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Wafer-scale low-disorder 2DEG in $^{28}$Si/SiGe without an epitaxial Si cap
Authors:
Davide Degli Esposti,
Brian Paquelet Wuetz,
Viviana Fezzi,
Mario Lodari,
Amir Sammak,
Giordano Scappucci
Abstract:
We grow $^{28}$Si/SiGe heterostructures by reduced-pressure chemical vapor deposition and terminate the stack without an epitaxial Si cap but with an amorphous Si-rich layer obtained by exposing the SiGe barrier to dichlorosilane at 500 °C. As a result, $^{28}$Si/SiGe heterostructure field-effect transistors feature a sharp semiconductor/dielectric interface and support a two-dimensional electron…
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We grow $^{28}$Si/SiGe heterostructures by reduced-pressure chemical vapor deposition and terminate the stack without an epitaxial Si cap but with an amorphous Si-rich layer obtained by exposing the SiGe barrier to dichlorosilane at 500 °C. As a result, $^{28}$Si/SiGe heterostructure field-effect transistors feature a sharp semiconductor/dielectric interface and support a two-dimensional electron gas with enhanced and more uniform transport properties across a 100 mm wafer. At T = 1.7 K we measure a high mean mobility of (1.8$\pm$0.5)$\times$10$^5$ cm$^2$/Vs and a low mean percolation density of (9$\pm$1)$\times$10$^{10}$ cm$^{-2}$. From the analysis of Shubnikov-de Haas oscillations at T = 190 mK we obtain a long mean single particle relaxation time of (8.1$\pm$0.5) ps, corresponding to a mean quantum mobility and quantum level broadening of (7.5$\pm$0.6)$\times$10$^4$ cm$^{2}$/Vs and (40$\pm$3) $μ$eV, respectively, and a small mean Dingle ratio of (2.3$\pm$0.2), indicating reduced scattering from long range impurities and a low-disorder environment for hosting high-performance spin-qubits.
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Submitted 21 April, 2022; v1 submitted 16 February, 2022;
originally announced February 2022.
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A quantum dot crossbar with sublinear scaling of interconnects at cryogenic temperature
Authors:
P. L. Bavdaz,
H. G. J. Eenink,
J. van Staveren,
M. Lodari,
C. G. Almudever,
J. S. Clarke,
F. Sebastiano,
M. Veldhorst,
G. Scappucci
Abstract:
We demonstrate a 36$\times$36 gate electrode crossbar that supports 648 narrow-channel field effect transistors (FET) for gate-defined quantum dots, with a quadratic increase in quantum dot count upon a linear increase in control lines. The crossbar is fabricated on an industrial $^{28}$Si-MOS stack and shows 100% FET yield at cryogenic temperature. We observe a decreasing threshold voltage for wi…
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We demonstrate a 36$\times$36 gate electrode crossbar that supports 648 narrow-channel field effect transistors (FET) for gate-defined quantum dots, with a quadratic increase in quantum dot count upon a linear increase in control lines. The crossbar is fabricated on an industrial $^{28}$Si-MOS stack and shows 100% FET yield at cryogenic temperature. We observe a decreasing threshold voltage for wider channel devices and obtain a normal distribution of pinch-off voltages for nominally identical tunnel barriers probed over 1296 gate crossings. Macroscopically across the crossbar, we measure an average pinch-off of 1.17~V with a standard deviation of 46.8 mV, while local differences within each unit cell indicate a standard deviation of 23.1~mV. These disorder potential landscape variations translate to 1.2 and 0.6 times the measured quantum dot charging energy, respectively. Such metrics provide means for material and device optimization and serve as guidelines in the design of large-scale architectures for fault-tolerant semiconductor-based quantum computing.
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Submitted 9 February, 2022;
originally announced February 2022.
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Lightly-strained germanium quantum wells with hole mobility exceeding one million
Authors:
M. Lodari,
O. Kong,
M. Rendell,
A. Tosato,
A. Sammak,
M. Veldhorst,
A. R. Hamilton,
G. Scappucci
Abstract:
We demonstrate that a lightly-strained germanium channel ($\varepsilon_{//}$ = -0.41%) in an undoped Ge/Si$_{0.1}$Ge$_{0.9}$ heterostructure field effect transistor supports a 2D hole gas with mobility in excess of 1$\times$10$^{6}$ cm$^{2}$/Vs and percolation density less than 5$\times$10$^{10}$ cm$^{-2}$. This low disorder 2D hole system shows tunable fractional quantum Hall effect at low densit…
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We demonstrate that a lightly-strained germanium channel ($\varepsilon_{//}$ = -0.41%) in an undoped Ge/Si$_{0.1}$Ge$_{0.9}$ heterostructure field effect transistor supports a 2D hole gas with mobility in excess of 1$\times$10$^{6}$ cm$^{2}$/Vs and percolation density less than 5$\times$10$^{10}$ cm$^{-2}$. This low disorder 2D hole system shows tunable fractional quantum Hall effect at low density and low magnetic field. The low-disorder and small effective mass (0.068$m_e$) defines lightly-strained germanium as a basis to tune the strength of the spin-orbit coupling for fast and coherent quantum hardware.
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Submitted 5 February, 2022; v1 submitted 22 December, 2021;
originally announced December 2021.
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Atomic fluctuations lifting the energy degeneracy in Si/SiGe quantum dots
Authors:
Brian Paquelet Wuetz,
Merritt P. Losert,
Sebastian Koelling,
Lucas E. A. Stehouwer,
Anne-Marije J. Zwerver,
Stephan G. J. Philips,
Mateusz T. Mądzik,
Xiao Xue,
Guoji Zheng,
Mario Lodari,
Sergey V. Amitonov,
Nodar Samkharadze,
Amir Sammak,
Lieven M. K. Vandersypen,
Rajib Rahman,
Susan N. Coppersmith,
Oussama Moutanabbir,
Mark Friesen,
Giordano Scappucci
Abstract:
Electron spins in Si/SiGe quantum wells suffer from nearly degenerate conduction band valleys, which compete with the spin degree of freedom in the formation of qubits. Despite attempts to enhance the valley energy splitting deterministically, by engineering a sharp interface, valley splitting fluctuations remain a serious problem for qubit uniformity, needed to scale up to large quantum processor…
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Electron spins in Si/SiGe quantum wells suffer from nearly degenerate conduction band valleys, which compete with the spin degree of freedom in the formation of qubits. Despite attempts to enhance the valley energy splitting deterministically, by engineering a sharp interface, valley splitting fluctuations remain a serious problem for qubit uniformity, needed to scale up to large quantum processors. Here, we elucidate and statistically predict the valley splitting by the holistic integration of 3D atomic-level properties, theory and transport. We find that the concentration fluctuations of Si and Ge atoms within the 3D landscape of Si/SiGe interfaces can explain the observed large spread of valley splitting from measurements on many quantum dot devices. Against the prevailing belief, we propose to boost these random alloy composition fluctuations by incorporating Ge atoms in the Si quantum well to statistically enhance valley splitting.
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Submitted 1 December, 2022; v1 submitted 17 December, 2021;
originally announced December 2021.
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Valley splitting in silicon from the interference pattern of quantum oscillations
Authors:
M. Lodari,
L. Lampert,
O. Zietz,
R. Pillarisetty,
J. Clarke,
G. Scappucci
Abstract:
We determine the energy splitting of the conduction-band valleys in two-dimensional (2D) electrons confined in silicon metal oxide semiconductor (Si-MOS) Hall-bar transistors. These Si-MOS Hall bars are made by advanced semiconductor manufacturing on 300 mm Si wafers and support a 2D electron gas of high quality with a maximum mobility of 17.6$\times$10$^3$cm$^2$/Vs and minimum percolation density…
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We determine the energy splitting of the conduction-band valleys in two-dimensional (2D) electrons confined in silicon metal oxide semiconductor (Si-MOS) Hall-bar transistors. These Si-MOS Hall bars are made by advanced semiconductor manufacturing on 300 mm Si wafers and support a 2D electron gas of high quality with a maximum mobility of 17.6$\times$10$^3$cm$^2$/Vs and minimum percolation density of 3.45$\times$10$^{10}$cm$^{-2}$. Because of the low disorder, we observe beatings in the Shubnikov-de Haas oscillations that arise from the energy-split two low-lying conduction band valleys. From the analysis of the oscillations beating patterns up to T = 1.7 K, we estimate a maximum valley splitting of 8.2 meV at a density of 6.8$\times$10$^{12}$cm$^{-2}$. Furthermore, the valley splitting increases with density at a rate consistent with theoretical predictions for a near-ideal semiconductor/oxide interface.
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Submitted 5 April, 2022; v1 submitted 9 December, 2021;
originally announced December 2021.
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InSbAs two-dimensional electron gases as a platform for topological superconductivity
Authors:
Christian M. Moehle,
Chung Ting Ke,
Qingzhen Wang,
Candice Thomas,
Di Xiao,
Saurabh Karwal,
Mario Lodari,
Vincent van de Kerkhof,
Ruben Termaat,
Geoffrey C. Gardner,
Giordano Scappucci,
Michael J. Manfra,
Srijit Goswami
Abstract:
Topological superconductivity can be engineered in semiconductors with strong spin-orbit interaction coupled to a superconductor. Experimental advances in this field have often been triggered by the development of new hybrid material systems. Among these, two-dimensional electron gases (2DEGs) are of particular interest due to their inherent design flexibility and scalability. Here we discuss resu…
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Topological superconductivity can be engineered in semiconductors with strong spin-orbit interaction coupled to a superconductor. Experimental advances in this field have often been triggered by the development of new hybrid material systems. Among these, two-dimensional electron gases (2DEGs) are of particular interest due to their inherent design flexibility and scalability. Here we discuss results on a 2D platform based on a ternary 2DEG (InSbAs) coupled to in-situ grown Aluminum. The spin-orbit coupling in these 2DEGs can be tuned with the As concentration, reaching values up to 400 meV$\unicode{xC5}$, thus exceeding typical values measured in its binary constituents. In addition to a large Landé g-factor $\sim$ 55 (comparable to InSb), we show that the clean superconductor-semiconductor interface leads to a hard induced superconducting gap. Using this new platform we demonstrate the basic operation of phase-controllable Josephson junctions, superconducting islands and quasi-1D systems, prototypical device geometries used to study Majorana zero modes.
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Submitted 4 November, 2021; v1 submitted 21 May, 2021;
originally announced May 2021.
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Qubits made by advanced semiconductor manufacturing
Authors:
A. M. J. Zwerver,
T. Krähenmann,
T. F. Watson,
L. Lampert,
H. C. George,
R. Pillarisetty,
S. A. Bojarski,
P. Amin,
S. V. Amitonov,
J. M. Boter,
R. Caudillo,
D. Corras-Serrano,
J. P. Dehollain,
G. Droulers,
E. M. Henry,
R. Kotlyar,
M. Lodari,
F. Luthi,
D. J. Michalak,
B. K. Mueller,
S. Neyens,
J. Roberts,
N. Samkharadze,
G. Zheng,
O. K. Zietz
, et al. (4 additional authors not shown)
Abstract:
Full-scale quantum computers require the integration of millions of quantum bits. The promise of leveraging industrial semiconductor manufacturing to meet this requirement has fueled the pursuit of quantum computing in silicon quantum dots. However, to date, their fabrication has relied on electron-beam lithography and, with few exceptions, on academic style lift-off processes. Although these fabr…
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Full-scale quantum computers require the integration of millions of quantum bits. The promise of leveraging industrial semiconductor manufacturing to meet this requirement has fueled the pursuit of quantum computing in silicon quantum dots. However, to date, their fabrication has relied on electron-beam lithography and, with few exceptions, on academic style lift-off processes. Although these fabrication techniques offer process flexibility, they suffer from low yield and poor uniformity. An important question is whether the processing conditions developed in the manufacturing fab environment to enable high yield, throughput, and uniformity of transistors are suitable for quantum dot arrays and do not compromise the delicate qubit properties. Here, we demonstrate quantum dots hosted at a 28Si/28SiO2 interface, fabricated in a 300 mm semiconductor manufacturing facility using all-optical lithography and fully industrial processing. As a result, we achieve nanoscale gate patterns with remarkable homogeneity. The quantum dots are well-behaved in the multi-electron regime, with excellent tunnel barrier control, a crucial feature for fault-tolerant two-qubit gates. Single-spin qubit operation using magnetic resonance reveals relaxation times of over 1 s at 1 Tesla and coherence times of over 3 ms, matching the quality of silicon spin qubits reported to date. The feasibility of high-quality qubits made with fully-industrial techniques strongly enhances the prospects of a large-scale quantum computer
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Submitted 29 January, 2021;
originally announced January 2021.
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Low percolation density and charge noise with holes in germanium
Authors:
M. Lodari,
N. W. Hendrickx,
W. I. L. Lawrie,
T. -K. Hsiao,
L. M. K. Vandersypen,
A. Sammak,
M. Veldhorst,
G. Scappucci
Abstract:
We engineer planar Ge/SiGe heterostructures for low disorder and quiet hole quantum dot operation by positioning the strained Ge channel 55~nm below the semiconductor/dielectric interface. In heterostructure field effect transistors, we measure a percolation density for two-dimensional hole transport of $2.1\times10^{10}~\text{cm}^{-2}$, indicative of a very low disorder potential landscape experi…
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We engineer planar Ge/SiGe heterostructures for low disorder and quiet hole quantum dot operation by positioning the strained Ge channel 55~nm below the semiconductor/dielectric interface. In heterostructure field effect transistors, we measure a percolation density for two-dimensional hole transport of $2.1\times10^{10}~\text{cm}^{-2}$, indicative of a very low disorder potential landscape experienced by holes in the buried Ge channel. These Ge heterostructures support quiet operation of hole quantum dots and we measure charge noise levels that are below the detection limit $\sqrt{S_\text{E}}=0.2~μ\text{eV}/\sqrt{\text{Hz}}$ at 1 Hz. These results establish planar Ge as a promising platform for scaled two-dimensional spin qubit arrays.
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Submitted 13 July, 2020;
originally announced July 2020.
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Effect of quantum Hall edge strips on valley splitting in silicon quantum wells
Authors:
Brian Paquelet Wuetz,
Merritt P. Losert,
Alberto Tosato,
Mario Lodari,
Peter L. Bavdaz,
Lucas Stehouwer,
Payam Amin,
James S. Clarke,
Susan N. Coppersmith,
Amir Sammak,
Menno Veldhorst,
Mark Friesen,
Giordano Scappucci
Abstract:
We determine the energy splitting of the conduction-band valleys in two-dimensional electrons confined to low-disorder Si quantum wells. We probe the valley splitting dependence on both perpendicular magnetic field $B$ and Hall density by performing activation energy measurements in the quantum Hall regime over a large range of filling factors. The mobility gap of the valley-split levels increases…
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We determine the energy splitting of the conduction-band valleys in two-dimensional electrons confined to low-disorder Si quantum wells. We probe the valley splitting dependence on both perpendicular magnetic field $B$ and Hall density by performing activation energy measurements in the quantum Hall regime over a large range of filling factors. The mobility gap of the valley-split levels increases linearly with $B$ and is strikingly independent of Hall density. The data are consistent with a transport model in which valley splitting depends on the incremental changes in density $eB/h$ across quantum Hall edge strips, rather than the bulk density. Based on these results, we estimate that the valley splitting increases with density at a rate of 116 $μ$eV/10$^{11}$cm$^{-2}$, consistent with theoretical predictions for near-perfect quantum well top interfaces.
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Submitted 29 September, 2020; v1 submitted 3 June, 2020;
originally announced June 2020.
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Vanishing Zeeman energy in a two-dimensional hole gas
Authors:
Patrick Del Vecchio,
Mario Lodari,
Amir Sammak,
Giordano Scappucci,
Oussama Moutanabbir
Abstract:
A clear signature of Zeeman split states crossing is observed in Landau fan diagram of strained germanium two-dimensional hole gas. The underlying mechanisms are discussed based on a perturbative model yielding a closed formula for the critical magnetic fields. These fields depend strongly on the energy difference between the top-most and the neighboring valence bands and are sensitive to the quan…
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A clear signature of Zeeman split states crossing is observed in Landau fan diagram of strained germanium two-dimensional hole gas. The underlying mechanisms are discussed based on a perturbative model yielding a closed formula for the critical magnetic fields. These fields depend strongly on the energy difference between the top-most and the neighboring valence bands and are sensitive to the quantum well thickness, strain, and spin-orbit-interaction. The latter is a necessary feature for the crossing to occur. This framework enables a straightforward quantification of the hole-state parameters from simple measurements, thus paving the way for its use in design and modelling of hole-based quantum devices.
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Submitted 19 October, 2020; v1 submitted 29 May, 2020;
originally announced June 2020.
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Quantum Dot Arrays in Silicon and Germanium
Authors:
W. I. L. Lawrie,
H. G. J. Eenink,
N. W. Hendrickx,
J. M. Boter,
L. Petit,
S. V. Amitonov,
M. Lodari,
B. Paquelet Wuetz,
C. Volk,
S. Philips,
G. Droulers,
N. Kalhor,
F. van Riggelen,
D. Brousse,
A. Sammak,
L. M. K. Vandersypen,
G. Scappucci,
M. Veldhorst
Abstract:
Electrons and holes confined in quantum dots define an excellent building block for quantum emergence, simulation, and computation. In order for quantum electronics to become practical, large numbers of quantum dots will be required, necessitating the fabrication of scaled structures such as linear and 2D arrays. Group IV semiconductors contain stable isotopes with zero nuclear spin and can thereb…
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Electrons and holes confined in quantum dots define an excellent building block for quantum emergence, simulation, and computation. In order for quantum electronics to become practical, large numbers of quantum dots will be required, necessitating the fabrication of scaled structures such as linear and 2D arrays. Group IV semiconductors contain stable isotopes with zero nuclear spin and can thereby serve as excellent host for spins with long quantum coherence. Here we demonstrate group IV quantum dot arrays in silicon metal-oxide-semiconductor (SiMOS), strained silicon (Si/SiGe) and strained germanium (Ge/SiGe). We fabricate using a multi-layer technique to achieve tightly confined quantum dots and compare integration processes. While SiMOS can benefit from a larger temperature budget and Ge/SiGe can make ohmic contact to metals, the overlap** gate structure to define the quantum dots can be based on a nearly identical integration. We realize charge sensing in each platform, for the first time in Ge/SiGe, and demonstrate fully functional linear and two-dimensional arrays where all quantum dots can be depleted to the last charge state. In Si/SiGe, we tune a quintuple quantum dot using the N+1 method to simultaneously reach the few electron regime for each quantum dot. We compare capacitive cross talk and find it to be the smallest in SiMOS, relevant for the tuning of quantum dot arrays. These results constitute an excellent base for quantum computation with quantum dots and provide opportunities for each platform to be integrated with standard semiconductor manufacturing.
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Submitted 14 September, 2019;
originally announced September 2019.
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Light effective hole mass in undoped Ge/SiGe quantum wells
Authors:
M. Lodari,
A. Tosato,
D. Sabbagh,
M. A. Schubert,
G. Capellini,
A. Sammak,
M. Veldhorst,
G. Scappucci
Abstract:
We report density-dependent effective hole mass measurements in undoped germanium quantum wells. We are able to span a large range of densities ($2.0-11\times10^{11}$ cm$^{-2}$) in top-gated field effect transistors by positioning the strained buried Ge channel at different depths of 12 and 44 nm from the surface. From the thermal dam** of the amplitude of Shubnikov-de Haas oscillations, we meas…
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We report density-dependent effective hole mass measurements in undoped germanium quantum wells. We are able to span a large range of densities ($2.0-11\times10^{11}$ cm$^{-2}$) in top-gated field effect transistors by positioning the strained buried Ge channel at different depths of 12 and 44 nm from the surface. From the thermal dam** of the amplitude of Shubnikov-de Haas oscillations, we measure a light mass of $0.061m_e$ at a density of $2.2\times10^{11}$ cm$^{-2}$. We confirm the theoretically predicted dependence of increasing mass with density and by extrapolation we find an effective mass of $\sim0.05m_e$ at zero density, the lightest effective mass for a planar platform that demonstrated spin qubits in quantum dots.
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Submitted 20 May, 2019;
originally announced May 2019.
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Ballistic superconductivity and tunable $π$-junctions in InSb quantum wells
Authors:
Chung Ting Ke,
Christian M. Moehle,
Folkert K. de Vries,
Candice Thomas,
Sara Metti,
Charles R. Guinn,
Ray Kallaher,
Mario Lodari,
Giordano Scappucci,
Tiantian Wang,
Rosa E. Diaz,
Geoffrey C. Gardner,
Michael J. Manfra,
Srijit Goswami
Abstract:
Two-dimensional electron gases (2DEGs) coupled to superconductors offer the opportunity to explore a variety of quantum phenomena. These include the study of novel Josephson effects, superconducting correlations in quantum (spin) Hall systems, hybrid superconducting qubits and emergent topological states in semiconductors with spin-orbit interaction (SOI). InSb is a well-known example of such a st…
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Two-dimensional electron gases (2DEGs) coupled to superconductors offer the opportunity to explore a variety of quantum phenomena. These include the study of novel Josephson effects, superconducting correlations in quantum (spin) Hall systems, hybrid superconducting qubits and emergent topological states in semiconductors with spin-orbit interaction (SOI). InSb is a well-known example of such a strong SOI semiconductor, however hybrid superconducting devices in InSb quantum wells remain unexplored. Here, we interface InSb 2DEGs with a superconductor (NbTiN) to create Josephson junctions (JJs), thus providing the first evidence of induced superconductivity in high quality InSb quantum wells. The JJs support supercurrent transport over several microns and display clear signatures of ballistic superconductivity. Furthermore, we exploit the large Landé g-factor and gate tunability of the junctions to control the current-phase relation, and drive transitions between the $0$ and $π$-states. This control over the free energy landscape allows us to construct a phase diagram identifying these $0$ and $π$-regions, in agreement with theory. Our results establish InSb quantum wells as a promising new material platform to study the interplay between superconductivity, SOI and magnetism.
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Submitted 27 February, 2019;
originally announced February 2019.
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Low disordered, stable, and shallow germanium quantum wells: a playground for spin and hybrid quantum technology
Authors:
A. Sammak,
D. Sabbagh,
N. W. Hendrickx,
M. Lodari,
B. Paquelet Wuetz,
L. Yeoh,
M. Bollani,
M. Virgilio,
M. A. Schubert,
P. Zaumseil,
G. Capellini,
M. Veldhorst,
G. Scappucci
Abstract:
Buried-channel semiconductor heterostructures are an archetype material platform to fabricate gated semiconductor quantum devices. Sharp confinement potential is obtained by positioning the channel near the surface, however nearby surface states degrade the electrical properties of the starting material. In this paper we demonstrate a two-dimensional hole gas of high mobility ($5\times 10^{5}$ cm…
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Buried-channel semiconductor heterostructures are an archetype material platform to fabricate gated semiconductor quantum devices. Sharp confinement potential is obtained by positioning the channel near the surface, however nearby surface states degrade the electrical properties of the starting material. In this paper we demonstrate a two-dimensional hole gas of high mobility ($5\times 10^{5}$ cm$^2$/Vs) in a very shallow strained germanium channel, which is located only 22 nm below the surface. This high mobility leads to mean free paths $\approx6 μm$, setting new benchmarks for holes in shallow FET devices. Carriers are confined in an undoped Ge/SiGe heterostructure with reduced background contamination, sharp interfaces, and high uniformity. The top-gate of a dopant-less field effect transistor controls the carrier density in the channel. The high mobility, along with a percolation density of $1.2\times 10^{11}\text{ cm}^{-2}$, light effective mass (0.09 m$_e$), and high g-factor (up to $7$) highlight the potential of undoped Ge/SiGe as a low-disorder material platform for hybrid quantum technologies.
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Submitted 7 September, 2018;
originally announced September 2018.
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Nuclear emulsions for the detection of micrometric-scale fringe patterns: an application to positron interferometry
Authors:
S. Aghion,
A. Ariga,
M. Bollani,
A. Ereditato,
R. Ferragut,
M. Giammarchi,
M. Lodari,
C. Pistillo,
S. Sala,
P. Scampoli,
M. Vladymyrov
Abstract:
Nuclear emulsions are capable of very high position resolution in the detection of ionizing particles. This feature can be exploited to directly resolve the micrometric-scale fringe pattern produced by a matter-wave interferometer for low energy positrons (in the 10-20 keV range). We have tested the performance of emulsion films in this specific scenario. Exploiting silicon nitride diffraction gra…
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Nuclear emulsions are capable of very high position resolution in the detection of ionizing particles. This feature can be exploited to directly resolve the micrometric-scale fringe pattern produced by a matter-wave interferometer for low energy positrons (in the 10-20 keV range). We have tested the performance of emulsion films in this specific scenario. Exploiting silicon nitride diffraction gratings as absorption masks, we produced periodic patterns with features comparable to the expected interferometer signal. Test samples with periodicities of 6, 7 and 20 μm were exposed to the positron beam, and the patterns clearly reconstructed. Our results support the feasibility of matter-wave interferometry experiments with positrons.
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Submitted 11 April, 2018; v1 submitted 12 February, 2018;
originally announced February 2018.