ$ on monolayer graphene-covered surfaces and its impact on remote epitaxy are not understood. Here, using molecular-beam epitaxial (MBE) growth of the magnetic shape memory alloy Ni$_2$MnGa, we show that the sticking coefficients for metals on graphene-covered MgO (001) are less than one and are temperature and element dependent, as revealed by ion backscattering spectrometry (IBS) and energy dispersive x-ray spectroscopy (EDS). This lies in stark contrast with most transition metals sticking on semiconductor and oxide substrates, for which $σ$ is near unity at typical growth temperatures ($T<800\degree$C). By initiating growth below $400 \degree$ C, where the sticking coefficients are closer to unity and wetting on the graphene surface is improved, we demonstrate epitaxy of Ni$_2$MnGa films with controlled stoichiometry that can be exfoliated to produce freestanding membranes. Straining these membranes tunes the magnetic coercive field. Our results provide a route to synthesize membranes with complex stoichiometries whose properties can be manipulated via strain. △ Less

Submitted 12 May, 2023; originally announced May 2023.

Controlling the balance between remote, pinhole, and van der Waals epitaxy of Heusler films on graphene/sapphire

Authors: Dongxue Du, Taehwan Jung, Sebastian Manzo, Zachary T. LaDuca, Xiaoqi Zheng, Katherine Su, Jessica L. McChesney, Michael S. Arnold, Jason K. Kawasaki

Abstract: Remote epitaxy on monolayer graphene is promising for synthesis of highly lattice mismatched materials, exfoliation of free-standing membranes, and re-use of expensive substrates. However, clear experimental evidence of a remote mechanism remains elusive. In many cases, due to contaminants at the transferred graphene/substrate interface, alternative mechanisms such as pinhole-seeded lateral epitax… ▽ More Remote epitaxy on monolayer graphene is promising for synthesis of highly lattice mismatched materials, exfoliation of free-standing membranes, and re-use of expensive substrates. However, clear experimental evidence of a remote mechanism remains elusive. In many cases, due to contaminants at the transferred graphene/substrate interface, alternative mechanisms such as pinhole-seeded lateral epitaxy or van der Waals epitaxy can explain the resulting exfoliatable single-crystalline films. Here, we find that growth of the Heusler compound GdPtSb on clean graphene on sapphire substrates produces a 30 degree rotated epitaxial superstructure that cannot be explained by pinhole or van der Waals epitaxy. With decreasing growth temperature the volume fraction of this 30 degree domain increases compared to the direct epitaxial 0 degree domain, which we attribute to slower surface diffusion at low temperature that favors remote epitaxy, compared to faster surface diffusion at high temperature that favors pinhole epitaxy. We further show that careful graphene/substrate annealing ($T\sim 700 ^\circ C$) and consideration of the film/substrate vs film/graphene lattice mismatch are required to obtain epitaxy to the underlying substrate for a variety of other Heusler films, including LaPtSb and GdAuGe. The 30 degree rotated superstructure provides a possible experimental fingerprint of remote epitaxy since it is inconsistent with the leading alternative mechanisms. △ Less

Submitted 11 August, 2022; originally announced August 2022.

Journal ref: Nano Letters 2022

Free-Standing Epitaxial SrTiO$_3$ Nanomembranes via Remote Epitaxy using Hybrid Molecular Beam Epitaxy

Authors: Hyo** Yoon, Tristan K. Truttmann, Fengdeng Liu, Bethany E. Matthews, Sooho Choo, Qun Su, Vivek Saraswat, Sebastian Manzo, Michael S. Arnold, Mark E. Bowden, Jason K. Kawasaki, Steven J. Koester, Steven R. Spurgeon, Scott A. Chambers, Bharat Jalan

Abstract: The epitaxial growth of functional materials using a substrate with a graphene layer is a highly desirable method for improving structural quality and obtaining free-standing epitaxial nano-membranes for scientific study, applications, and economical reuse of substrates. However, the aggressive oxidizing conditions typically employed to grow epitaxial perovskite oxides can damage graphene. Here, w… ▽ More The epitaxial growth of functional materials using a substrate with a graphene layer is a highly desirable method for improving structural quality and obtaining free-standing epitaxial nano-membranes for scientific study, applications, and economical reuse of substrates. However, the aggressive oxidizing conditions typically employed to grow epitaxial perovskite oxides can damage graphene. Here, we demonstrate a technique based on hybrid molecular beam epitaxy that does not require an independent oxygen source to achieve epitaxial growth of complex oxides without damaging the underlying graphene. The technique produces films with self-regulating cation stoichiometry control and epitaxial orientation to the oxide substrate. Furthermore, the films can be exfoliated and transferred to foreign substrates while leaving the graphene on the original substrate. These results open the door to future studies of previously unattainable free-standing nano-membranes grown in an adsorption-controlled manner by hybrid molecular beam epitaxy, and has potentially important implications for the commercial application of perovskite oxides in flexible electronics. △ Less

Submitted 17 June, 2022; originally announced June 2022.

Comments: 20 pages, 6 figures

Selective area epitaxy of GaAs films using patterned graphene on Ge

Authors: Zheng Hui Lim, Sebastian Manzo, Patrick J. Strohbeen, Vivek Saraswat, Michael S. Arnold, Jason K. Kawasaki

Abstract: We demonstrate selective area epitaxy of GaAs films using patterned graphene masks on a Ge (001) substrate. The GaAs selectively grows on exposed regions of the Ge substrate, for graphene spacings as large as 10 microns. The selectivity is highly dependent on the growth temperature and annealing time, which we explain in terms of temperature dependent sticking coefficients and surface diffusion. T… ▽ More We demonstrate selective area epitaxy of GaAs films using patterned graphene masks on a Ge (001) substrate. The GaAs selectively grows on exposed regions of the Ge substrate, for graphene spacings as large as 10 microns. The selectivity is highly dependent on the growth temperature and annealing time, which we explain in terms of temperature dependent sticking coefficients and surface diffusion. The high nucleation selectivity over several microns sets constraints on experimental realizations of remote epitaxy. △ Less

Submitted 1 November, 2021; originally announced November 2021.

Quantifying Mn diffusion through transferred versus directly-grown graphene barriers

Authors: Patrick J. Strohbeen, Sebastian Manzo, Vivek Saraswat, Katherine Su, Michael S. Arnold, Jason K. Kawasaki

Abstract: We quantify the mechanisms for manganese (Mn) diffusion through graphene in Mn/graphene/Ge (001) and Mn/graphene/GaAs (001) heterostructures for samples prepared by graphene layer transfer versus graphene growth directly on the semiconductor substrate. These heterostructures are important for applications in spintronics; however, challenges in synthesizing graphene directly on technologically impo… ▽ More We quantify the mechanisms for manganese (Mn) diffusion through graphene in Mn/graphene/Ge (001) and Mn/graphene/GaAs (001) heterostructures for samples prepared by graphene layer transfer versus graphene growth directly on the semiconductor substrate. These heterostructures are important for applications in spintronics; however, challenges in synthesizing graphene directly on technologically important substrates such as GaAs necessitate layer transfer and anneal steps, which introduce defects into the graphene. \textit{In-situ} photoemission spectroscopy measurements reveal that Mn diffusion through graphene grown directly on a Ge (001) substrate is 1000 times lower than Mn diffusion into samples without graphene ($D_{gr,direct} \sim 4\times10^{-18}$cm$^2$/s, $D_{no-gr} \sim 5 \times 10^{-15}$ cm$^2$/s at 500$^\circ$C). Transferred graphene on Ge suppresses the Mn in Ge diffusion by a factor of 10 compared to no graphene ($D_{gr,transfer} \sim 4\times10^{-16}cm^2/s$). For both transferred and directly-grown graphene, the low activation energy ($E_a \sim 0.1-0.5$ eV) suggests that Mn diffusion through graphene occurs primarily at graphene defects. This is further confirmed as the diffusivity prefactor, $D_0$, scales with the defect density of the graphene sheet. Similar diffusion barrier performance is found on GaAs substrates; however, it is not currently possible to grow graphene directly on GaAs. Our results highlight the importance of develo** graphene growth directly on functional substrates, to avoid the damage induced by layer transfer and annealing. △ Less

Submitted 11 September, 2021; v1 submitted 2 June, 2021; originally announced June 2021.

Journal ref: ACS Applied Materials & Interfaces, 13 (35), 42146 (2021)

Pinhole-seeded lateral epitaxy and exfoliation of GaSb films on graphene-terminated surfaces

Authors: Sebastian Manzo, Patrick J. Strohbeen, Zheng-Hui Lim, Vivek Saraswat, Michael S. Arnold, Jason K. Kawasaki

Abstract: Remote epitaxy is a promising approach for synthesizing exfoliatable crystalline membranes and enabling epitaxy of materials with large lattice mismatch. However, the atomic scale mechanisms for remote epitaxy remain unclear. Here we experimentally demonstrate that GaSb films grow on graphene-terminated GaSb (001) via a seeded lateral epitaxy mechanism, in which pinhole defects in the graphene ser… ▽ More Remote epitaxy is a promising approach for synthesizing exfoliatable crystalline membranes and enabling epitaxy of materials with large lattice mismatch. However, the atomic scale mechanisms for remote epitaxy remain unclear. Here we experimentally demonstrate that GaSb films grow on graphene-terminated GaSb (001) via a seeded lateral epitaxy mechanism, in which pinhole defects in the graphene serve as selective nucleation sites, followed by lateral epitaxy and coalescence into a continuous film. Remote interactions are not necessary in order to explain the growth. Importantly, the small size of the pinholes permits exfoliation of continuous, free-standing GaSb membranes. Due to the chemical similarity between GaSb and other III-V materials, we anticipate this mechanism to apply more generally to other materials. By combining molecular beam epitaxy with \textit{in-situ} electron diffraction and photoemission, plus \textit{ex-situ} atomic force microscopy and Raman spectroscopy, we track the graphene defect generation and GaSb growth evolution a few monolayers at a time. Our results show that the controlled introduction of nanoscale openings in graphene provides a powerful route towards tuning the growth and properties of epitaxial films and membranes on 2D materials. △ Less

Submitted 12 August, 2022; v1 submitted 1 June, 2021; originally announced June 2021.

Journal ref: Nature Communications 13, 4014 (2022)

Epitaxy, exfoliation, and strain-induced magnetism in rippled Heusler membranes

Authors: Dongxue Du, Sebastian Manzo, Chenyu Zhang, Vivek Saraswat, Konrad T. Genser, Karin M. Rabe, Paul M. Voyles, Michael S. Arnold, Jason K. Kawasaki

Abstract: Single-crystalline membranes of functional materials enable the tuning of properties via extreme strain states; however, conventional routes for producing membranes require the use of sacrificial layers and chemical etchants, which can both damage the membrane and limit the ability to make them ultrathin. Here we demonstrate the epitaxial growth of the cubic Heusler compound GdPtSb on graphene-ter… ▽ More Single-crystalline membranes of functional materials enable the tuning of properties via extreme strain states; however, conventional routes for producing membranes require the use of sacrificial layers and chemical etchants, which can both damage the membrane and limit the ability to make them ultrathin. Here we demonstrate the epitaxial growth of the cubic Heusler compound GdPtSb on graphene-terminated Al$_2$O$_3$ substrates. Despite the presence of the graphene interlayer, the Heusler films have epitaxial registry to the underlying sapphire, as revealed by x-ray diffraction, reflection high energy electron diffraction, and transmission electron microscopy. The weak Van der Waals interactions of graphene enable mechanical exfoliation to yield free-standing GdPtSb membranes, which form ripples when transferred to a flexible polymer handle. Whereas unstrained GdPtSb is antiferromagnetic, measurements on rippled membranes show a spontaneous magnetic moment at room temperature, with a saturation magnetization of 5.2 bohr magneton per Gd. First-principles calculations show that the coupling to homogeneous strain is too small to induce ferromagnetism, suggesting a dominant role for strain gradients. Our membranes provide a novel platform for tuning the magnetic properties of intermetallic compounds via strain (piezomagnetixm and magnetostriction) and strain gradients (flexomagnetism). △ Less

Submitted 3 April, 2021; v1 submitted 17 June, 2020; originally announced June 2020.

Journal ref: Nature Communications, 12, 2494 (2021)