A hidden advantage of van der Waals materials for overcoming limitations in photonic integrated circuitry
Authors:
Andrey A. Vyshnevyy,
Georgy A. Ermolaev,
Dmitriy V. Grudinin,
Kirill V. Voronin,
Ivan Kharichkin,
Arslan Mazitov,
Ivan A. Kruglov,
Dmitry I. Yakubovsky,
Prabhash Mishra,
Roman V. Kirtaev,
Aleksey V. Arsenin,
Kostya S. Novoselov,
Luis Martin-Moreno,
Valentyn S. Volkov
Abstract:
With the advance of on-chip nanophotonics, there is a high demand for high refractive index, low-loss materials. Currently, this technology is dominated by silicon, but van der Waals (vdW) materials with high refractive index can offer a very advanced alternative. Still, up to now it was not clear if the optical anisotropy perpendicular to the layers might be a hindering factor for the development…
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With the advance of on-chip nanophotonics, there is a high demand for high refractive index, low-loss materials. Currently, this technology is dominated by silicon, but van der Waals (vdW) materials with high refractive index can offer a very advanced alternative. Still, up to now it was not clear if the optical anisotropy perpendicular to the layers might be a hindering factor for the development of vdW nanophotonics. Here, we studied WS2-based waveguides in terms of their optical properties and, particularly, in terms of possible crosstalk distance. Surprisingly, we discovered that the low refractive index in the direction perpendicular to the atomic layers improves the characteristics of such devices, mainly due to expanding the range of parameters at which single-mode propagation can be achieved. Thus, using anisotropic materials offers new opportunities and novel control knobs when designing the nanophotonic devices.
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Submitted 31 March, 2023;
originally announced April 2023.
Upper bounds on collective light-matter coupling strength with plasmonic meta-atoms
Authors:
Evgeny Ryabkov,
Ivan Kharichkin,
Sophia Guzik,
Alexander Nekhocheninov,
Benjamin Rousseaux,
Denis G. Baranov
Abstract:
Ultrastrong coupling between optical and material excitations is a distinct regime of electromagnetic interaction that enables a variety of intriguing physical phenomena. Traditional ways to ultrastrong light-matter coupling involve the use of some sorts of quantum emitters, such as organic dyes, quantum wells, superconducting artificial atoms, or transitions of two-dimensional electron gases. Oft…
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Ultrastrong coupling between optical and material excitations is a distinct regime of electromagnetic interaction that enables a variety of intriguing physical phenomena. Traditional ways to ultrastrong light-matter coupling involve the use of some sorts of quantum emitters, such as organic dyes, quantum wells, superconducting artificial atoms, or transitions of two-dimensional electron gases. Often, reaching the ultrastrong coupling domain requires special conditions, including high vacuum, strong magnetic fields, and extremely low temperatures. Recent report indicate that a high degree of light-matter coupling can be attained at ambient conditions with plasmonic meta-atoms -- artificial metallic nanostructures that replace quantum emitters. Yet, the fundamental limits on the coupling strength imposed on such systems have not been identified. Here, using a Hamiltonian approach we theoretically analyze the formation of polaritonic states and examine the upper limits of the collective plasmon-photon coupling strength in a number of dense assemblies of plasmonic meta-atoms. Starting off with spheres, we identify the universal upper bounds on the normalized collective coupling strength $g/ω_0$ between ensembles of plasmonic meta-atoms and free-space photons. Next, we examine spheroidal metallic meta-atoms and show that a strongly elongated meta-atom is the optimal geometry for attaining the highest value of the collective coupling strength in the array of meta-atoms. The results could be valuable for the field of polaritonics studies, quantum technology, and modifying material properties.
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Submitted 26 December, 2022;
originally announced December 2022.
