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Method for estimating charge breeder ECR ion source plasma parameters with short pulse 1+ injection
Authors:
J. Angot,
M. Luntinen,
T. Kalvas,
H. Koivisto,
R. Kronholm,
L. Maunoury,
O. Tarvainen,
T. Thuillier,
V. Toivanen
Abstract:
A new method for determining plasma parameters from beam current transients resulting from short pulse 1+ injection into a Charge Breeder Electron Cyclotron Resonance Ion Source (CB-ECRIS) has been developed. The proposed method relies on few assumptions, and yields the ionisation times $1/n_e\left\langleσv\right\rangle^{\text{inz}}_{q\to q+1}$, charge exchange times…
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A new method for determining plasma parameters from beam current transients resulting from short pulse 1+ injection into a Charge Breeder Electron Cyclotron Resonance Ion Source (CB-ECRIS) has been developed. The proposed method relies on few assumptions, and yields the ionisation times $1/n_e\left\langleσv\right\rangle^{\text{inz}}_{q\to q+1}$, charge exchange times $1/n_0\left\langleσv\right\rangle^{\text{cx}}_{q\to q-1}$, the ion confinement times $τ^q$, as well as the plasma energy contents $n_e\left\langle E_e\right\rangle$ and the plasma triple products $n_e \left\langle E_e\right\rangle τ^q$. The method is based on fitting the current balance equation on the extracted beam currents of high charge state ions, and using the fitting coefficients to determine the postdictions for the plasma parameters via an optimisation routine.
The method has been applied for the charge breeding of injected K$^+$ ions in helium plasma. It is shown that the confinement times of K$^{q+}$ charge states range from 2.6$^{+0.8}_{-0.4}$ ms to 16.4$^{+18.3}_{-6.8}$ ms increasing with the charge state. The ionisation and charge exchange times for the high charge state ions are 2.6$^{+0.5}_{-0.5}$ ms--12.6$^{+2.6}_{-3.2}$ ms and 3.7$^{+5.0}_{-1.6}$ ms--357.7$^{+406.7}_{-242.4}$ ms, respectively. The plasma energy content is found to be $2.5^{+4.3}_{-1.8}\times 10^{15}$ eV/cm$^3$.
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Submitted 5 March, 2021;
originally announced March 2021.
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Experimental evidence on photo-assisted O$^-$ ion production from Al$_2$O$_3$ cathode in cesium sputter negative ion source
Authors:
O. Tarvainen,
R. Kronholm,
M. Laitinen,
M. Reponen,
J. Julin,
V. Toivanen,
M. Napari,
M. Marttinen,
D. Faircloth,
H. Koivisto,
T. Sajavaara
Abstract:
The production of negative ions in cesium sputter ion sources is generally considered to be a pure surface process. It has been recently proposed that ion pair production could explain the higher-than-expected beam currents extracted from these ion sources, therefore opening the door for laser-assisted enhancement of the negative ion yield. We have tested this hypothesis by measuring the effect of…
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The production of negative ions in cesium sputter ion sources is generally considered to be a pure surface process. It has been recently proposed that ion pair production could explain the higher-than-expected beam currents extracted from these ion sources, therefore opening the door for laser-assisted enhancement of the negative ion yield. We have tested this hypothesis by measuring the effect of various pulsed diode lasers on the O$^-$ beam current produced from Al$_2$O$_3$ cathode of a cesium sputter ion source. It is expected that the ion pair production of O$^-$ requires populating the 5d electronic states of neutral cesium, thus implying that the process should be provoked only with specific wavelengths. Our experimental results provide evidence for the existence of a wavelength-dependent photo-assisted effect but cast doubt on its alleged resonant nature as the prompt enhancement of beam current can be observed with laser wavelengths exceeding a threshold photon energy. The beam current transients observed during the laser pulses suggest that the magnitude and longevity of the beam current enhancement depends on the cesium balance on the cathode surface. We conclude that the photo-assisted negative ion production could be of practical importance as it can more than double the extracted beam current under certain operational settings of the ion source.
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Submitted 1 July, 2020;
originally announced July 2020.
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Measurements of the energy distribution of electrons lost from the minimum B-field -- the effect of instabilities and two-frequency heating
Authors:
Ivan Izotov,
Olli Tarvainen,
Vadim Skalyga,
Dmitry Mansfeld,
Hannu Koivisto,
Risto Kronholm,
Ville Toivanen,
Vladimir Mironov
Abstract:
Further progress in the development of ECR ion sources (ECRIS) requires deeper understanding of the underlying physics. One of the topics that remains obscure, though being crucial for the performance of the ECRIS, is the electron energy distribution (EED). A well-developed technique of measuring the EED of electrons esca** axially from the magnetically confined plasma of an ECRIS was used for t…
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Further progress in the development of ECR ion sources (ECRIS) requires deeper understanding of the underlying physics. One of the topics that remains obscure, though being crucial for the performance of the ECRIS, is the electron energy distribution (EED). A well-developed technique of measuring the EED of electrons esca** axially from the magnetically confined plasma of an ECRIS was used for the study of EED in unstable mode of plasma confinement, i.e. in the presence of kinetic instabilities. The experimental data were recorded for pulsed and CW discharges with a room-temperature 14 GHz ECRIS at the JYFL accelerator laboratory. The measurements were focused on observing differences between the EED esca** from a stable and unstable plasmas. It was found that nonlinear phenomena alter the EED noticeably. The electron losses are enhanced in both unstable regime and with two-frequency heating suppressing the instabilities. It has been shown earlier that two-frequency heating boosts the ECRIS performance presumably owing to the suppression of instabilities. We report the observed changes in EED introduced by the secondary frequency in different regimes, including an off-resonance condition where the secondary frequency is lower than the minimum frequency satisfying the resonance condition for cold electrons at the magnetic field minimum. Finally, we suggest an experimental method of qualitative evaluation of the energy distribution of electrons confined in the magnetic trap using a method of measuring energy distribution of lost electrons during the plasma decay in pulsed operation of the ion source.
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Submitted 10 December, 2019;
originally announced December 2019.
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The role of rf-scattering in high-energy electron losses from minimum-B ECR ion source
Authors:
I. V. Izotov,
A. G. Shalashov,
V. A. Skalyga,
E. D. Gospodchikov,
O. Tarvainen,
V. E. Mironov,
H. Koivisto,
R. Kronholm,
V. Toivanen,
B. Bhaskar
Abstract:
The measurement of the axially lost electron energy distribution esca** from a minimum-B electron cyclotron resonance ion source in the range of 4-800 keV is reported. The experiments have revealed the existence of a hump at 150-300 keV energy, containing up to 15% of the lost electrons and carrying up to 30% of the measured energy losses. The mean energy of the hump is independent of the microw…
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The measurement of the axially lost electron energy distribution esca** from a minimum-B electron cyclotron resonance ion source in the range of 4-800 keV is reported. The experiments have revealed the existence of a hump at 150-300 keV energy, containing up to 15% of the lost electrons and carrying up to 30% of the measured energy losses. The mean energy of the hump is independent of the microwave power, frequency and neutral gas pressure but increases with the magnetic field strength, most importantly with the value of the minimum-B field. Experiments in pulsed operation mode have indicated the presence of the hump only when microwave power is applied, confirming that the origin of the hump is rf-induced momentum space diffusion. Possible mechanism of the hump formation is considered basing on the quasi-linear model of plasma-wave interaction.
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Submitted 8 December, 2020; v1 submitted 9 December, 2019;
originally announced December 2019.
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Measurement of the energy distribution of electrons esca** minimum-B ECR plasmas
Authors:
Ivan Izotov,
Olli Tarvainen,
Vadim Skalyga,
Dmitry Mansfeld,
Taneli Kalvas,
Hannu Koivisto,
Risto Kronholm
Abstract:
The measurement of the electron energy distribution (EED) of electrons esca** axially from a minimum-B electron cyclotron resonance ion source (ECRIS) is reported. The experimental data were recorded with a room-temperature 14 GHz ECRIS at the JYFL accelerator laboratory. The electrons esca** through the extraction mirror of the ion source were detected with a secondary electron amplifier plac…
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The measurement of the electron energy distribution (EED) of electrons esca** axially from a minimum-B electron cyclotron resonance ion source (ECRIS) is reported. The experimental data were recorded with a room-temperature 14 GHz ECRIS at the JYFL accelerator laboratory. The electrons esca** through the extraction mirror of the ion source were detected with a secondary electron amplifier placed downstream from a dipole magnet serving as an electron spectrometer with 500 eV resolution. It was discovered that the EED in the range of 5 - 250 keV is strongly non-Maxwellian and exhibits several local maxima below 20 keV energy. It was observed that the most influential ion source operating parameter on the EED is the magnetic field strength, which affected the EED predominantly at energies less than 100 keV. The effects of the microwave power and frequency, ranging from 100 to 600 W and 11 to 14 GHz respectively, on the EED were found to be less significant. The presented technique and experiments enable the comparison between direct measurement of the EED and results derived from bremsstrahlung diagnostics, the latter being severely complicated by the non-Maxwellian nature of the EED reported here. The role of RF pitch angle scattering on electron losses and the relation between the EED of the axially esca** electrons and the EED of the confined electrons are discussed.
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Submitted 15 November, 2017;
originally announced November 2017.
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VUV irradiance measurement of a 2.45 GHz microwave-driven hydrogen discharge
Authors:
J. Komppula,
O. Tarvainen,
T. Kalvas,
H. Koivisto,
R. Kronholm,
J. Laulainen,
P. Myllyperkiö
Abstract:
Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the volumetric photon emission rate in the VUV-range (80-250 nm) is $10^{16}$-$10^{17}$ 1/cm$^3$s, which corresponds to approximately 8% dissipation of injected microwave…
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Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the volumetric photon emission rate in the VUV-range (80-250 nm) is $10^{16}$-$10^{17}$ 1/cm$^3$s, which corresponds to approximately 8% dissipation of injected microwave power by VUV photon emission. The volumetric emission of characteristic emission bands was utilized to diagnostics of molecular plasma processes including volumetric rates of ionization, dissociation and excitation to high vibrational levels and metastable states. The estimated reaction rates imply that each injected molecule experiences several inelastic electron impact collisions. The upper limit for the total density of metastable neutrals ($2S$ atoms and $c^3Π_u$ molecules) was estimated to be approximately 0.5% of the neutral gas density.
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Submitted 8 October, 2015;
originally announced October 2015.
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Photoelectron Emission from Metal Surfaces Induced by Radiation Emitted by a 14 GHz Electron Cyclotron Resonance Ion Source
Authors:
Janne Laulainen,
Taneli Kalvas,
Hannu Koivisto,
Jani Komppula,
Risto Kronholm,
Olli Tarvainen
Abstract:
Photoelectron emission measurements have been performed using a room-temperature 14 GHz ECR ion source. It is shown that the photoelectron emission from Al, Cu, and stainless steel (SAE 304) surfaces, which are common plasma chamber materials, is predominantly caused by radiation emitted from plasma with energies between 8 eV and 1 keV. Characteristic X-ray emission and bremsstrahlung from plasma…
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Photoelectron emission measurements have been performed using a room-temperature 14 GHz ECR ion source. It is shown that the photoelectron emission from Al, Cu, and stainless steel (SAE 304) surfaces, which are common plasma chamber materials, is predominantly caused by radiation emitted from plasma with energies between 8 eV and 1 keV. Characteristic X-ray emission and bremsstrahlung from plasma have a negligible contribution to the photoelectron emission. It is estimated from the measured data that the maximum conceivable photoelectron flux from plasma chamber walls is on the order of 10 % of the estimated total electron losses from the plasma.
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Submitted 1 September, 2015;
originally announced September 2015.
