Thickness map** and layer number identification of exfoliated van der Waals materials by Fourier imaging micro-ellipsometry
Authors:
Ralfy Kenaz,
Saptarshi Ghosh,
Pradheesh Ramachandran,
Kenji Watanabe,
Takashi Taniguchi,
Hadar Steinberg,
Ronen Rapaport
Abstract:
As properties of mono- to few layers of exfoliated van der Waals heterostructures are heavily dependent on their thicknesses, accurate thickness measurement becomes imperative in their study. Commonly used atomic force microscopy and Raman spectroscopy techniques may be invasive and produce inconclusive results. Alternatively, spectroscopic ellipsometry is limited by tens-of-microns lateral resolu…
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As properties of mono- to few layers of exfoliated van der Waals heterostructures are heavily dependent on their thicknesses, accurate thickness measurement becomes imperative in their study. Commonly used atomic force microscopy and Raman spectroscopy techniques may be invasive and produce inconclusive results. Alternatively, spectroscopic ellipsometry is limited by tens-of-microns lateral resolution and/or low data acquisition rates, inhibiting its utilization for micro-scale exfoliated flakes. In this work, we demonstrate a Fourier imaging spectroscopic micro-ellipsometer with sub-5 microns lateral resolution along with fast data acquisition rate and present angstrom-level accurate and consistent thickness map** on mono-, bi- and trilayers of graphene, hexagonal boron nitride and transition metal dichalcogenide (MoS2, WS2, MoSe2, WSe2) flakes. We show that the optical microscope integrated ellipsometer can also map minute thickness variations over a micro-scale flake. In addition, our system addresses the pertinent issue of identifying monolayer thick hBN.
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Submitted 14 November, 2022;
originally announced November 2022.
Map** single-shot angle-resolved spectroscopic micro-ellipsometry with sub-5 microns lateral resolution
Authors:
Ralfy Kenaz,
Ronen Rapaport
Abstract:
Spectroscopic ellipsometry is a widely used optical technique both in industry and research for determining the optical properties and thickness of thin films. The effective use of spectroscopic ellipsometry on micro-structures is inhibited by technical limitations on lateral resolution and data acquisition rate. Here we introduce a spectroscopic micro-ellipsometer (SME), capable of measuring spec…
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Spectroscopic ellipsometry is a widely used optical technique both in industry and research for determining the optical properties and thickness of thin films. The effective use of spectroscopic ellipsometry on micro-structures is inhibited by technical limitations on lateral resolution and data acquisition rate. Here we introduce a spectroscopic micro-ellipsometer (SME), capable of measuring spectrally resolved ellipsometric data at many angles of incidence in a single-shot with a lateral resolution down to 2 microns. The SME can be easily integrated into generic optical microscopes by addition of a few stock optics. We demonstrate complex refractive index and thickness measurements by the SME which are in excellent agreement with a commercial spectroscopic ellipsometer. As an application for its accuracy and high lateral resolution, the SME can characterize the optical properties and number of layers of exfoliated transition-metal dichalcogenides and graphene, for structures that are a few microns in size.
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Submitted 28 July, 2022;
originally announced July 2022.
