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Abstract Compilation for Verification of Numerical Accuracy Properties
Authors:
Maxime Jacquemin,
Fonenantsoa Maurica,
Nikolai Kosmatov,
Julien Signoles,
Franck Védrine
Abstract:
Verification of numerical accuracy properties in modern software remains an important and challenging task. This paper describes an original framework combining different solutions for numerical accuracy. First, we extend an existing runtime verification tool called E-ACSL with rational numbers to monitor accuracy properties at runtime. Second, we present an abstract compiler, FLDCompiler, that pe…
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Verification of numerical accuracy properties in modern software remains an important and challenging task. This paper describes an original framework combining different solutions for numerical accuracy. First, we extend an existing runtime verification tool called E-ACSL with rational numbers to monitor accuracy properties at runtime. Second, we present an abstract compiler, FLDCompiler, that performs a source-to-source transformation such that the execution of the resulting program, called an abstract execution, is an abstract interpretation of the initial program. Third, we propose an instrumentation library FLDLib that formally propagates accuracy properties along an abstract execution. While each of these solutions has its own interest, we emphasize the benefits of their combination for an industrial setting. Initial experiments show that the proposed technique can efficiently and soundly analyze the accuracy of industrial programs by restricting the analysis on thin numerical scenarios.
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Submitted 25 November, 2019;
originally announced November 2019.
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Quantum critical scaling of the conductivity tensor at the metal-insulator transition in Nb$_{1-x}$Ti$_{x}$N
Authors:
D. Hazra,
Prosenjit Haldar,
M. S. Laad,
N. Tsavdaris,
A. Mukhtarova,
M. Jacquemin,
R. Albert,
F. Blanchet,
S. Jebari,
A. Grimm,
E. Blanquet,
F. Mercier,
C. Chapelier,
M. Hofheinz,
Pratap Raychaudhuri
Abstract:
In contrast to the Landau paradigm, a metal-insulator transition (MIT), driven purely by competition between itinerance and localization and unaccompanied by any conventional (e.g, magnetic) order-disorder instabilities, admits no obvious local order parameter. Here, we present a detailed analysis of the quantum criticality in magneto-transport data on the alloy Nb$_{1-x}$Ti$_{x}$N across a Ti-dop…
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In contrast to the Landau paradigm, a metal-insulator transition (MIT), driven purely by competition between itinerance and localization and unaccompanied by any conventional (e.g, magnetic) order-disorder instabilities, admits no obvious local order parameter. Here, we present a detailed analysis of the quantum criticality in magneto-transport data on the alloy Nb$_{1-x}$Ti$_{x}$N across a Ti-do**-driven a MIT. We demonstrate, for the first time, clear and novel quantum criticality reflected in the full conductivity tensor across the MIT. Wide ranging, comprehensive accord with recent theoretical predictions strongly suggests that these unanticipated findings are representative of a continuous MIT of the band-splitting type, rather than a conventional Anderson disorder or a "pure" correlation-driven first-order Mott type.
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Submitted 10 August, 2019; v1 submitted 26 June, 2019;
originally announced June 2019.
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The role of Coulomb interaction in superconducting NbTiN thin films
Authors:
D. Hazra,
N. Tsavdaris,
A. Mukhtarova,
M. Jacquemin,
F. Blanchet,
R. Albert,
S. Jebari,
A. Grimm,
E. Blanquet,
F. Mercier,
C. Chapelier,
M. Hofheinz
Abstract:
We report on the superconducting properties of Nb$_{1-x}$Ti$_x$N thin films of thickness $\sim$ 10 nm, with different Ti fraction $x$ in the range $ 0 \leq x \leq 0.5$, deposited by high temperature chemical vapor deposition. In this parameter range, we observe that the superconducting critical temperature ($T_c$) increases with $x$. Our analysis, in accordance with both McMillan's and Finkelstein…
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We report on the superconducting properties of Nb$_{1-x}$Ti$_x$N thin films of thickness $\sim$ 10 nm, with different Ti fraction $x$ in the range $ 0 \leq x \leq 0.5$, deposited by high temperature chemical vapor deposition. In this parameter range, we observe that the superconducting critical temperature ($T_c$) increases with $x$. Our analysis, in accordance with both McMillan's and Finkelstein's theories, shows that disorder-enhanced Coulomb interaction decreases with $x$, leading to an increase of $T_c$.
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Submitted 13 November, 2017;
originally announced November 2017.
