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Optical properties of ZnCoO films and nanopowders
Authors:
E. Wolska,
M. Łukasiewicz,
J. D. Fidelus,
W. Łojkowski,
E. Guziewicz,
M. Godlewski
Abstract:
ZnCoO is one of the most studied and promising semiconductor materials for spintronics applications. In this work we discuss optical and electrical properties of ZnCoO films and nanoparticles grown at low temperature by either Atomic Layer Deposition or by a microwave driven hydrothermal method. We report that do** with Cobalt quenches a visible photoluminescence (PL) of ZnO. We could observe a…
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ZnCoO is one of the most studied and promising semiconductor materials for spintronics applications. In this work we discuss optical and electrical properties of ZnCoO films and nanoparticles grown at low temperature by either Atomic Layer Deposition or by a microwave driven hydrothermal method. We report that do** with Cobalt quenches a visible photoluminescence (PL) of ZnO. We could observe a visible PL of ZnO only for samples with very low Co fractions (up to 1%). Mechanisms of PL quenching in ZnCoO are discussed. We also found that ZnO films remained n-type conductive after do** with Co, indicating that a high electron concentration and Cobalt 2+ charge state can coexist.
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Submitted 20 January, 2014;
originally announced January 2014.
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ALD grown zinc oxide with controllable electrical properties
Authors:
E. Guziewicz,
M. Godlewski,
L. Wachnicki,
T. A. Krajewski,
G. Luka,
S. Gieraltowska,
R. Jakiela,
A. Stonert,
W. Lisowski,
M. Krawczyk,
J. W. Sobczak,
A. Jablonski
Abstract:
The paper presents results for zinc oxide films grown at low temperature regime by Atomic Layer Deposition (ALD). We discuss electrical properties of such films and show that low temperature deposition results in oxygen-rich ZnO layers in which free carrier concentration is very low. For optimized ALD process it can reach the level of 10^15 cm-3, while mobility of electrons is between 20 and 50 cm…
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The paper presents results for zinc oxide films grown at low temperature regime by Atomic Layer Deposition (ALD). We discuss electrical properties of such films and show that low temperature deposition results in oxygen-rich ZnO layers in which free carrier concentration is very low. For optimized ALD process it can reach the level of 10^15 cm-3, while mobility of electrons is between 20 and 50 cm2/Vs. Electrical parameters of ZnO films deposited by ALD at low temperature regime are appropriate for constructing of the ZnO-based p-n and Schottky junctions. We demonstrate that such junctions are characterized by the rectification ratio high enough to fulfill requirements of 3D memories and are deposited at temperature 100degC which makes them appropriate for deposition on organic substrates.
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Submitted 9 August, 2013;
originally announced August 2013.
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ZnO, ZnMnO and ZnCoO films grown by atomic layer deposition
Authors:
M. I. Łukasiewicz,
A. Wójcik-Głodowska,
E. Guziewicz,
A. Wolska,
M. T. Klepka,
P. Dłużewski,
R. Jakieła,
E. Łusakowska,
K. Kopalko,
W. Paszkowicz,
Ł. Wachnicki,
B. S. Witkowski,
W. Lisowski,
M. Krawczyk,
J. W. Sobczak,
A. Jabłoński,
M. Godlewski
Abstract:
Despite many efforts the origin of a ferromagnetic (FM) response in ZnMnO and ZnCoO is still not clear. Magnetic investigations of our samples, not discussed here, show that the room temperature FM response is observed only in alloys with a non-uniform Mn or Co distribution. Thus, the control of their distribution is crucial for explanation of contradicted magnetic properties of ZnCoO and ZnMnO re…
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Despite many efforts the origin of a ferromagnetic (FM) response in ZnMnO and ZnCoO is still not clear. Magnetic investigations of our samples, not discussed here, show that the room temperature FM response is observed only in alloys with a non-uniform Mn or Co distribution. Thus, the control of their distribution is crucial for explanation of contradicted magnetic properties of ZnCoO and ZnMnO reported till now. In the present review we discuss advantages of the Atomic Layer Deposition (ALD) growth method, which enables us to control uniformity of ZnMnO and ZnCoO alloys. Properties of ZnO, ZnMnO and ZnCoO films grown by the ALD are discussed.
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Submitted 9 August, 2013;
originally announced August 2013.
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Optical and magnetic properties of ZnCoO layers
Authors:
M. Godlewski,
M. I. Łukasiewicz,
E. Guziewicz,
V. Yu. Ivanov,
Ł. Owczarczyk,
B. S. Witkowski
Abstract:
Optical and magneto-optical properties of ZnCoO films grown at low temperature by Atomic Layer Deposition are discussed. Strong wide band absorption, with onset at about 2.4 eV, is observed in ZnCoO in addition to Co-related intra-shell transitions. This absorption band is related to Co 2+ to 3+ photo-ionization transition. A strong photoluminescence (PL) quenching is observed, which we relate to…
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Optical and magneto-optical properties of ZnCoO films grown at low temperature by Atomic Layer Deposition are discussed. Strong wide band absorption, with onset at about 2.4 eV, is observed in ZnCoO in addition to Co-related intra-shell transitions. This absorption band is related to Co 2+ to 3+ photo-ionization transition. A strong photoluminescence (PL) quenching is observed, which we relate to Co recharging in ZnO lattice. Mechanisms of PL quenching are discussed.
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Submitted 9 August, 2013;
originally announced August 2013.
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Modification of emission properties of ZnO layers due to plasmonic near-field coupling to Ag nanoislands
Authors:
Joanna Papierska,
Bartłomiej S. Witkowski,
Anastasiya Derkachova,
Krzysztof P. Korona,
Johannes Binder,
Krzysztof Gałkowski,
Łukasz Wachnicki,
Marek Godlewski,
Tomasz Dietl,
Jan Suffczyński
Abstract:
A simple fabrication method of Ag nanoislands on ZnO films is presented. Continuous wave and time-resolved photoluminescence and transmission are employed to investigate modifications of visible and UV emissions of ZnO brought about by coupling to localized surface plasmons residing on Ag nanoislands. The size of the nanoislands, determining their absorption and scattering efficiencies, is found t…
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A simple fabrication method of Ag nanoislands on ZnO films is presented. Continuous wave and time-resolved photoluminescence and transmission are employed to investigate modifications of visible and UV emissions of ZnO brought about by coupling to localized surface plasmons residing on Ag nanoislands. The size of the nanoislands, determining their absorption and scattering efficiencies, is found to be an important factor governing plasmonic modification of optical response of ZnO films. The presence of the Ag nanoislands of appropriate dimensions causes a strong (threefold) increase in emission intensity and up to 1.5 times faster recombination. The experimental results are successfully described by model calculations within the Mie theory.
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Submitted 31 January, 2013;
originally announced January 2013.
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Homogenous and heterogeneous magnetism in (Zn,Co)O
Authors:
M. Sawicki,
E. Guziewicz,
M. I. Lukasiewicz,
O. Proselkov,
I. A. Kowalik,
W. Lisowski,
P. Dluzewski,
A. Wittlin,
M. Jaworski,
A. Wolska,
W. Paszkowicz,
R. Jakiela,
B. S. Witkowski,
L. Wachnicki,
M. T. Klepka,
F. J. Luque,
D. Arvanitis,
J. W. Sobczak,
M. Krawczyk,
A. Jablonski,
W. Stefanowicz,
D. Sztenkiel,
M. Godlewski,
T. Dietl
Abstract:
A series of (ZnO)m(CoO)n digital alloys and superlattices grown by atomic layer deposition has been investigated by a range of experimental methods. The data provide evidences that the Co interdiffusion in the digital alloy structures is sufficient to produce truly random Zn1-xCoxO mixed crystals with x up to 40%. Conversely, in the superlattice structures the interdiffusion is not strong enough t…
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A series of (ZnO)m(CoO)n digital alloys and superlattices grown by atomic layer deposition has been investigated by a range of experimental methods. The data provide evidences that the Co interdiffusion in the digital alloy structures is sufficient to produce truly random Zn1-xCoxO mixed crystals with x up to 40%. Conversely, in the superlattice structures the interdiffusion is not strong enough to homogenize the Co content along the growth direction results in the formation of (Zn,Co)O films with spatially modulated Co concentrations. All structures deposited at 160\circC show magnetic properties specific to dilute magnetic semiconductors with localized spins S = 3/2 coupled by strong but short range antiferromagnetic interactions that lead to low temperature spin-glass freezing.
It is demonstrated that ferromagnetic-like features, visible exclusively in layers grown at 200\circC and above, are associated with an interfacial mesh of metallic Co granules residing between the substrate and the (Zn,Co)O layer. This explains why the magnitude of ferromagnetic signal is virtually independent of the film thickness as well as elucidates the origin of magnetic anisotropy. Our conclusions have been derived for layers in which the Co concentration, distribution, and aggregation have been determined by: secondary-ion mass spectroscopy, electron probe micro-analysis, high-resolution transmission electron microscopy with capabilities allowing for chemical analysis; x-ray absorption near-edge structure; extended x-ray absorption fine-structure; x-ray photoemission spectroscopy, and x-ray circular magnetic dichroism. Macroscopic properties of these layers have been investigated by superconducting quantum interference device magnetometery and microwave dielectric losses allowing to confirm the important role of metallic inclusions.
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Submitted 25 January, 2012;
originally announced January 2012.
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Properties and characterization of ALD grown dielectric oxides for MIS structures
Authors:
S. Gieraltowska,
D. Sztenkiel,
E. Guziewicz,
M. Godlewski,
G. Luka,
B. S. Witkowski,
L. Wachnicki,
E. Lusakowska,
T. Dietl,
M. Sawicki
Abstract:
We report on an extensive structural and electrical characterization of under-gate dielectric oxide insulators Al2O3 and HfO2 grown by Atomic Layer Deposition (ALD). We elaborate the ALD growth window for these oxides, finding that the 40-100 nm thick layers of both oxides exhibit fine surface flatness and required amorphous structure. These layers constitute a base for further metallic gate evapo…
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We report on an extensive structural and electrical characterization of under-gate dielectric oxide insulators Al2O3 and HfO2 grown by Atomic Layer Deposition (ALD). We elaborate the ALD growth window for these oxides, finding that the 40-100 nm thick layers of both oxides exhibit fine surface flatness and required amorphous structure. These layers constitute a base for further metallic gate evaporation to complete the Metal-Insulator-Semiconductor structure. Our best devices survive energizing up to ~3 MV/cm at 77 K with the leakage current staying below the state-of-the-art level of 1 nA. At these conditions the displaced charge corresponds to a change of the sheet carrier density of 3 \times 1013 cm-2, what promises an effective modulation of the micromagnetic properties in diluted ferromagnetic semiconductors.
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Submitted 27 July, 2011;
originally announced July 2011.
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Effects related to deposition temperature of ZnCoO films grown by Atomic Layer Deposition - uniformity of Co distribution, structural, optical, electrical and magnetic properties
Authors:
Malgorzata I. Lukasiewicz,
Bartlomiej Witkowski,
Marek Godlewski,
Elzbieta Guziewicz,
Maciej Sawicki,
Wojciech Paszkowicz,
Rafal Jakiela,
Tomasz A. Krajewski,
Grzegorz Luka
Abstract:
In the present study we report on properties of ZnCoO films grown at relatively low temperature by the Atomic Layer Deposition, using two reactive organic zinc precursors (dimethylzinc and diethylzinc). The use of these precursors allowed us the significant reduction of a growth temperature to below 300oC. The influence of growth conditions on the Co distribution in ZnCoO films, their structure an…
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In the present study we report on properties of ZnCoO films grown at relatively low temperature by the Atomic Layer Deposition, using two reactive organic zinc precursors (dimethylzinc and diethylzinc). The use of these precursors allowed us the significant reduction of a growth temperature to below 300oC. The influence of growth conditions on the Co distribution in ZnCoO films, their structure and magnetic properties was investigated using Secondary Ion Mass Spectroscopy, Scanning Electron Microscopy, Cathodoluminescence, Energy Dispersive X-ray Spectrometry (EDX), X-ray diffraction and Superconducting Quantum Interference Device magnetometry. We achieved high uniformity of the films grown at 160°C. Such films are paramagnetic. Films grown at 200° and at higher temperature are nonuniform. Formation of foreign phases in such films was detected using high resolution EDX method. These samples are not purely paramagnetic and show weak ferromagnetic response at low temperature.
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Submitted 26 July, 2011;
originally announced July 2011.
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ZnCoO Films by Atomic Layer Deposition - influence of a growth temperature on uniformity of cobalt distribution
Authors:
M. I. Lukasiewicz,
B. Witkowski,
M. Godlewski,
E. Guziewicz,
M. Sawicki,
W. Paszkowicz,
E. Lusakowska,
R. Jakiela,
T. Krajewski,
I. A. Kowalik,
B. J. Kowalski
Abstract:
We report on the structural, electrical and magnetic properties of ZnCoO thin films grown by Atomic Layer Deposition (ALD) method using reactive organic precursors of zinc and cobalt. As a zinc precursor we applied either dimethylzinc or diethylzinc and cobalt (II) acetyloacetonate as a cobalt precursor. The use of these precursors allowed us the significant reduction of a growth temperature to 30…
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We report on the structural, electrical and magnetic properties of ZnCoO thin films grown by Atomic Layer Deposition (ALD) method using reactive organic precursors of zinc and cobalt. As a zinc precursor we applied either dimethylzinc or diethylzinc and cobalt (II) acetyloacetonate as a cobalt precursor. The use of these precursors allowed us the significant reduction of a growth temperature to 300oC and below, which proved to be very important for the growth of uniform films of ZnCoO. Structural, electrical and magnetic properties of the obtained ZnCoO layers will be discussed based on the results of SIMS, SEM, EDS, XRD, AFM, Hall effect and SQUID investigations.
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Submitted 26 July, 2011;
originally announced July 2011.
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Role of interface in ferromagnetism of (Zn,Co)O films
Authors:
M. Godlewski,
E. Guziewicz,
M. I. Lukasiewicz,
I. A. Kowalik,
M. Sawicki,
B. S. Witkowski,
R. Jakiela,
W. Lisowski,
J. W. Sobczak,
M. Krawczyk
Abstract:
We demonstrate that room temperature ferromagnetic response (RT FR) of ZnCoO films grown at low temperature by the Atomic layer Deposition (ALD) method is due to Co metal accumulations at the ZnCoO/substrate interface region. The accumulated experimental evi evidences allow us to reject several other explanations of this effect in our samples, despite the fact that some of them are likely to be re…
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We demonstrate that room temperature ferromagnetic response (RT FR) of ZnCoO films grown at low temperature by the Atomic layer Deposition (ALD) method is due to Co metal accumulations at the ZnCoO/substrate interface region. The accumulated experimental evi evidences allow us to reject several other explanations of this effect in our samples, despite the fact that some of them are likely to be responsible for the low temperature FM in this class of the material.
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Submitted 26 July, 2011;
originally announced July 2011.
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Optical Properties of Manganese Doped Wide Band Gap ZnS and ZnO
Authors:
M. Godlewski,
A. Wojcik-Glodowska,
E. Guziewicz,
S. Yatsunenko,
A. Zakrzewski,
Y. Dumont,
E. Chikoidze,
M. R. Phillips
Abstract:
Optical properties of ZnMnO layers grown at low temperature by Atomic Layer Deposition and Metalorganic Vapor Phase Epitaxy are discussed and compared to results obtained for ZnMnS samples. Present results suggest a double valence of Mn ions in ZnO lattice. Strong absorption, with onset at about 2.1 eV, is tentatively related to Mn 2+ to 3+ photoionization. Mechanism of emission deactivation in Zn…
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Optical properties of ZnMnO layers grown at low temperature by Atomic Layer Deposition and Metalorganic Vapor Phase Epitaxy are discussed and compared to results obtained for ZnMnS samples. Present results suggest a double valence of Mn ions in ZnO lattice. Strong absorption, with onset at about 2.1 eV, is tentatively related to Mn 2+ to 3+ photoionization. Mechanism of emission deactivation in ZnMnO is discussed and is explained by the processes following the assumed Mn 2+ to 3+ recharging.
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Submitted 26 July, 2011;
originally announced July 2011.
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Puzzling magneto-optical properties of ZnMnO films
Authors:
M. Godlewski,
A. Wasiakowski,
V. Yu. Ivanov,
A. Wojcik-Glodowska,
M. Lukasiewicz,
E. Guziewicz,
R. Jakiela,
K. Kopalko,
A. Zakrzewski
Abstract:
Optical and magneto-optical properties of ZnMnO films grown at low temperature by Atomic Layer Deposition are discussed. A strong polarization of excitonic photoluminescence is reported, surprisingly observed without splitting or spectral shift of excitonic transitions. Present results suggest possibility of Mn recharging in ZnO lattice. Strong absorption, with onset at about 2.1 eV, is related to…
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Optical and magneto-optical properties of ZnMnO films grown at low temperature by Atomic Layer Deposition are discussed. A strong polarization of excitonic photoluminescence is reported, surprisingly observed without splitting or spectral shift of excitonic transitions. Present results suggest possibility of Mn recharging in ZnO lattice. Strong absorption, with onset at about 2.1 eV, is related to Mn 2+ to 3+ photo-ionization. We propose that the observed strong circular polarization of excitonic emission is of a similar character as the one observed by us for ZnSe:Cr.
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Submitted 26 July, 2011;
originally announced July 2011.
