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Showing 1–6 of 6 results for author: Hallam, T

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  1. arXiv:2004.03199  [pdf

    cond-mat.mtrl-sci

    Low-temperature synthesis and electrocatalytic application of large-area PtTe2 thin films

    Authors: John B. Mc Manus, Dominik V. Horvath, Michelle P. Browne, Conor P. Cullen, Graeme Cunningham, Toby Hallam, Kuanysh Zhussupbekov, Daragh Mullarkey, Cormac Ó Coileáin, Igor V. Shvets, Martin Pumera, Georg S. Duesberg, Niall McEvoy

    Abstract: The synthesis of transition metal dichalcogenides (TMDs) has been a primary focus for 2D nanomaterial research over the last 10 years, however, only a small fraction of this research has been concentrated on transition metal ditellurides. In particular, nanoscale platinum ditelluride (PtTe2) has rarely been investigated, despite its potential applications in catalysis, photonics and spintronics. O… ▽ More

    Submitted 7 April, 2020; originally announced April 2020.

  2. Raman Characterization of Platinum Diselenide Thin Films

    Authors: Maria O'Brien, Niall McEvoy, Carlo Motta, Jian-Yao Zheng, Nina C. Berner, Jani Kotakoski, Kenan Elibol, Timothy J. Pennycook, Jannik C. Meyer, Chanyoung Yim, Mohamed Abid, Toby Hallam, John F. Donegan, Stefano Sanvito, Georg S. Duesberg

    Abstract: Platinum diselenide (PtSe2) is a newly discovered 2D material which is of great interest for applications in electronics and catalysis. PtSe2 films were synthesized by thermally-assisted selenization of predeposited platinum films and scanning transmission electron microscopy revealed the crystal structure of these films to be 1T. Raman scattering of these films was studied as a function of film t… ▽ More

    Submitted 31 December, 2015; originally announced December 2015.

  3. arXiv:1508.00768  [pdf

    cond-mat.mtrl-sci

    Map** of Low-Frequency Raman Modes in CVD-Grown Transition Metal Dichalcogenides: Layer Number, Stacking Orientation and Resonant Effects

    Authors: Maria OBrien, Niall McEvoy, Damien Hanlon, Toby Hallam, Jonathan N. Coleman, Georg S. Duesberg

    Abstract: Layered inorganic materials, such as the transition metal dichalcogenides (TMDs), have attracted much attention due to their exceptional electronic and optical properties. Reliable synthesis and characterization of these materials must be developed if these properties are to be exploited. Herein, we present low-frequency Raman analysis of MoS2, MoSe2, WSe2 and WS2 grown by chemical vapour depositi… ▽ More

    Submitted 8 December, 2015; v1 submitted 4 August, 2015; originally announced August 2015.

  4. Origami-based spintronics in graphene

    Authors: A. T. Costa, M. S. Ferreira, Toby Hallam, Georg S. Duesberg, A. H. Castro Neto

    Abstract: We show that periodically folded graphene sheets with enhanced spin-orbit interaction due to curvature effects can carry spin polarized currents and have gaps in the electronic spectrum in the presence of weak magnetic fields. Our results indicate that such origami-like structures can be used efficiently in spintronic applications.

    Submitted 14 August, 2013; v1 submitted 10 April, 2013; originally announced April 2013.

  5. Atomically precise placement of single dopants in Si

    Authors: S. R. Schofield, N. J. Curson, M. Y. Simmons, F. J. Ruess, T. Hallam, L. Oberbeck, R. G. Clark

    Abstract: We demonstrate the controlled incorporation of P dopant atoms in Si (001) presenting a new path toward the creation of atomic-scale electronic devices. We present a detailed study of the interaction of PH3 with Si (001) and show that it is possible to thermally incorporate P atoms into Si (001) below the H desorption temperature. Control over the precise spatial location at which P atoms are inc… ▽ More

    Submitted 23 July, 2003; originally announced July 2003.

    Comments: 5 pages, 4 figures

  6. Measurement of phosphorus segregation in silicon at the atomic-scale using STM

    Authors: Lars Oberbeck, Neil J. Curson, Toby Hallam, Michelle Y. Simmons, Robert G. Clark, Gerhard Bilger

    Abstract: In order to fabricate precise atomic-scale devices in silicon using a combination of scanning tunnelling microscopy (STM) and molecular beam epitaxy it is necessary to minimize the segregation/diffusion of dopant atoms during silicon encapsulation. We characterize the surface segregation/diffusion of phosphorus atoms from a $δ$-doped layer in silicon after encapsulation at 250$^{\circ}$C and roo… ▽ More

    Submitted 21 July, 2003; originally announced July 2003.