Analysis and Applications of a Heralded Electron Source
Authors:
Stewart A. Koppell,
John W. Simonaitis,
Maurice A. R. Krielaart,
William P. Putnam,
Karl K. Berggren,
Phillip D. Keathley
Abstract:
We analytically describe the noise properties of a heralded electron source made from a standard electron gun, a weak photonic coupler, a single photon counter, and an electron energy filter. We argue the traditional heralding figure of merit, the Klyshko efficiency, is an insufficient statistic for characterizing performance in dose-control and dose-limited applications. Instead, we describe the…
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We analytically describe the noise properties of a heralded electron source made from a standard electron gun, a weak photonic coupler, a single photon counter, and an electron energy filter. We argue the traditional heralding figure of merit, the Klyshko efficiency, is an insufficient statistic for characterizing performance in dose-control and dose-limited applications. Instead, we describe the sub-Poissonian statistics of the source using the fractional reduction in variance and the fractional increase in Fisher Information. Using these figures of merit, we discuss the engineering requirements for efficient heralding and evaluate potential applications using simple models of electron lithography, bright-field scanning transmission electron microscopy (BFSTEM), and scanning electron microscopy (SEM). We find that the advantage in each of these applications is situational, but potentially significant: dynamic control of the trade-off between write speed and shot noise in electron lithography; an order of magnitude dose reduction in BFSTEM for thin samples (e.g. 2D materials); and a doubling of dose efficiency for wall-steepness estimation in SEM.
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Submitted 26 June, 2024;
originally announced June 2024.
Electrostatic electron mirror in SEM for simultaneous imaging of top and bottom surfaces of a sample
Authors:
Navid Abedzadeh,
M. A. R. Krielaart,
Chung-Soo Kim,
John Simonaitis,
Richard Hobbs,
Pieter Kruit,
Karl K. Berggren
Abstract:
The use of electron mirrors in aberration correction and surface-sensitive microscopy techniques such as low-energy electron microscopy has been established. However, in this work, by implementing an easy to construct, fully electrostatic electron mirror system under a sample in a conventional scanning electron microscope (SEM), we present a new imaging scheme which allows us to form scanned image…
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The use of electron mirrors in aberration correction and surface-sensitive microscopy techniques such as low-energy electron microscopy has been established. However, in this work, by implementing an easy to construct, fully electrostatic electron mirror system under a sample in a conventional scanning electron microscope (SEM), we present a new imaging scheme which allows us to form scanned images of the top and bottom surfaces of the sample simultaneously. We believe that this imaging scheme could be of great value to the field of in-situ SEM which has been limited to observation of dynamic changes such as crack propagation and other surface phenomena on one side of samples at a time. We analyze the image properties when using a flat versus a concave electron mirror system and discuss two different regimes of operation. In addition to in-situ SEM, we foresee that our imaging scheme could open up avenues toward spherical aberration correction by the use of electron mirrors in SEMs without the need for complex beam separators.
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Submitted 17 December, 2020;
originally announced December 2020.
