Photoemission Spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials
Authors:
Faegheh S. Sajjadian,
Laura Galleni,
Kevin M. Dorney,
Dhirendra P. Singh,
Fabian Holzmeier,
Michiel J. van Setten,
Stefan De Gendt,
Thierry Conard
Abstract:
Device architectures and dimensions are now at an unimaginable level not thought possible even 10 years ago. The continued downscaling, following the so-called Moore's law, has motivated the development and use of extreme ultraviolet (EUV) lithography scanners with specialized photoresists. Since the quality and precision of the transferred circuit pattern is determined by the EUV induced chemical…
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Device architectures and dimensions are now at an unimaginable level not thought possible even 10 years ago. The continued downscaling, following the so-called Moore's law, has motivated the development and use of extreme ultraviolet (EUV) lithography scanners with specialized photoresists. Since the quality and precision of the transferred circuit pattern is determined by the EUV induced chemical changes in the photoresist, having a deep understanding of these chemical changes is of pivotal importance. For this purpose, several spectroscopic and material characterization techniques have already been employed so far. Among them, photoemission can be essential as it not only allows direct probing of chemical bonds in a quantitative way but also provides useful information regarding the generation and distribution of primary and secondary electrons. However, since high energy photons are being employed for characterization of a photosensitive material, modification of the sample during the measurement is possible and this must be considered when investigating the chemical changes in the photoresist before and after exposure to EUV light.
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Submitted 30 May, 2024;
originally announced June 2024.
Influence of Shape Resonances on the Angular Dependence of Molecular Photoionization Delays
Authors:
Fabian Holzmeier,
Jennifer Joseph,
Jean-Christophe Houver,
Mogens Lebech,
Danielle Dowek,
Robert R. Lucchese
Abstract:
Characterizing time delays in molecular photoionization as a function of the ejected electron emission direction relative to the orientation of the molecule and the light polarization axis pro-vides unprecedented insights into the attosecond dynamics induced by extreme ultraviolet or X-ray one-photon absorption, including the role of electronic correlation and continuum resonant states. Here, we r…
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Characterizing time delays in molecular photoionization as a function of the ejected electron emission direction relative to the orientation of the molecule and the light polarization axis pro-vides unprecedented insights into the attosecond dynamics induced by extreme ultraviolet or X-ray one-photon absorption, including the role of electronic correlation and continuum resonant states. Here, we report completely resolved experimental and computational angular depend-ence of single-photon ionization delays in NO molecules across a shape resonance, relying on synchrotron radiation and time independent ab initio calculations. The angle-dependent time delay variations of few hundreds of attoseconds, resulting from the interference of the resonant and non-resonant contributions to the dynamics of the ejected electron, are well described using a multichannel Fano model where the resonance time delay is angle-independent. Comparing these results with the same resonance computed in e-NO+ scattering highlights the connection of photoionization delays with Wigner scattering time delays.
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Submitted 23 November, 2021; v1 submitted 21 July, 2021;
originally announced July 2021.
