Showing 1–17 of 17 results for author: Jobst, J

Stacking domain morphology in epitaxial graphene on silicon carbide

Authors: Tobias A. de Jong, Luuk Visser, Johannes Jobst, Ruud M. Tromp, Sense Jan van der Molen

Abstract: Terrace-sized, single-orientation graphene can be grown on top of a carbon buffer layer on silicon carbide by thermal decomposition. Despite its homogeneous appearance, a surprisingly large variation in electron transport properties is observed. Here, we employ Aberration-Corrected Low-Energy Electron Microscopy (AC-LEEM) to study a possible cause of this variability. We characterize the morphol… ▽ More Terrace-sized, single-orientation graphene can be grown on top of a carbon buffer layer on silicon carbide by thermal decomposition. Despite its homogeneous appearance, a surprisingly large variation in electron transport properties is observed. Here, we employ Aberration-Corrected Low-Energy Electron Microscopy (AC-LEEM) to study a possible cause of this variability. We characterize the morphology of stacking domains between the graphene and the buffer layer of high-quality samples. Similar to the case of twisted bilayer graphene, the lattice mismatch between the graphene layer and the buffer layer at the growth temperature causes a moiré pattern with domain boundaries between AB and BA stackings. We analyze this moiré pattern to characterize the relative strain and to count the number of edge dislocations. Furthermore, we show that epitaxial graphene on silicon carbide is close to a phase transition, causing intrinsic disorder in the form of co-existence of anisotropic stripe domains and isotropic trigonal domains. Using adaptive geometric phase analysis, we determine the precise relative strain variation caused by these domains. We observe that the step edges of the SiC substrate influence the orientation of the domains and we discuss which aspects of the growth process influence these effects by comparing samples from different sources. △ Less

Submitted 29 July, 2022; originally announced July 2022.

Journal ref: Phys. Rev. Materials 7, 034001, 17 March 2023

Low-Energy Electron Microscopy contrast of stacking boundaries: comparing twisted few-layer graphene and strained epitaxial graphene on silicon carbide

Authors: Tobias A. de Jong, Xingchen Chen, Johannes Jobst, Eugene E. Krasovskii, Ruud M. Tromp, Sense Jan van der Molen

Abstract: Stacking domain boundaries occur in Van der Waals heterostacks whenever there is a twist angle or lattice mismatch between subsequent layers. Not only can these domain boundaries host topological edge states, imaging them has been instrumental to determine local variations in twisted bilayer graphene. Here, we analyse the mechanisms causing stacking domain boundary contrast in Bright Field Low-Ene… ▽ More Stacking domain boundaries occur in Van der Waals heterostacks whenever there is a twist angle or lattice mismatch between subsequent layers. Not only can these domain boundaries host topological edge states, imaging them has been instrumental to determine local variations in twisted bilayer graphene. Here, we analyse the mechanisms causing stacking domain boundary contrast in Bright Field Low-Energy Electron Microscopy (BF-LEEM) for both graphene on SiC, where domain boundaries are caused by strain and for twisted few layer graphene. We show that when domain boundaries are between the top two graphene layers, BF-LEEM contrast is observed due to amplitude contrast and corresponds well to calculations of the contrast based purely on the local stacking in the domain boundary. Conversely, for deeper-lying domain boundaries, amplitude contrast only provides a weak distinction between the inequivalent stackings in the domains themselves. However, for small domains phase contrast, where electrons from different parts of the unit cell interfere causes a very strong contrast. We derive a general rule-of-thumb of expected BF-LEEM contrast for domain boundaries in Van der Waals materials. △ Less

Submitted 29 July, 2022; originally announced July 2022.

Journal ref: Phys. Rev. B 107, 075431, 22 February 2023

Direct evidence for flat bands in twisted bilayer graphene from nano-ARPES

Authors: Simone Lisi, Xiaobo Lu, Tjerk Benschop, Tobias A. de Jong, Petr Stepanov, Jose R. Duran, Florian Margot, Irène Cucchi, Edoardo Cappelli, Andrew Hunter, Anna Tamai, Viktor Kandyba, Alessio Giampietri, Alexei Barinov, Johannes Jobst, Vincent Stalman, Maarten Leeuwenhoek, Kenji Watanabe, Takashi Taniguchi, Louk Rademaker, Sense Jan van der Molen, Milan Allan, Dmitri K. Efetov, Felix Baumberger

Abstract: Transport experiments in twisted bilayer graphene revealed multiple superconducting domes separated by correlated insulating states. These properties are generally associated with strongly correlated states in a flat mini-band of the hexagonal moiré superlattice as it was predicted by band structure calculations. Evidence for such a flat band comes from local tunneling spectroscopy and electronic… ▽ More Transport experiments in twisted bilayer graphene revealed multiple superconducting domes separated by correlated insulating states. These properties are generally associated with strongly correlated states in a flat mini-band of the hexagonal moiré superlattice as it was predicted by band structure calculations. Evidence for such a flat band comes from local tunneling spectroscopy and electronic compressibility measurements, reporting two or more sharp peaks in the density of states that may be associated with closely spaced van Hove singularities. Direct momentum resolved measurements proved difficult though. Here, we combine different imaging techniques and angle resolved photoemission with simultaneous real and momentum space resolution (nano-ARPES) to directly map the band dispersion in twisted bilayer graphene devices near charge neutrality. Our experiments reveal large areas with homogeneous twist angle that support a flat band with spectral weight that is highly localized in momentum space. The flat band is separated from the dispersive Dirac bands which show multiple moiré hybridization gaps. These data establish the salient features of the twisted bilayer graphene band structure. △ Less

Submitted 6 February, 2020; originally announced February 2020.

Comments: Submitted to Nature Materials. Nat. Phys. (2020)

Growing a LaAlO3/SrTiO3 heterostructure on Ca2Nb3O10 nanosheets

Authors: Alexander J. H. van der Torren, Huiyu Yuan, Zhaoliang Liao, Johan E. ten Elshof, Gertjan Koster, Mark Huijben, Guus J. H. M. Rijnders, Marcel B. S. Hesselberth, Johannes Jobst, Sense van der Molen, Jan Aarts

Abstract: The two-dimensional electron liquid which forms between the band insulators LaAlO3 (LAO) and SrTiO3 (STO) is a promising component for oxide electronics, but the requirement of using single crystal SrTiO3 substrates for the growth limits its applications in terms of device fabrication. It is therefore important to find ways to deposit these materials on other substrates, preferably Si, or Si-based… ▽ More The two-dimensional electron liquid which forms between the band insulators LaAlO3 (LAO) and SrTiO3 (STO) is a promising component for oxide electronics, but the requirement of using single crystal SrTiO3 substrates for the growth limits its applications in terms of device fabrication. It is therefore important to find ways to deposit these materials on other substrates, preferably Si, or Si-based, in order to facilitate integration with existing technology. Interesting candidates are micron-sized nanosheets of Ca2Nb3O10 which can be used as seed layers for perovskite materials on any substrate. We have used low-energy electron microscopy (LEEM) with in-situ pulsed laser deposition to study the subsequent growth of STO and LAO on such flakes which were deposited on Si. We can follow the morphology and crystallinity of the layers during growth, as well as fingerprint their electronic properties with angle resolved reflected electron spectroscopy. We find that STO layers, deposited on the nanosheets, can be made crystalline and flat; that LAO can be grown in a layer-by-layer fashion; and that the full heterostructure shows the signature of the formation of a conducting interface. △ Less

Submitted 13 October, 2019; originally announced October 2019.

Comments: 11 pages, 7 figures

Low-Energy Electron Potentiometry

Authors: Johannes Jobst, Jaap Kautz, Maria Mytiliniou, Rudolf M. Tromp Sense Jan van der Molen

Abstract: In a lot of systems, charge transport is governed by local features rather than being a global property as suggested by extracting a single resistance value. Consequently, techniques that resolve local structure in the electronic potential are crucial for a detailed understanding of electronic transport in realistic devices. Recently, we have introduced a new potentiometry method based on low-ener… ▽ More In a lot of systems, charge transport is governed by local features rather than being a global property as suggested by extracting a single resistance value. Consequently, techniques that resolve local structure in the electronic potential are crucial for a detailed understanding of electronic transport in realistic devices. Recently, we have introduced a new potentiometry method based on low-energy electron microscopy (LEEM) that utilizes characteristic features in the reflectivity spectra of layered materials [1]. Performing potentiometry experiments in LEEM has the advantage of being fast, offering a large field of view and the option to zoom in and out easily, and of being non-invasive compared to scanning-probe methods. However, not all materials show clear features in their reflectivity spectra. Here we, therefore, focus on a different version of low-energy electron potentiometry (LEEP) that uses the mirror mode transition, i.e. the drop in electron reflectivity around zero electron landing energy when they start to interact with the sample rather than being reflected in front of it. This transition is universal and sensitive to the local electrostatic surface potential (either workfunction or applied potential). It can consequently be used to perform LEEP experiments on a broader range of material compared to the method described in Ref. [1]. We provide a detailed description of the experimental setup and demonstrate LEEP on workfunction-related intrinsic potential variations on the Si(111) surface and for a metal-semiconductor-metal junction with an external bias applied. In the latter, we visualize the Schottky effect at the metal-semiconductor interface. Finally, we compare how robust the two LEEP techniques discussed above are against image distortions due to sample inhomogeneities or contamination. △ Less

Submitted 13 October, 2019; originally announced October 2019.

Journal ref: Ultramicroscopy 181, 74-80 (2017)

Patterning Sn-based EUV resists with low-energy electrons

Authors: Ivan Bespalov, Yu Zhang, Jarich Haitjema, Rudolf M. Tromp, Sense Jan van der Molen, Albert M. Brouwer, Johannes Jobst, Sonia Castellanos

Abstract: Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (LEEs) produced upon illumination of resist materials with EUV photons (92 eV) play a central role in the formation of the nanopatterns. However, up to now the details of this process are not well understood. In this work… ▽ More Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (LEEs) produced upon illumination of resist materials with EUV photons (92 eV) play a central role in the formation of the nanopatterns. However, up to now the details of this process are not well understood. In this work, a novel experimental approach that combines Low-Energy Electron Microscopy (LEEM), Electron Energy Loss Spectroscopy (EELS), and Atomic Force Microscopy (AFM) is used to study changes induced by electrons in the 0-40 eV range in thin films of molecular organometallic EUV resists known as tin-oxo cages. LEEM-EELS spectroscopic experiments were used to detect surface charging upon electron exposure and to estimate the electron landing energy. AFM post-exposure analyses revealed that irradiation of the resist with LEEs leads to the densification of the resist layer associated to carbon loss. The same chemical processes that yield densification render the solubility change responsible for the pattern formation in the lithographic application. Remarkably, electrons as low as 1.2 eV are able to induce chemical reactions in the Sn-based resist. Based on the thickness profiles resulting from LEE exposures in the 3-48 mC/cm 2 dose range, a simplified reaction model is proposed where the resist undergoes sequential chemical reactions, yielding first a sparsely cross-linked network, followed by the formation of a denser cross-linked network. This model allows us to estimate a maximum reaction volume on the initial material of 0.15 nm 3 per incident electron in the energy range studied, which means that less than 10 LEEs per molecule on average are needed to turn the material insoluble and thus render a pattern. △ Less

Submitted 6 October, 2019; originally announced October 2019.

Quantitative analysis of spectroscopic Low Energy Electron Microscopy data: High-dynamic range imaging, drift correction and cluster analysis

Authors: Tobias A. de Jong, David N. L. Kok, Alexander J. H. van der Torren, Henrik Schopmans, Rudolf M. Tromp, Sense Jan van der Molen, Johannes Jobst

Abstract: For many complex materials systems, low-energy electron microscopy (LEEM) offers detailed insights into morphology and crystallography by naturally combining real-space and reciprocal-space information. Its unique strength, however, is that all measurements can easily be performed energy-dependently. Consequently, one should treat LEEM measurements as multi-dimensional, spectroscopic datasets rath… ▽ More For many complex materials systems, low-energy electron microscopy (LEEM) offers detailed insights into morphology and crystallography by naturally combining real-space and reciprocal-space information. Its unique strength, however, is that all measurements can easily be performed energy-dependently. Consequently, one should treat LEEM measurements as multi-dimensional, spectroscopic datasets rather than as images to fully harvest this potential. Here we describe a measurement and data analysis approach to obtain such quantitative spectroscopic LEEM datasets with high lateral resolution. The employed detector correction and adjustment techniques enable measurement of true reflectivity values over four orders of magnitudes of intensity. Moreover, we show a drift correction algorithm, tailored for LEEM datasets with inverting contrast, that yields sub-pixel accuracy without special computational demands. Finally, we apply dimension reduction techniques to summarize the key spectroscopic features of datasets with hundreds of images into two single images that can easily be presented and interpreted intuitively. We use cluster analysis to automatically identify different materials within the field of view and to calculate average spectra per material. We demonstrate these methods by analyzing bright-field and dark-field datasets of few-layer graphene grown on silicon carbide and provide a high-performance Python implementation. △ Less

Submitted 31 July, 2019; originally announced July 2019.

Journal ref: Ultramicroscopy 213 (2020): 112913

Non-universal Transverse Electron Mean Free Path through Few-layer Graphene

Authors: D. Geelen, J. Jobst, E. E. Krasovskii, S. J. van der Molen, R. M. Tromp

Abstract: In contrast to the in-plane transport electron mean-free path in graphene, the transverse mean-free path has received little attention and is often assumed to follow the 'universal' mean-free path (MFP) curve broadly adopted in surface and interface science. Here we directly measure transverse electron scattering through graphene from 0 to 25 eV above the vacuum level both in reflection using Low… ▽ More In contrast to the in-plane transport electron mean-free path in graphene, the transverse mean-free path has received little attention and is often assumed to follow the 'universal' mean-free path (MFP) curve broadly adopted in surface and interface science. Here we directly measure transverse electron scattering through graphene from 0 to 25 eV above the vacuum level both in reflection using Low Energy Electron Microscopy and in transmission using electron-Volt Transmission Electron Microscopy. From this data, we obtain quantitative MFPs for both elastic and inelastic scattering. Even at the lowest energies, the total MFP is just a few graphene layers and the elastic MFP oscillates with graphene layer number, both refuting the 'universal' curve. A full theoretical calculation taking the graphene band structure into consideration agrees well with experiment, while the key experimental results are reproduced even by a simple optical toy model. △ Less

Submitted 21 August, 2019; v1 submitted 30 April, 2019; originally announced April 2019.

Journal ref: Phys. Rev. Lett. 123, 086802 (2019)

Quantifying work function differences using low-energy electron microscopy: the case of mixed-terminated strontium titanate

Authors: Johannes Jobst, Laurens M. Boers, Chunhai Yin, Jan Aarts, Rudolf M. Tromp, Sense Jan van der Molen

Abstract: For many applications, it is important to measure the local work function of a surface with high lateral resolution. Low-energy electron microscopy is regularly employed to this end since it is, in principle, very well suited as it combines high-resolution imaging with high sensitivity to local electrostatic potentials. For surfaces with areas of different work function, however, lateral electrost… ▽ More For many applications, it is important to measure the local work function of a surface with high lateral resolution. Low-energy electron microscopy is regularly employed to this end since it is, in principle, very well suited as it combines high-resolution imaging with high sensitivity to local electrostatic potentials. For surfaces with areas of different work function, however, lateral electrostatic fields inevitably associated with work function discontinuities deflect the low-energy electrons and thereby cause artifacts near these discontinuities. We use ray-tracing simulations to show that these artifacts extend over hundreds of nanometers and cause an overestimation of the true work function difference near the discontinuity by a factor of 1.6 if the standard image analysis methods are used. We demonstrate on a mixed-terminated strontium titanate surface that comparing LEEM data with detailed ray-tracing simulations leads to much a more robust estimate of the work function difference. △ Less

Submitted 14 December, 2018; originally announced December 2018.

Journal ref: Ultramicroscopy 200, 43 (2019)

Stacking domains in graphene on silicon carbide: a pathway for intercalation

Authors: T. A. de Jong, E. E. Krasovskii, C. Ott, R. M. Tromp, S. J. van der Molen, J. Jobst

Abstract: Graphene on silicon carbide (SiC) bears great potential for future graphene electronic applications because it is available on the wafer-scale and its properties can be custom-tailored by inserting various atoms into the graphene/SiC interface. It remains unclear, however, how atoms can cross the impermeable graphene layer during this widely used intercalation process. Here we demonstrate that, in… ▽ More Graphene on silicon carbide (SiC) bears great potential for future graphene electronic applications because it is available on the wafer-scale and its properties can be custom-tailored by inserting various atoms into the graphene/SiC interface. It remains unclear, however, how atoms can cross the impermeable graphene layer during this widely used intercalation process. Here we demonstrate that, in contrast to the current consensus, graphene layers on SiC are not homogeneous, but instead composed of domains of different crystallographic stacking. We show that these domains are intrinsically formed during growth and that dislocations between domains dominate the (de)intercalation dynamics. Tailoring these dislocation networks, e.g. through substrate engineering, will increase the control over the intercalation process and could open a playground for topological and correlated electron phenomena in two-dimensional superstructures. △ Less

Submitted 11 July, 2018; originally announced July 2018.

Journal ref: Phys. Rev. Materials 2, 104005 (2018)

Measuring the Local Twist Angle and Layer Arrangement in Van der Waals Heterostructures

Authors: Tobias A. de Jong, Johannes Jobst, Hyobin Yoo, Eugene E. Krasovskii, Philip Kim, Sense Jan van der Molen

Abstract: The properties of Van der Waals heterostructures are determined by the twist angle and the interface between adjacent layers as well as their polytype and stacking. Here we describe the use of spectroscopic Low Energy Electron Microscopy (LEEM) and micro Low Energy Electron Diffraction (μLEED) methods to measure these properties locally. We present results on a MoS$_{2}$/hBN heterostructure, but t… ▽ More The properties of Van der Waals heterostructures are determined by the twist angle and the interface between adjacent layers as well as their polytype and stacking. Here we describe the use of spectroscopic Low Energy Electron Microscopy (LEEM) and micro Low Energy Electron Diffraction (μLEED) methods to measure these properties locally. We present results on a MoS$_{2}$/hBN heterostructure, but the methods are applicable to other materials. Diffraction spot analysis is used to assess the benefits of using hBN as a substrate. In addition, by making use of the broken rotational symmetry of the lattice, we determine the cleaving history of the MoS$_{2}$ flake, i.e., which layer stems from where in the bulk. △ Less

Submitted 13 June, 2018; originally announced June 2018.

The detection of Kondo effect in the resistivity of graphene: artifacts and strategies

Authors: Johannes Jobst, Ferdinand Kisslinger, Heiko B. Weber

Abstract: We discuss the difficulties to discover Kondo effect in the resistivity of graphene. Similarly to the Kondo effect, electron-electron interaction effects and weak localization appear as logarithmic corrections to the resistance. In order to disentangle these contributions, a refined analysis of the magnetoconductance and the magnetoresistance is introduced. We present numerical simulations which d… ▽ More We discuss the difficulties to discover Kondo effect in the resistivity of graphene. Similarly to the Kondo effect, electron-electron interaction effects and weak localization appear as logarithmic corrections to the resistance. In order to disentangle these contributions, a refined analysis of the magnetoconductance and the magnetoresistance is introduced. We present numerical simulations which display the discrimination of both effects. Further, we present experimental data of magnetotransport. When magnetic molecules are added to graphene, a logarithmic correction to the conductance occurs, which apparently suggests Kondo physics. Our thorough evaluation scheme, however, reveals that this interpretation is not conclusive: the data can equally be explained by electron-electron interaction corrections in an inhomogeneous sample. Our evaluation scheme paves the way for a more refined search for the Kondo effect in graphene. △ Less

Submitted 30 August, 2013; originally announced August 2013.

Manifestation of electron-electron interaction in the magnetoresistance of graphene

Authors: Johannes Jobst, Daniel Waldmann, Igor V. Gornyi, Alexander D. Mirlin, Heiko B. Weber

Abstract: We investigate the magnetotransport in large area graphene Hall bars epitaxially grown on silicon carbide. In the intermediate field regime between weak localization and Landau quantization the observed temperature-dependent parabolic magnetoresistivity (MR) is a manifestation of the electron-electron interaction (EEI). We can consistently describe the data with a model for diffusive (magneto)tran… ▽ More We investigate the magnetotransport in large area graphene Hall bars epitaxially grown on silicon carbide. In the intermediate field regime between weak localization and Landau quantization the observed temperature-dependent parabolic magnetoresistivity (MR) is a manifestation of the electron-electron interaction (EEI). We can consistently describe the data with a model for diffusive (magneto)transport that also includes magnetic-field dependent effects originating from ballistic time scales. We find an excellent agreement between the experimentally observed temperature dependence of MR and the theory of EEI in the diffusive regime. We can further assign a temperature-driven crossover to the reduction of the multiplet modes contributing to EEI from 7 to 3 due to intervalley scattering. In addition, we find a temperature independent ballistic contribution to the MR in classically strong magnetic fields. △ Less

Submitted 27 January, 2012; v1 submitted 26 October, 2011; originally announced October 2011.

Journal ref: Phys. Rev. Lett. 108, 106601 (2012)

Implanted Bottom Gate for Epitaxial Graphene on Silicon Carbide

Authors: Daniel Waldmann, Johannes Jobst, Felix Fromm, Florian Speck, Thomas Seyller, Michael Krieger, Heiko B. Weber

Abstract: We present a technique to tune the charge density of epitaxial graphene via an electrostatic gate that is buried in the silicon carbide substrate. The result is a device in which graphene remains accessible for further manipulation or investigation. Via nitrogen or phosphor implantation into a silicon carbide wafer and subsequent graphene growth, devices can routinely be fabricated using standard… ▽ More We present a technique to tune the charge density of epitaxial graphene via an electrostatic gate that is buried in the silicon carbide substrate. The result is a device in which graphene remains accessible for further manipulation or investigation. Via nitrogen or phosphor implantation into a silicon carbide wafer and subsequent graphene growth, devices can routinely be fabricated using standard semiconductor technology. We have optimized samples for room temperature as well as for cryogenic temperature operation. Depending on implantation dose and temperature we operate in two gating regimes. In the first, the gating mechanism is similar to a MOSFET, the second is based on a tuned space charge region of the silicon carbide semiconductor. We present a detailed model that describes the two gating regimes and the transition in between. △ Less

Submitted 27 September, 2011; originally announced September 2011.

Comments: Manuscript submitted to Journal of Physics D

The quasi-free-standing nature of graphene on H-saturated SiC(0001)

Authors: F. Speck, J. Jobst, F. Fromm, M. Ostler, D. Waldmann, M. Hundhausen, H. B. Weber, Th. Seyller

Abstract: We report on an investigation of quasi-free-standing graphene on 6H-SiC(0001) which was prepared by intercalation of hydrogen under the buffer layer. Using infrared absorption spectroscopy we prove that the SiC(0001) surface is saturated with hydrogen. Raman spectra demonstrate the conversion of the buffer layer into graphene which exhibits a slight tensile strain and short range defects. The laye… ▽ More We report on an investigation of quasi-free-standing graphene on 6H-SiC(0001) which was prepared by intercalation of hydrogen under the buffer layer. Using infrared absorption spectroscopy we prove that the SiC(0001) surface is saturated with hydrogen. Raman spectra demonstrate the conversion of the buffer layer into graphene which exhibits a slight tensile strain and short range defects. The layers are hole doped (p = 5.0-6.5 x 10^12 cm^(-2)) with a carrier mobility of 3,100 cm^2/Vs at room temperature. Compared to graphene on the buffer layer a strongly reduced temperature dependence of the mobility is observed for graphene on H-terminated SiC(0001)which justifies the term "quasi-free-standing". △ Less

Submitted 5 September, 2011; v1 submitted 21 March, 2011; originally announced March 2011.

Comments: 3 pages, 3 figures, accepted for publication in Applied Physics Letters

Journal ref: Appl. Phys. Lett. 99, 122106 (2011)

How Graphene-like is Epitaxial Graphene? \\Quantum Oscillations and Quantum Hall Effect

Authors: Johannes Jobst, Daniel Waldmann, Florian Speck, Roland Hirner, Duncan K. Maude, Thomas Seyller, Heiko B. Weber

Abstract: We investigate the transport properties of high-quality single-layer graphene, epitaxially grown on a 6H-SiC(0001) substrate. We have measured transport properties, in particular charge carrier density, mobility, conductivity and magnetoconductance of large samples as well as submicrometer-sized Hall bars which are entirely lying on atomically flat substrate terraces. The results display high mo… ▽ More We investigate the transport properties of high-quality single-layer graphene, epitaxially grown on a 6H-SiC(0001) substrate. We have measured transport properties, in particular charge carrier density, mobility, conductivity and magnetoconductance of large samples as well as submicrometer-sized Hall bars which are entirely lying on atomically flat substrate terraces. The results display high mobilities, independent of sample size and a Shubnikov-de Haas effect with a Landau level spectrum of single-layer graphene. When gated close to the Dirac point, the mobility increases substantially, and the graphene-like quantum Hall effect occurs. This proves that epitaxial graphene is ruled by the same pseudo-relativistic physics observed previously in exfoliated graphene. △ Less

Submitted 13 August, 2009; originally announced August 2009.

Atmospheric pressure graphitization of SiC(0001)- A route towards wafer-size graphene layers

Authors: Konstantin V. Emtsev, Aaron Bostwick, Karsten Horn, Johannes Jobst, Gary L. Kellogg, Lothar Ley, Jessica L. McChesney, Taisuke Ohta, Sergey A. Reshanov, Eli Rotenberg, Andreas K. Schmid, Daniel Waldmann, Heiko B. Weber, Thomas Seyller

Abstract: We have investigated epitaxial graphene films grown on SiC(0001) by annealing in an atmosphere of Ar instead of vacuum. Using AFM and LEEM we observe a significantly improved surface morphology and graphene domain size. Hall measurements on monolayer graphene films show a carrier mobility of around 1000 cm^2/Vs at room temperature and 2000 cm^2/Vs at 27K. The growth process introduced here estab… ▽ More We have investigated epitaxial graphene films grown on SiC(0001) by annealing in an atmosphere of Ar instead of vacuum. Using AFM and LEEM we observe a significantly improved surface morphology and graphene domain size. Hall measurements on monolayer graphene films show a carrier mobility of around 1000 cm^2/Vs at room temperature and 2000 cm^2/Vs at 27K. The growth process introduced here establishes the synthesis of graphene films on a technologically viable basis. △ Less

Submitted 8 August, 2008; originally announced August 2008.