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VUV irradiance measurement of a 2.45 GHz microwave-driven hydrogen discharge
Authors:
J. Komppula,
O. Tarvainen,
T. Kalvas,
H. Koivisto,
R. Kronholm,
J. Laulainen,
P. Myllyperkiö
Abstract:
Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the volumetric photon emission rate in the VUV-range (80-250 nm) is $10^{16}$-$10^{17}$ 1/cm$^3$s, which corresponds to approximately 8% dissipation of injected microwave…
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Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the volumetric photon emission rate in the VUV-range (80-250 nm) is $10^{16}$-$10^{17}$ 1/cm$^3$s, which corresponds to approximately 8% dissipation of injected microwave power by VUV photon emission. The volumetric emission of characteristic emission bands was utilized to diagnostics of molecular plasma processes including volumetric rates of ionization, dissociation and excitation to high vibrational levels and metastable states. The estimated reaction rates imply that each injected molecule experiences several inelastic electron impact collisions. The upper limit for the total density of metastable neutrals ($2S$ atoms and $c^3Π_u$ molecules) was estimated to be approximately 0.5% of the neutral gas density.
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Submitted 8 October, 2015;
originally announced October 2015.
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Photoelectron Emission from Metal Surfaces Induced by Radiation Emitted by a 14 GHz Electron Cyclotron Resonance Ion Source
Authors:
Janne Laulainen,
Taneli Kalvas,
Hannu Koivisto,
Jani Komppula,
Risto Kronholm,
Olli Tarvainen
Abstract:
Photoelectron emission measurements have been performed using a room-temperature 14 GHz ECR ion source. It is shown that the photoelectron emission from Al, Cu, and stainless steel (SAE 304) surfaces, which are common plasma chamber materials, is predominantly caused by radiation emitted from plasma with energies between 8 eV and 1 keV. Characteristic X-ray emission and bremsstrahlung from plasma…
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Photoelectron emission measurements have been performed using a room-temperature 14 GHz ECR ion source. It is shown that the photoelectron emission from Al, Cu, and stainless steel (SAE 304) surfaces, which are common plasma chamber materials, is predominantly caused by radiation emitted from plasma with energies between 8 eV and 1 keV. Characteristic X-ray emission and bremsstrahlung from plasma have a negligible contribution to the photoelectron emission. It is estimated from the measured data that the maximum conceivable photoelectron flux from plasma chamber walls is on the order of 10 % of the estimated total electron losses from the plasma.
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Submitted 1 September, 2015;
originally announced September 2015.
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Photoelectron Emission from Metal Surfaces Induced by VUV-emission of Filament Driven Hydrogen Arc Discharge Plasma
Authors:
J. Laulainen,
T. Kalvas,
H. Koivisto,
J. Komppula,
O. Tarvainen
Abstract:
Photoelectron emission measurements have been performed using a filament-driven multi-cusp arc discharge volume production H^- ion source (LIISA). It has been found that photoelectron currents obtained with Al, Cu, Mo, Ta and stainless steel (SAE 304) are on the same order of magnitude. The photoelectron currents depend linearly on the discharge power. It is shown experimentally that photoelectron…
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Photoelectron emission measurements have been performed using a filament-driven multi-cusp arc discharge volume production H^- ion source (LIISA). It has been found that photoelectron currents obtained with Al, Cu, Mo, Ta and stainless steel (SAE 304) are on the same order of magnitude. The photoelectron currents depend linearly on the discharge power. It is shown experimentally that photoelectron emission is significant only in the short wavelength range of hydrogen spectrum due to the energy dependence of the quantum efficiency. It is estimated from the measured data that the maximum photoelectron flux from plasma chamber walls is on the order of 1 A per kW of discharge power.
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Submitted 27 March, 2015;
originally announced March 2015.
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An Experimental Study of Waveguide Coupled Microwave Heating with Conventional Multicusp Negative Ion Source
Authors:
J. Komppula,
T. Kalvas,
H. Koivisto,
J. Laulainen,
O. Tarvainen
Abstract:
Negative ion production with conventional multicusp plasma chambers utilizing 2.45 GHz microwave heating is demonstrated. The experimental results were obtained with the multicusp plasma chambers and extraction systems of the RFdriven RADIS ion source and the filament driven arc discharge ion source LIISA. A waveguide microwave coupling system, which is almost similar to the one used with the SILH…
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Negative ion production with conventional multicusp plasma chambers utilizing 2.45 GHz microwave heating is demonstrated. The experimental results were obtained with the multicusp plasma chambers and extraction systems of the RFdriven RADIS ion source and the filament driven arc discharge ion source LIISA. A waveguide microwave coupling system, which is almost similar to the one used with the SILHI ion source, was used. The results demonstrate that at least one third of negative ion beam obtained with inductive RF-coupling (RADIS) or arc discharge (LIISA) can be achieved with 1 kW of 2.45 GHz microwave power in CW mode without any modification of the plasma chamber. The co-extracted electron to H^- ratio and the optimum pressure range were observed to be similar for both heating methods. The behaviour of the plasma implies that the energy transfer from the microwaves to the plasma electrons is mainly an off-resonance process.
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Submitted 27 March, 2015;
originally announced March 2015.
