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ALD grown zinc oxide with controllable electrical properties
Authors:
E. Guziewicz,
M. Godlewski,
L. Wachnicki,
T. A. Krajewski,
G. Luka,
S. Gieraltowska,
R. Jakiela,
A. Stonert,
W. Lisowski,
M. Krawczyk,
J. W. Sobczak,
A. Jablonski
Abstract:
The paper presents results for zinc oxide films grown at low temperature regime by Atomic Layer Deposition (ALD). We discuss electrical properties of such films and show that low temperature deposition results in oxygen-rich ZnO layers in which free carrier concentration is very low. For optimized ALD process it can reach the level of 10^15 cm-3, while mobility of electrons is between 20 and 50 cm…
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The paper presents results for zinc oxide films grown at low temperature regime by Atomic Layer Deposition (ALD). We discuss electrical properties of such films and show that low temperature deposition results in oxygen-rich ZnO layers in which free carrier concentration is very low. For optimized ALD process it can reach the level of 10^15 cm-3, while mobility of electrons is between 20 and 50 cm2/Vs. Electrical parameters of ZnO films deposited by ALD at low temperature regime are appropriate for constructing of the ZnO-based p-n and Schottky junctions. We demonstrate that such junctions are characterized by the rectification ratio high enough to fulfill requirements of 3D memories and are deposited at temperature 100degC which makes them appropriate for deposition on organic substrates.
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Submitted 9 August, 2013;
originally announced August 2013.
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ZnO, ZnMnO and ZnCoO films grown by atomic layer deposition
Authors:
M. I. Łukasiewicz,
A. Wójcik-Głodowska,
E. Guziewicz,
A. Wolska,
M. T. Klepka,
P. Dłużewski,
R. Jakieła,
E. Łusakowska,
K. Kopalko,
W. Paszkowicz,
Ł. Wachnicki,
B. S. Witkowski,
W. Lisowski,
M. Krawczyk,
J. W. Sobczak,
A. Jabłoński,
M. Godlewski
Abstract:
Despite many efforts the origin of a ferromagnetic (FM) response in ZnMnO and ZnCoO is still not clear. Magnetic investigations of our samples, not discussed here, show that the room temperature FM response is observed only in alloys with a non-uniform Mn or Co distribution. Thus, the control of their distribution is crucial for explanation of contradicted magnetic properties of ZnCoO and ZnMnO re…
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Despite many efforts the origin of a ferromagnetic (FM) response in ZnMnO and ZnCoO is still not clear. Magnetic investigations of our samples, not discussed here, show that the room temperature FM response is observed only in alloys with a non-uniform Mn or Co distribution. Thus, the control of their distribution is crucial for explanation of contradicted magnetic properties of ZnCoO and ZnMnO reported till now. In the present review we discuss advantages of the Atomic Layer Deposition (ALD) growth method, which enables us to control uniformity of ZnMnO and ZnCoO alloys. Properties of ZnO, ZnMnO and ZnCoO films grown by the ALD are discussed.
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Submitted 9 August, 2013;
originally announced August 2013.
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Homogenous and heterogeneous magnetism in (Zn,Co)O
Authors:
M. Sawicki,
E. Guziewicz,
M. I. Lukasiewicz,
O. Proselkov,
I. A. Kowalik,
W. Lisowski,
P. Dluzewski,
A. Wittlin,
M. Jaworski,
A. Wolska,
W. Paszkowicz,
R. Jakiela,
B. S. Witkowski,
L. Wachnicki,
M. T. Klepka,
F. J. Luque,
D. Arvanitis,
J. W. Sobczak,
M. Krawczyk,
A. Jablonski,
W. Stefanowicz,
D. Sztenkiel,
M. Godlewski,
T. Dietl
Abstract:
A series of (ZnO)m(CoO)n digital alloys and superlattices grown by atomic layer deposition has been investigated by a range of experimental methods. The data provide evidences that the Co interdiffusion in the digital alloy structures is sufficient to produce truly random Zn1-xCoxO mixed crystals with x up to 40%. Conversely, in the superlattice structures the interdiffusion is not strong enough t…
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A series of (ZnO)m(CoO)n digital alloys and superlattices grown by atomic layer deposition has been investigated by a range of experimental methods. The data provide evidences that the Co interdiffusion in the digital alloy structures is sufficient to produce truly random Zn1-xCoxO mixed crystals with x up to 40%. Conversely, in the superlattice structures the interdiffusion is not strong enough to homogenize the Co content along the growth direction results in the formation of (Zn,Co)O films with spatially modulated Co concentrations. All structures deposited at 160\circC show magnetic properties specific to dilute magnetic semiconductors with localized spins S = 3/2 coupled by strong but short range antiferromagnetic interactions that lead to low temperature spin-glass freezing.
It is demonstrated that ferromagnetic-like features, visible exclusively in layers grown at 200\circC and above, are associated with an interfacial mesh of metallic Co granules residing between the substrate and the (Zn,Co)O layer. This explains why the magnitude of ferromagnetic signal is virtually independent of the film thickness as well as elucidates the origin of magnetic anisotropy. Our conclusions have been derived for layers in which the Co concentration, distribution, and aggregation have been determined by: secondary-ion mass spectroscopy, electron probe micro-analysis, high-resolution transmission electron microscopy with capabilities allowing for chemical analysis; x-ray absorption near-edge structure; extended x-ray absorption fine-structure; x-ray photoemission spectroscopy, and x-ray circular magnetic dichroism. Macroscopic properties of these layers have been investigated by superconducting quantum interference device magnetometery and microwave dielectric losses allowing to confirm the important role of metallic inclusions.
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Submitted 25 January, 2012;
originally announced January 2012.
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Role of interface in ferromagnetism of (Zn,Co)O films
Authors:
M. Godlewski,
E. Guziewicz,
M. I. Lukasiewicz,
I. A. Kowalik,
M. Sawicki,
B. S. Witkowski,
R. Jakiela,
W. Lisowski,
J. W. Sobczak,
M. Krawczyk
Abstract:
We demonstrate that room temperature ferromagnetic response (RT FR) of ZnCoO films grown at low temperature by the Atomic layer Deposition (ALD) method is due to Co metal accumulations at the ZnCoO/substrate interface region. The accumulated experimental evi evidences allow us to reject several other explanations of this effect in our samples, despite the fact that some of them are likely to be re…
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We demonstrate that room temperature ferromagnetic response (RT FR) of ZnCoO films grown at low temperature by the Atomic layer Deposition (ALD) method is due to Co metal accumulations at the ZnCoO/substrate interface region. The accumulated experimental evi evidences allow us to reject several other explanations of this effect in our samples, despite the fact that some of them are likely to be responsible for the low temperature FM in this class of the material.
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Submitted 26 July, 2011;
originally announced July 2011.
