Comparing the Corrosion of Uranium Nitride and Uranium Dioxide Surfaces with H2O2
Authors:
E. Lawrence Bright,
S. Rennie,
A. Siberry,
K. Samani,
K. Clarke,
D. T. Goddard,
R. Springell
Abstract:
Uranium mononitride, UN, is considered a potential accident tolerant fuel due to its high uranium density, high thermal conductivity, and high melting point. Compared with the relatively inert UO2, UN has a high reactivity in water, however, studies have not considered the significant effect of radiation, which is known to cause corrosion of UO2. This study uses 0.1 M H2O2 to simulate the effects…
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Uranium mononitride, UN, is considered a potential accident tolerant fuel due to its high uranium density, high thermal conductivity, and high melting point. Compared with the relatively inert UO2, UN has a high reactivity in water, however, studies have not considered the significant effect of radiation, which is known to cause corrosion of UO2. This study uses 0.1 M H2O2 to simulate the effects of water radiolysis in order to compare the radiolytic corrosion rates of UO2, UN, and U2N3 thin films at room temperature. X-ray reflectivity was used to investigate the changes in film morphology as a function of H2O2 exposure time, allowing changes in film thickness and roughness to be observed on the Angstrom length-scale. Results showed significant differences between UO2, UN, and U2N3, with corrosion rates of 0.083(3), 0.020(4), and 0.47(8) A/s, respectively, showing that UN corrodes more slowly than UO2 in 0.1 M H2O2.
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Submitted 29 October, 2018;
originally announced October 2018.
Epitaxial UN and $α$-U$_2$N$_3$ Thin Films
Authors:
E. Lawrence Bright,
S. Rennie,
M. Cattelan,
N. A. Fox,
D. T. Goddard,
R. Springell
Abstract:
Single crystal epitaxial thin films of UN and U$_2$N$_3$ have been grown for the first time by reactive DC magnetron sputtering. These films provide ideal samples for fundamental research into the potential accident tolerant fuel, UN, and U$_2$N$_3$, its intermediate oxidation product. Films were characterised using x-ray diffraction (XRD) and x-ray photoelectron spectroscopy (XPS), with XRD analy…
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Single crystal epitaxial thin films of UN and U$_2$N$_3$ have been grown for the first time by reactive DC magnetron sputtering. These films provide ideal samples for fundamental research into the potential accident tolerant fuel, UN, and U$_2$N$_3$, its intermediate oxidation product. Films were characterised using x-ray diffraction (XRD) and x-ray photoelectron spectroscopy (XPS), with XRD analysis showing both thin films to be [001] oriented and composed of a single domain. The specular lattice parameters of the UN and U$_2$N$_3$ films were found to be 4.895\,Å and 10.72\,Å, respectively, with the UN film having a miscut of 2.6\,$^\circ$. XPS showed significant differences in the N-1s peak between the two films, with area analysis showing both films to be stoichiometric.
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Submitted 6 March, 2018;
originally announced March 2018.
