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Accelerating Defect Predictions in Semiconductors Using Graph Neural Networks
Authors:
Md Habibur Rahman,
Prince Gollapalli,
Panayotis Manganaris,
Satyesh Kumar Yadav,
Ghanshyam Pilania,
Brian DeCost,
Kamal Choudhary,
Arun Mannodi-Kanakkithodi
Abstract:
Here, we develop a framework for the prediction and screening of native defects and functional impurities in a chemical space of Group IV, III-V, and II-VI zinc blende (ZB) semiconductors, powered by crystal Graph-based Neural Networks (GNNs) trained on high-throughput density functional theory (DFT) data. Using an innovative approach of sampling partially optimized defect configurations from DFT…
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Here, we develop a framework for the prediction and screening of native defects and functional impurities in a chemical space of Group IV, III-V, and II-VI zinc blende (ZB) semiconductors, powered by crystal Graph-based Neural Networks (GNNs) trained on high-throughput density functional theory (DFT) data. Using an innovative approach of sampling partially optimized defect configurations from DFT calculations, we generate one of the largest computational defect datasets to date, containing many types of vacancies, self-interstitials, anti-site substitutions, impurity interstitials and substitutions, as well as some defect complexes. We applied three types of established GNN techniques, namely Crystal Graph Convolutional Neural Network (CGCNN), Materials Graph Network (MEGNET), and Atomistic Line Graph Neural Network (ALIGNN), to rigorously train models for predicting defect formation energy (DFE) in multiple charge states and chemical potential conditions. We find that ALIGNN yields the best DFE predictions with root mean square errors around 0.3 eV, which represents a prediction accuracy of 98 % given the range of values within the dataset, improving significantly on the state-of-the-art. Models are tested for different defect types as well as for defect charge transition levels. We further show that GNN-based defective structure optimization can take us close to DFT-optimized geometries at a fraction of the cost of full DFT. DFT-GNN models enable prediction and screening across thousands of hypothetical defects based on both unoptimized and partially-optimized defective structures, hel** identify electronically active defects in technologically-important semiconductors.
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Submitted 13 September, 2023; v1 submitted 12 September, 2023;
originally announced September 2023.
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Role of strain on the stability of B, C, N, and O in Iron
Authors:
P. S. V. R. A. Kishor,
Prince Gollapalli,
Debolina Misra,
Prajeet Oza,
Satyesh Kumar Yadav
Abstract:
The preference for the occupation of solute atoms like B, C, N, and O at various sites in iron is generally explained by the size of the solute and the volume available for the solute atoms to occupy. Such an explanation based on the size of solute atoms and available space at the occupation site assumes that distortion alone dictates the stability of solute atoms. Using first-principles density f…
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The preference for the occupation of solute atoms like B, C, N, and O at various sites in iron is generally explained by the size of the solute and the volume available for the solute atoms to occupy. Such an explanation based on the size of solute atoms and available space at the occupation site assumes that distortion alone dictates the stability of solute atoms. Using first-principles density functional theory (DFT), we separately calculate the distortion energy (DE) and electronic binding energy (EBE) of solute atoms in iron. We show that electronic binding dictates the relative stability of O rather than distortion. In contrast, the relative stability of B, C, and N is dictated by the distortion it exerts on iron atoms. Contribution to the relative stability of B atoms is dictated mostly by distortion. It suggests that B could occupy a large volume region like grain boundaries. The same agrees with experiments indicating B segregates at grain boundaries and planar defects. Such conclusions could not have been drawn from the formation energy calculation, which shows that B is stable at the substitution site.
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Submitted 18 August, 2022;
originally announced August 2022.
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3-D Ti/TiN Interface
Authors:
Prince Gollapalli,
Varalakshmi Jalligampala,
Kishor Peddapuvvala,
Prajeet Oza,
Satyesh Kumar Yadav
Abstract:
Interface by definition is two-dimensional (2-D) as it separates 2 phases with an abrupt change in structure and chemistry across the interface. The interface between a metal and its nitride is expected to be atomically sharp, as chemical gradation would require the creation of N vacancies in nitrides and N interstitials in metal. Contrary to this belief, using first-principles density functional…
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Interface by definition is two-dimensional (2-D) as it separates 2 phases with an abrupt change in structure and chemistry across the interface. The interface between a metal and its nitride is expected to be atomically sharp, as chemical gradation would require the creation of N vacancies in nitrides and N interstitials in metal. Contrary to this belief, using first-principles density functional theory (DFT), we establish that the chemically graded Ti/TiN interface is thermodynamically preferred over the sharp interface. DFT calculated N vacancy formation energy in TiN is 2.4 eV, and N interstitial in Ti is -3.8 eV. Thus, diffusion of N from TiN to Ti by the formation of N vacancy in TiN and N interstitial in Ti would reduce the internal energy of the Ti-TiN heterostructure. We show that diffusion of N is thermodynamically favorable till ~23% of N has diffused from TiN to Ti, resulting in an atomically chemically graded interface, which we refer to as a 3-D interface. Experiments' inability to identify a 3-D interface in Ti/TiN could be attributed to limitations in identifying chemical composition and structure with atomic-level resolution at interfaces. We define the sum of N vacancy formation energy and N interstitial formation energy as driving-force, which could be used as a convenient way to assess the possibility of forming a 3-D interface in metal/ceramic heterostructures. We also show gradual variation in lattice parameters and mechanical properties (like bulk modulus, shear modulus, Young's modulus, and hardness) across the Ti/TiN interface. 3-D interfaces open a new way to control properties of metal/ceramic heterostructures, in line with the already established advantage of gradation at interfaces in micrometer length scale. For widely explored Ti/TiN multilayer nano-heterostructures, the possibility of forming 3-D interface could lead to enhanced wear and erosion resistance.
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Submitted 8 February, 2022;
originally announced February 2022.
