Showing 1–21 of 21 results for author: Elmquist, R

Constructing 100 MΩ and 1 GΩ Resistance Standards via Star-Mesh Transformations

Authors: Dean G. Jarrett, Albert F. Rigosi, Dominick S. Scaletta, Ngoc Thanh Mai Tran, Heather M. Hill, Alireza R. Panna, Cheng Hsueh Yang, Yanfei Yang, Randolph E. Elmquist, David B. Newell

Abstract: A recent mathematical framework for optimizing resistor networks to achieve values in the MΩ through GΩ levels was employed for two specific cases. Objectives here include proof of concept and identification of possible apparatus limitations for future experiments involving graphene-based quantum Hall array resistance standards. Using fractal-like, or recursive, features of the framework allows on… ▽ More A recent mathematical framework for optimizing resistor networks to achieve values in the MΩ through GΩ levels was employed for two specific cases. Objectives here include proof of concept and identification of possible apparatus limitations for future experiments involving graphene-based quantum Hall array resistance standards. Using fractal-like, or recursive, features of the framework allows one to calculate and implement network designs with substantially lower-valued resistors. The cases of 100 MΩ and 1 GΩ demonstrate that, theoretically, one would not need more than 100 quantum Hall elements to achieve these high resistances. △ Less

Submitted 2 February, 2024; originally announced February 2024.

Fractal-like star-mesh transformations using graphene quantum Hall arrays

Authors: Dominick S. Scaletta, Swapnil M. Mhatre, Ngoc Thanh Mai Tran, Cheng-Hsueh Yang, Heather M. Hill, Yanfei Yang, Linli Meng, Alireza R. Panna, Shamith U. Payagala, Randolph E. Elmquist, Dean G. Jarrett, David B. Newell, Albert F. Rigosi

Abstract: A mathematical approach is adopted for optimizing the number of total device elements required for obtaining high effective quantized resistances in graphene-based quantum Hall array devices. This work explores an analytical extension to the use of star-mesh transformations such that fractal-like, or recursive, device designs can yield high enough resistances (like 1 EΩ, arguably the highest resis… ▽ More A mathematical approach is adopted for optimizing the number of total device elements required for obtaining high effective quantized resistances in graphene-based quantum Hall array devices. This work explores an analytical extension to the use of star-mesh transformations such that fractal-like, or recursive, device designs can yield high enough resistances (like 1 EΩ, arguably the highest resistance with meaningful applicability) while still being feasible to build with modern fabrication techniques. Epitaxial graphene elements are tested, whose quantized Hall resistance at the nu=2 plateau (R_H = 12906.4 Ω) becomes the building block for larger effective, quantized resistances. It is demonstrated that, mathematically, one would not need more than 200 elements to achieve the highest pertinent resistances △ Less

Submitted 27 September, 2023; originally announced September 2023.

Realization of the quantum ampere using the quantum anomalous Hall and Josephson effects

Authors: Linsey K. Rodenbach, Ngoc Thanh Mai Tran, Jason M. Underwood, Alireza R. Panna, Molly P. Andersen, Zachary S. Barcikowski, Shamith U. Payagala, Peng Zhang, Lixuan Tai, Kang L. Wang, Randolph E. Elmquist, Dean G. Jarrett, David B. Newell, Albert F. Rigosi, David Goldhaber-Gordon

Abstract: By directly coupling a quantum anomalous Hall resistor to a programmable Josephson voltage standard, we have implemented a quantum current sensor (QCS) that operates within a single cryostat in zero magnetic field. Using this QCS we determine values of current within the range 9.33 nA - 252 nA, providing a realization of the ampere based on fundamental constants and quantum phenomena. The relative… ▽ More By directly coupling a quantum anomalous Hall resistor to a programmable Josephson voltage standard, we have implemented a quantum current sensor (QCS) that operates within a single cryostat in zero magnetic field. Using this QCS we determine values of current within the range 9.33 nA - 252 nA, providing a realization of the ampere based on fundamental constants and quantum phenomena. The relative Type A uncertainty is lowest, 2.30 $\times$10$^{-6}$ A/A, at the highest current studied, 252 nA. The total root-sum-square combined relative uncertainty ranges from 3.91 $\times$10$^{-6}$ A/A at 252 nA to 41.2 $\times$10$^{-6}$ A/A at 9.33 nA. No DC current standard is available in the nanoampere range with relative uncertainty comparable to this, so we assess our QCS accuracy by comparison to a traditional Ohm's law measurement of the same current source. We find closest agreement (1.46 $\pm$ 4.28)$\times$10$^{-6}$ A/A for currents near 83.9 nA, for which the highest number of measurements were made. △ Less

Submitted 31 July, 2023; originally announced August 2023.

Comments: 12 pages, 5 figures, 15 pages of supplemental information

Variable Electrical Responses in Epitaxial Graphene Nanoribbons

Authors: C. -C. Yeh, S. M. Mhatre, N. T. M. Tran, H. M. Hill, H. **, P. -C. Liao, D. K. Patel, R. E. Elmquist, C. -T. Liang, A. F. Rigosi

Abstract: We have demonstrated the fabrication of both armchair and zigzag epitaxial graphene nanoribbon (GNR) devices on 4H-SiC using a polymer-assisted sublimation growth method. The phenomenon of terrace step formation has traditionally introduced the risk of GNR deformation along sidewalls, but a polymer-assisted sublimation method helps mitigate this risk. Each type of 50 nm wide GNR is examined electr… ▽ More We have demonstrated the fabrication of both armchair and zigzag epitaxial graphene nanoribbon (GNR) devices on 4H-SiC using a polymer-assisted sublimation growth method. The phenomenon of terrace step formation has traditionally introduced the risk of GNR deformation along sidewalls, but a polymer-assisted sublimation method helps mitigate this risk. Each type of 50 nm wide GNR is examined electrically and optically (armchair and zigzag), with the latter method being a check on the quality of the GNR devices and the former using alternating current to investigate resistance attenuation from frequencies above 100 Hz. Rates of attenuation are determined for each type of GNR device, revealing subtle suggested differences between armchair and zigzag GNRs. △ Less

Submitted 25 April, 2023; originally announced April 2023.

Star-Mesh Quantized Hall Array Resistance Devices

Authors: Dean G. Jarrett, Ching-Chen Yeh, Shamith U. Payagala, Alireza R. Panna, Yanfei Yang, Linli Meng, Swapnil M. Mhatre, Ngoc Thanh Mai Tran, Heather M. Hill, Dipanjan Saha, Randolph E. Elmquist, David B. Newell, Albert F. Rigosi

Abstract: Advances in the development of graphene-based technology have enabled improvements in DC resistance metrology. Devices made from epitaxially grown graphene have replaced the GaAs-based counterparts, leading to an easier and more accessible realization of the ohm. By optimizing the scale of the growth, it has become possible to fabricate quantized Hall array resistance standards (QHARS) with nomina… ▽ More Advances in the development of graphene-based technology have enabled improvements in DC resistance metrology. Devices made from epitaxially grown graphene have replaced the GaAs-based counterparts, leading to an easier and more accessible realization of the ohm. By optimizing the scale of the growth, it has become possible to fabricate quantized Hall array resistance standards (QHARS) with nominal values between 1 kΩ and 1.29 MΩ. One of these QHARS device designs accommodates a value of about 1.01 MΩ, which made it an ideal candidate to pursue a proof-of-concept that graphene-based QHARS devices are suitable for forming wye-delta resistance networks. In this work, the 1.01 MΩ array output nearly 20.6 MΩ due to the wye-delta transformation, which itself is a special case of star-mesh transformations. These mathematical equivalence principles allow one to extend the QHR to the 100 MΩ and 10 GΩ resistance levels with fewer array elements than would be necessary for a single array with many more elements in series. The 1.01 MΩ device shows promise that the wye-delta transformation can shorten the calibration chain, and, more importantly, provide a chain with a more direct line to the quantum SI. △ Less

Submitted 21 April, 2023; originally announced April 2023.

Fabrication of uniformly doped graphene quantum Hall arrays with multiple quantized resistance outputs

Authors: Swapnil M. Mhatre, Ngoc Thanh Mai Tran, Heather M. Hill, Ching-Chen Yeh, Dipanjan Saha, David B. Newell, Angela R. Hight Walker, Chi-Te Liang, Randolph E. Elmquist, Albert F. Rigosi

Abstract: In this work, limiting factors for develo** metrologically useful arrays from epitaxial graphene on SiC are lifted with a combination of centimeter-scale, high-quality material growth and the implementation of superconducting contacts. Standard devices for metrology have been restricted to having a single quantized value output based on the $ν$ = 2 Landau level. With the demonstrations herein of… ▽ More In this work, limiting factors for develo** metrologically useful arrays from epitaxial graphene on SiC are lifted with a combination of centimeter-scale, high-quality material growth and the implementation of superconducting contacts. Standard devices for metrology have been restricted to having a single quantized value output based on the $ν$ = 2 Landau level. With the demonstrations herein of devices having multiple outputs of quantized values available simultaneously, these versatile devices can be used to disseminate the ohm globally. Such devices are designed to give access to quantized resistance values over the range of three orders of magnitude, starting as low as the standard value of approximately 12.9 k$Ω$ and reaching as high as 1.29 M$Ω$. Several experimental methods are used to assess the quality and versatility of the devices, including standard lock-in techniques and Raman spectroscopy. △ Less

Submitted 10 June, 2022; originally announced June 2022.

Chromium-Doped Bismuth Antimony Telluride for Future Quantum Hall Resistance Standards

Authors: Albert F. Rigosi Linsey K. Rodenbach, Alireza R. Panna, Shamith U. Payagala, Ilan T. Rosen, Joseph A. Hagmann, Peng Zhang, Lixuan Tai, Kang L. Wang, Dean G. Jarrett, Randolph E. Elmquist, Jason M. Underwood, David B. Newell, David Goldhaber-Gordon

Abstract: Since 2017, epitaxial graphene has been the base material for the US national standard for resistance. A future avenue of research within electrical metrology is to remove the need for strong magnetic fields, as is currently the case for devices exhibiting the quantum Hall effect. The quantum Hall effect is just one of many research endeavours that revolve around recent quantum physical phenomena… ▽ More Since 2017, epitaxial graphene has been the base material for the US national standard for resistance. A future avenue of research within electrical metrology is to remove the need for strong magnetic fields, as is currently the case for devices exhibiting the quantum Hall effect. The quantum Hall effect is just one of many research endeavours that revolve around recent quantum physical phenomena like composite fermions, charge density waves, and topological properties [1-2]. New materials, like magnetically doped topological insulators (MTIs), offer access to the quantum anomalous Hall effect, which in its ideal form, could become a future resistance standard needing only a small permanent magnet to activate a quantized resistance value [3-5]. Furthermore, these devices could operate at zero-field for measurements, making the dissemination of the ohm more economical and portable. Here we present results on precision measurements of the h/e2 quantized plateau of Cr-Doped (BixSb1-x)2Te3 and give them context by comparing them to modern graphene-based resistance standards. Ultimately, MTI-based devices could be combined in a single system with magnetic-field-averse Josephson voltage standards to obtain an alternative quantum current standard. △ Less

Submitted 12 May, 2022; originally announced May 2022.

Spectroscopic assessment of short-term nitric acid do** of epitaxial graphene

Authors: Ngoc Thanh Mai Tran, Swapnil M. Mhatre, Cristiane N. Santos, Adam J. Biacchi, Mathew L. Kelley, Heather M. Hill, Dipanjan Saha, Chi-Te Liang, Randolph E. Elmquist, David B. Newell, Benoit Hackens, Christina A. Hacker, Albert F. Rigosi

Abstract: This work reports information on the transience of hole do** in epitaxial graphene devices when nitric acid is used as an adsorbent. Under vacuum conditions, desorption processes are monitored by electrical and spectroscopic means to extract the relevant timescales from the corresponding data. It is of vital importance to understand the reversible nature of hole do** because such device proces… ▽ More This work reports information on the transience of hole do** in epitaxial graphene devices when nitric acid is used as an adsorbent. Under vacuum conditions, desorption processes are monitored by electrical and spectroscopic means to extract the relevant timescales from the corresponding data. It is of vital importance to understand the reversible nature of hole do** because such device processing can be a suitable alternative to large-scale, metallic gating. Most measurements are performed post-exposure at room temperature, and, for some electrical transport measurements, at 1.5 K. Vacuum conditions are applied to many measurements to replicate the laboratory conditions under which devices using this do** method would be measured. The relevant timescales from transport measurements are compared with results from X-ray photoelecton spectroscopy and Fourier transform infrared spectroscopy measurements, with the latter performed at ambient conditions and accompanied by calculations of the spectra in the Reststrahlen band. △ Less

Submitted 15 April, 2022; originally announced April 2022.

Timescales for Nitric Acid Desorption in Epitaxial Graphene Devices

Authors: Swapnil M. Mhatre, Ngoc Thanh Mai Tran, Heather M. Hill, Dipanjan Saha, Angela R. Hight Walker, Chi-Te Liang, Randolph E. Elmquist, David B. Newell, Albert F. Rigosi

Abstract: This work reports the dynamics of transient hole do** in epitaxial graphene devices by using nitric acid as an adsorbent. The timescales associated with corresponding desorption processes are extracted from the data. The understanding of reversible hole do** without gating is of crucial importance to those fabricating devices with a particular functionality. Measurements of the electrical and… ▽ More This work reports the dynamics of transient hole do** in epitaxial graphene devices by using nitric acid as an adsorbent. The timescales associated with corresponding desorption processes are extracted from the data. The understanding of reversible hole do** without gating is of crucial importance to those fabricating devices with a particular functionality. Measurements of the electrical and optical properties of several devices post-exposure were performed with transport temperatures between 300 K and 1.5 K. Ambient conditions are applied to non-transport measurements to replicate the most likely laboratory conditions for handling devices using this do** method. The relevant timescales from transport measurements are compared with results from Raman spectroscopy measurements. △ Less

Submitted 15 April, 2022; originally announced April 2022.

Large-scale five- and seven-junction epitaxial graphene devices

Authors: Dinesh Patel, Martina Marzano, Chieh-I Liu, Heather M. Hill, Mattias Kruskopf, Hanbyul **, Jiuning Hu, David B. Newell, Chi-Te Liang, Randolph Elmquist, Albert F. Rigosi

Abstract: The utilization of multiple current terminals on millimeter-scale graphene p-n junction devices has enabled the measurement of many atypical, fractional multiples of the quantized Hall resistance at the i=2 plateau. These fractions take the form a/b R_H and can be determined both analytically and by simulations. These experiments validate the use of either the LTspice circuit simulator or the anal… ▽ More The utilization of multiple current terminals on millimeter-scale graphene p-n junction devices has enabled the measurement of many atypical, fractional multiples of the quantized Hall resistance at the i=2 plateau. These fractions take the form a/b R_H and can be determined both analytically and by simulations. These experiments validate the use of either the LTspice circuit simulator or the analytical framework recently presented in similar work. Furthermore, the production of several devices with large-scale junctions substantiates the approach of using simple ultraviolet lithography to obtain junctions of sufficient sharpness. △ Less

Submitted 26 March, 2022; v1 submitted 12 March, 2022; originally announced March 2022.

Fabrication of quantum Hall p-n junction checkerboards

Authors: Dinesh K. Patel, Martina Marzano, Chieh-I Liu, Mattias Kruskopf, Randolph E. Elmquist, Chi-Te Liang, Albert F. Rigosi

Abstract: Measurements of fractional multiples of the ν=2 plateau quantized Hall resistance (R_H {\approx} 12906 Ω) were enabled by the utilization of multiple current terminals on millimetre-scale graphene p-n junction devices fabricated with interfaces along both lateral directions. These quantum Hall resistance checkerboard devices have been demonstrated to match quantized resistance outputs numerically… ▽ More Measurements of fractional multiples of the ν=2 plateau quantized Hall resistance (R_H {\approx} 12906 Ω) were enabled by the utilization of multiple current terminals on millimetre-scale graphene p-n junction devices fabricated with interfaces along both lateral directions. These quantum Hall resistance checkerboard devices have been demonstrated to match quantized resistance outputs numerically calculated with the LTspice circuit simulator. From the devices' functionality, more complex embodiments of the quantum Hall resistance checkerboard were simulated to highlight the parameter space within which these devices could operate. Moreover, these measurements suggest that the scalability of p-n junction fabrication on millimetre or centimetre scales is feasible with regards to graphene device manufacturing by using the far more efficient process of standard ultraviolet lithography. △ Less

Submitted 12 March, 2022; originally announced March 2022.

Algorithm for constructing customized quantized resistances in graphene $p-n$ junctions

Authors: Albert F. Rigosi, Martina Marzano, Antonio Levy, Heather M. Hill, Dinesh K. Patel, Mattias Kruskopf, Hanbyul **, Randolph E. Elmquist, David B. Newell

Abstract: An algorithm is introduced for predicting quantized resistances in graphene p-n junction devices that utilize more than a single entry and exit point for electron flow. Depending on the configuration of an arbitrary number of terminals, electrical measurements yield fractional multiples of the typical quantized Hall resistance at the $ν=2$ plateau $R_H \approx 12906 Ω$ and take the form:… ▽ More An algorithm is introduced for predicting quantized resistances in graphene p-n junction devices that utilize more than a single entry and exit point for electron flow. Depending on the configuration of an arbitrary number of terminals, electrical measurements yield fractional multiples of the typical quantized Hall resistance at the $ν=2$ plateau $R_H \approx 12906 Ω$ and take the form: $\frac{a}{b}R_H$. This theoretical formulation is independent of material, and applications to other material systems that exhibit quantum Hall behaviors are to be expected. Furthermore, this formulation is supported with experimental data from graphene-based devices with multiple source and drain terminals. △ Less

Submitted 20 January, 2022; originally announced January 2022.

Designs for programmable quantum resistance standards based on epitaxial graphene p-n junctions

Authors: Jiuning Hu, Albert F. Rigosi, Mattias Kruskopf, Yanfei Yang, Bi-Yi Wu, Jifa Tian, Alireza R. Panna, Hsin-Yen Lee, Shamith U. Payagala, George R. Jones, Marlin E. Kraft, Dean G. Jarrett, Kenji Watanabe, Takashi Taniguchi, Randolph E. Elmquist, David B. Newell

Abstract: We report the fabrication and measurement of top gated epitaxial graphene p-n junctions where exfoliated hexagonal boron nitride (h-BN) is used as the gate dielectric. The four-terminal longitudinal resistance across a single junction is well quantized at the von Klitzing constant R_K with a relative uncertainty of 10-7. After the exploration of numerous parameter spaces, we summarize the conditio… ▽ More We report the fabrication and measurement of top gated epitaxial graphene p-n junctions where exfoliated hexagonal boron nitride (h-BN) is used as the gate dielectric. The four-terminal longitudinal resistance across a single junction is well quantized at the von Klitzing constant R_K with a relative uncertainty of 10-7. After the exploration of numerous parameter spaces, we summarize the conditions upon which these devices could function as potential resistance standards. Furthermore, we offer designs of programmable electrical resistance standards over six orders of magnitude by using external gating. △ Less

Submitted 10 January, 2022; originally announced January 2022.

Crystalline Formations of NbN/4H-SiC Heterostructure Interfaces

Authors: Michael B. Katz, Chieh-I Liu, Albert F. Rigosi, Mattias Kruskopf, Angela Hight Walker, Randolph E. Elmquist, Albert V. Davydov

Abstract: Given the importance of incorporating various superconducting materials to device fabrication or substrate development, studying the interface for possible interactions is warranted. In this work, NbN films sputter-deposited on 4H-SiC were heat-treated at 1400 C and 1870 C and were examined with transmission electron microscopy to assess whether the interfacial interactions undergo temperature-dep… ▽ More Given the importance of incorporating various superconducting materials to device fabrication or substrate development, studying the interface for possible interactions is warranted. In this work, NbN films sputter-deposited on 4H-SiC were heat-treated at 1400 C and 1870 C and were examined with transmission electron microscopy to assess whether the interfacial interactions undergo temperature-dependent behavior. We report the diffusion of NbN into the SiC substrate and the formation of NbN nanocrystallites therein during the 1400 C treatment. After the 1870 C treatment, tiered porosity and the formation of voids are observed, likely due to catalytic reactions between the two materials and accelerated by the stresses induced by the differences in the materials' coefficients of thermal expansion. Lastly, Raman spectroscopy is employed to gain an understanding of the interface lattices' optical responses. △ Less

Submitted 16 November, 2021; originally announced November 2021.

Confocal laser scanning microscopy: A tool for rapid optical characterization of 2D materials

Authors: Vishal Panchal, Yanfei Yang, Guangjun Cheng, Jiuning Hu, Mattias Kruskopf, Chieh-I Liu, Albert F. Rigosi, Christos Melios, Angela R. Hight Walker, David B. Newell, Olga Kazakova, Randolph E. Elmquist

Abstract: Confocal laser scanning microscopy (CLSM) is a non-destructive, highly-efficient optical characterization method for large-area analysis of graphene on different substrates, which can be applied in ambient air, does not require additional sample preparation, and is insusceptible to surface charging and surface contamination. CLSM leverages optical properties of graphene and provides greatly enhanc… ▽ More Confocal laser scanning microscopy (CLSM) is a non-destructive, highly-efficient optical characterization method for large-area analysis of graphene on different substrates, which can be applied in ambient air, does not require additional sample preparation, and is insusceptible to surface charging and surface contamination. CLSM leverages optical properties of graphene and provides greatly enhanced optical contrast and map** of thickness down to a single layer. We demonstrate the effectiveness of CLSM by measuring mechanically exfoliated and chemical vapor deposition graphene on Si/SiO2, and epitaxial graphene on SiC. In the case of graphene on Si/SiO2, both CLSM intensity and height map** is powerful for analysis of 1-5 layers of graphene. For epitaxial graphene on SiC substrates, the CLSM intensity allows us to distinguish features such as dense, parallel 150 nm wide ribbons of graphene (associated with the early stages of the growth process) and large regions covered by the interfacial layer and 1-3 layers of graphene. In both cases, CLSM data shows excellent correlation with conventional optical microscopy, atomic force microscopy, Kelvin probe force microscopy, conductive atomic force microscopy, scanning electron microscopy and Raman map**, with a greatly reduced acquisition time. We demonstrate that CLSM is an indispensable tool for rapid analysis of mass-produced graphene and is equally relevant to other 2D materials. △ Less

Submitted 12 April, 2018; originally announced April 2018.

Comments: 4 Figures

Rapid characterization of wafer-scale 2D material: Epitaxial graphene and graphene nanoribbons on SiC

Authors: Vishal Panchal, Yanfei Yang, Guangjun Cheng, Jiuning Hu, Chieh-I Liu, Albert F. Rigosi, Christos Melios, Olga Kazakova, Angela R. Hight Walker, David B. Newell, Randolph E. Elmquist

Abstract: We demonstrate that the confocal laser scanning microscopy (CLSM) provides a non-destructive, highly-efficient characterization method for large-area epitaxial graphene and graphene nanostructures on SiC substrates, which can be applied in ambient air without sample preparation and is insusceptible to surface charging or surface contamination. Based on the variation of reflected intensity from reg… ▽ More We demonstrate that the confocal laser scanning microscopy (CLSM) provides a non-destructive, highly-efficient characterization method for large-area epitaxial graphene and graphene nanostructures on SiC substrates, which can be applied in ambient air without sample preparation and is insusceptible to surface charging or surface contamination. Based on the variation of reflected intensity from regions covered by interfacial layer, single layer, bilayer, or few layer graphene, and through the correlation to the results from Raman spectroscopy and SPM, CLSM images with a high resolution (around 150 nm) reveal that the intensity contrast has distinct feature for undergrown graphene (mixing of dense, parallel graphene nanoribbons and interfacial layer), continuous graphene, and overgrown graphene. Moreover, CLSM has a real acquisition time hundreds of times faster per unit area than the supplementary characterization methods. We believe that the confocal laser scanning microscope will be an indispensable tool for mass-produced epitaxial graphene or applicable 2D materials. △ Less

Submitted 9 November, 2017; originally announced November 2017.

Part-per-million quantization and current-induced breakdown of the quantum anomalous Hall effect

Authors: E. J. Fox, I. T. Rosen, Yanfei Yang, George R. Jones, Randolph E. Elmquist, Xufeng Kou, Lei Pan, Kang L. Wang, D. Goldhaber-Gordon

Abstract: In the quantum anomalous Hall effect, quantized Hall resistance and vanishing longitudinal resistivity are predicted to result from the presence of dissipationless, chiral edge states and an insulating 2D bulk, without requiring an external magnetic field. Here, we explore the potential of this effect in magnetic topological insulator thin films for metrological applications. Using a cryogenic cur… ▽ More In the quantum anomalous Hall effect, quantized Hall resistance and vanishing longitudinal resistivity are predicted to result from the presence of dissipationless, chiral edge states and an insulating 2D bulk, without requiring an external magnetic field. Here, we explore the potential of this effect in magnetic topological insulator thin films for metrological applications. Using a cryogenic current comparator system, we measure quantization of the Hall resistance to within one part per million and longitudinal resistivity under 10 m$Ω$ per square at zero magnetic field. Increasing the current density past a critical value leads to a breakdown of the quantized, low-dissipation state, which we attribute to electron heating in bulk current flow. We further investigate the pre-breakdown regime by measuring transport dependence on temperature, current, and geometry, and find evidence for bulk dissipation, including thermal activation and possible variable-range hop**. △ Less

Submitted 4 October, 2017; originally announced October 2017.

Comments: 9 pages, 4 figures, with 7 pages of supplementary information

Journal ref: Phys. Rev. B 98, 075145 (2018)

Epitaxial graphene homogeneity and quantum Hall effect in millimeter-scale devices

Authors: Yanfei Yang, Guangjun Cheng, Patrick Mende, Irene G. Calizo, Randall M. Feenstra, Chiashain Chuang, Chieh-Wen Liu, Chieh-I Liu, George R. Jones, Angela R. Hight Walker, Randolph E. Elmquist

Abstract: Quantized magnetotransport is observed in 5.6 x 5.6 mm^2 epitaxial graphene devices, grown using highly constrained sublimation on the Si-face of SiC(0001) at high temperature (1900 °C). The precise quantized Hall resistance of Rxy = h/2e^2 is maintained up to record level of critical current Ixx = 0.72 mA at T = 3.1 K and 9 T in a device where Raman microscopy reveals low and homogeneous strain.… ▽ More Quantized magnetotransport is observed in 5.6 x 5.6 mm^2 epitaxial graphene devices, grown using highly constrained sublimation on the Si-face of SiC(0001) at high temperature (1900 °C). The precise quantized Hall resistance of Rxy = h/2e^2 is maintained up to record level of critical current Ixx = 0.72 mA at T = 3.1 K and 9 T in a device where Raman microscopy reveals low and homogeneous strain. Adsorption-induced molecular do** in a second device reduced the carrier concentration close to the Dirac point(n ~ 1E10 (1/cm^2)), where mobility of 43700 cm^2/Vs is measured over an area of 10 mm^2. Atomic force, confocal optical, and Raman microscopies are used to characterize the large-scale devices, and reveal improved SiC terrace topography and the structure of the graphene layer. Our results show that the structural uniformity of epitaxial graphene produced by face-to-graphite processing contributes to millimeter-scale transport homogeneity, and will prove useful for scientific and commercial applications. △ Less

Submitted 24 June, 2016; originally announced June 2016.

Floating up of the zero-energy Landau level in monolayer epitaxial graphene

Authors: Lung-I Huang, Yanfei Yang, Randolph E. Elmquist, Shun-Tsung Lo, Fan-Hung Liu, Chi-Te Liang

Abstract: We report on magneto-transport measurements on low-density, large-area monolayer epitaxial graphene devices grown on SiC. We show that the zero-energy Landau level (LL) in monolayer graphene, which is predicted to be magnetic field ($B$)-independent, can float up above the Fermi energy at low $B$. This is supported by the temperature ($T$)-driven flow diagram approximated by the semi-circle law as… ▽ More We report on magneto-transport measurements on low-density, large-area monolayer epitaxial graphene devices grown on SiC. We show that the zero-energy Landau level (LL) in monolayer graphene, which is predicted to be magnetic field ($B$)-independent, can float up above the Fermi energy at low $B$. This is supported by the temperature ($T$)-driven flow diagram approximated by the semi-circle law as well as the $T$-independent point in the Hall conductivity $σ_{xy}$ near $e^2/h$. Our experimental data are in sharp contrast to conventional understanding of the zeroth LL and metallic-like behavior in pristine graphene prepared by mechanical exfoliation at low $T$. This surprising result can be ascribed to substrate-induced sublattice symmetry breaking which splits the degeneracy of the zeroth Landau level. Our finding provides a unified picture regarding the metallic behavior in pristine graphene prepared by mechanical exfoliation, and the insulating behavior and the insulator-quantum Hall transition in monolayer epitaxial graphene. △ Less

Submitted 26 February, 2016; originally announced February 2016.

Comments: 4 figures with supplementary Information

Low Carrier Density Epitaxial Graphene Devices On SiC

Authors: Yanfei Yang, Lung-I Huang, Yasuhiro Fukuyama, Fan-Hung Liu, Mariano A. Real, Paola Barbara, Chi-Te Liang, David B. Newell, Randolph E. Elmquist

Abstract: Monolayer epitaxial graphene (EG) grown on hexagonal Si-terminated SiC substrates is intrinsically electron-doped (carrier density is about 10^13 cm^(-2)). We demonstrate a clean device fabrication process using a precious-metal protective layer, and show that etching with aqua regia results in p-type (hole) molecular do** of our un-gated, contamination-free EG. Devices fabricated by this simple… ▽ More Monolayer epitaxial graphene (EG) grown on hexagonal Si-terminated SiC substrates is intrinsically electron-doped (carrier density is about 10^13 cm^(-2)). We demonstrate a clean device fabrication process using a precious-metal protective layer, and show that etching with aqua regia results in p-type (hole) molecular do** of our un-gated, contamination-free EG. Devices fabricated by this simple process can reach a carrier density in the range of 10^10 cm^(-2) to 10^11 cm^(-2) with mobility about 8000 cm^2/V/s or higher. In a moderately doped device with a carrier density n = 2.4 x 10^11 cm^(-2) and mobility = 5200 cm^2/V/s, we observe highly developed quantized Hall resistance plateaus with filing factor of 2 at magnetic field strengths of less than 4 T. Do** concentrations can be restored to higher levels by heat treatment in Ar, while devices with both p-type and n-type majority carriers tend to drift toward lower carrier concentrations in ambient air. △ Less

Submitted 3 April, 2014; originally announced April 2014.

Quantum Hall effect on centimeter scale chemical vapor deposited graphene films

Authors: Tian Shen, Wei Wu, Qingkai Yu, Curt A Richter, Randolph Elmquist, David Newell, Yong P. Chen

Abstract: We report observations of well developed half integer quantum Hall effect (QHE) on mono layer graphene films of 7 mm \times 7 mm in size. The graphene films are grown by chemical vapor deposition (CVD) on copper, then transferred to SiO_{2} /Si substrates, with typical carrier mobilities \approx 4000 cm^{2} /Vs. The large size graphene with excellent quality and electronic homogeneity demonstrated… ▽ More We report observations of well developed half integer quantum Hall effect (QHE) on mono layer graphene films of 7 mm \times 7 mm in size. The graphene films are grown by chemical vapor deposition (CVD) on copper, then transferred to SiO_{2} /Si substrates, with typical carrier mobilities \approx 4000 cm^{2} /Vs. The large size graphene with excellent quality and electronic homogeneity demonstrated in this work is promising for graphene-based quantum Hall resistance standards, and can also facilitate a wide range of experiments on quantum Hall physics of graphene and practical applications exploiting the exceptional properties of graphene. △ Less

Submitted 30 September, 2011; originally announced September 2011.