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Coexistence of negative and positive photoconductivity in few-layer PtSe2 field-effect transistors
Authors:
Alessandro Grillo,
Enver Faella,
Aniello Pelella,
Filippo Giubileo,
Lida Ansari,
Farzan Gity,
Paul K. Hurley,
Niall McEvoy,
Antonio Di Bartolomeo
Abstract:
Platinum diselenide (PtSe_2) field-effect transistors with ultrathin channel regions exhibit p-type electrical conductivity that is sensitive to temperature and environmental pressure. Exposure to a supercontinuum white light source reveals that positive and negative photoconductivity coexists in the same device. The dominance of one type of photoconductivity over the other is controlled by enviro…
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Platinum diselenide (PtSe_2) field-effect transistors with ultrathin channel regions exhibit p-type electrical conductivity that is sensitive to temperature and environmental pressure. Exposure to a supercontinuum white light source reveals that positive and negative photoconductivity coexists in the same device. The dominance of one type of photoconductivity over the other is controlled by environmental pressure. Indeed, positive photoconductivity observed in high vacuum converts to negative photoconductivity when the pressure is rised. Density functional theory calculations confirm that physisorbed oxygen molecules on the PtSe_2 surface act as acceptors. The desorption of oxygen molecules from the surface, caused by light irradiation, leads to decreased carrier concentration in the channel conductivity. The understanding of the charge transfer occurring between the physisorbed oxygen molecules and the PtSe_2 film provides an effective route for modulating the density of carriers and the optical properties of the material.
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Submitted 20 July, 2021;
originally announced July 2021.
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Isotropic conduction and negative photoconduction in ultrathin PtSe$_2$ films
Authors:
Francesca Urban,
Farzan Gity,
Paul K. Hurley,
Niall McEvoy,
Antonio Di Bartolomeo
Abstract:
PtSe$_2$ ultrathin films are used as the channel of back-gated field-effect transistors (FETs) that are investigated at different temperatures and under super-continuous white laser irradiation. The temperature-dependent behavior confirms the semiconducting nature of multilayer PtSe$_2$, with p-type conduction, a hole field-effect mobility up to 40 cm2/(Vs) and significant gate modulation. Electri…
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PtSe$_2$ ultrathin films are used as the channel of back-gated field-effect transistors (FETs) that are investigated at different temperatures and under super-continuous white laser irradiation. The temperature-dependent behavior confirms the semiconducting nature of multilayer PtSe$_2$, with p-type conduction, a hole field-effect mobility up to 40 cm2/(Vs) and significant gate modulation. Electrical conduction measured along different directions shows isotropic transport. A reduction of PtSe$_2$ channel conductance is observed under exposure to light. Such negative photoconductivity is explained by a photogating effect caused by photo-charge accumulation in SiO$_2$ and at the Si/SiO$_2$ interface.
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Submitted 11 July, 2020;
originally announced July 2020.
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First principles modeling of defects in the Al_2O_3/In_0.53Ga_0.47As system
Authors:
Gabriel Greene-Diniz,
Kelin J. Kuhn,
Paul K. Hurley,
James C. Greer
Abstract:
Density functional theory paired with a first order many-body perturbation theory correction is applied to determine formation energies and charge transition energies for point defects in bulk In_0.53Ga_0.47As and for models of the In_0.53Ga_0.47As/Al_2O_3 interface. The results are consistent with previous computational studies that As_Ga antisites are candidates for defects observed in capacitan…
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Density functional theory paired with a first order many-body perturbation theory correction is applied to determine formation energies and charge transition energies for point defects in bulk In_0.53Ga_0.47As and for models of the In_0.53Ga_0.47As/Al_2O_3 interface. The results are consistent with previous computational studies that As_Ga antisites are candidates for defects observed in capacitance voltage measurements on metal-oxide-semiconductor capacitors, as the As_Ga antisite introduces energy states near the valence band maximum and near the middle of the energy band gap. However, substantial broadening in the distribution of the Ga_As charge transition levels due to the variation in the local chemical environment resulting from alloying on the cation (In/Ga) sublattice is found, whereas this effect is absent for As_Ga antisites. Also, charge transition energy levels are found to vary based on proximity to the semiconductor/oxide interface. The combined effects of alloy- and proximity-shift on the Ga_As antisite charge transition energies are consistent with the distribution of interface defect levels between the valence band edge and midgap as extracted from electrical characterization data. Hence, kinetic growth conditions leading to a high density of either Ga_As or As_Ga antisites near the In_0.53Ga_0.47As/Al_2O_3 interface are both consistent with defect energy levels at or below midgap.
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Submitted 24 September, 2016;
originally announced September 2016.
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Low-angle misorientation dependence of the optical properties of InGaAs/InAlAs quantum wells
Authors:
Robert J. Young,
Lorenzo O. Mereni,
Nikolay Petkov,
Gabrielle R. Knight,
Valeria Dimastrodonato,
Paul K. Hurley,
Greg Hughes,
Emanuele Pelucchi
Abstract:
We investigate the dependence of the low-temperature photoluminescence linewidths from InP-lattice-matched InGaAs/InAlAs quantum wells on the low-angle misorientation from the (100) surface of the host InP substrate. Quantum wells were grown on InP substrates misorientated by 0, 0.2, 0.4 and 0.6 degrees; 0.4 degrees was found to consistently result in the narrowest peaks, with the optimal spectral…
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We investigate the dependence of the low-temperature photoluminescence linewidths from InP-lattice-matched InGaAs/InAlAs quantum wells on the low-angle misorientation from the (100) surface of the host InP substrate. Quantum wells were grown on InP substrates misorientated by 0, 0.2, 0.4 and 0.6 degrees; 0.4 degrees was found to consistently result in the narrowest peaks, with the optimal spectral purity of ~4.25 meV found from a 15nm quantum well. The width of the emission from the 15nm quantum well was used to optimize the growth parameters. Thick layers of Si-doped InGaAs were then grown and found to have bulk, low temperature (77 K), electron mobilities up to μ~ 3.5 x 10^4 cm2/Vs with an electron concentration of ~1 x 10^16.
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Submitted 8 April, 2010;
originally announced April 2010.
