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Utilizing multimodal microscopy to reconstruct Si/SiGe interfacial atomic disorder and infer its impacts on qubit variability
Authors:
Luis Fabián Peña,
Justine C. Koepke,
J. Houston Dycus,
Andrew Mounce,
Andrew D. Baczewski,
N. Tobias Jacobson,
Ezra Bussmann
Abstract:
SiGe heteroepitaxial growth yields pristine host material for quantum dot qubits, but residual interface disorder can lead to qubit-to-qubit variability that might pose an obstacle to reliable SiGe-based quantum computing. We demonstrate a technique to reconstruct 3D interfacial atomic structure spanning multiqubit areas by combining data from two verifiably atomic-resolution microscopy techniques…
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SiGe heteroepitaxial growth yields pristine host material for quantum dot qubits, but residual interface disorder can lead to qubit-to-qubit variability that might pose an obstacle to reliable SiGe-based quantum computing. We demonstrate a technique to reconstruct 3D interfacial atomic structure spanning multiqubit areas by combining data from two verifiably atomic-resolution microscopy techniques. Utilizing scanning tunneling microscopy (STM) to track molecular beam epitaxy (MBE) growth, we image surface atomic structure following deposition of each heterostructure layer revealing nanosized SiGe undulations, disordered strained-Si atomic steps, and nonconformal uncorrelated roughness between interfaces. Since phenomena such as atomic intermixing during subsequent overgrowth inevitably modify interfaces, we measure post-growth structure via cross-sectional high-angle annular dark field scanning transmission electron microscopy (HAADF-STEM). Features such as nanosized roughness remain intact, but atomic step structure is indiscernible in $1.0\pm 0.4$~nm-wide intermixing at interfaces. Convolving STM and HAADF-STEM data yields 3D structures capturing interface roughness and intermixing. We utilize the structures in an atomistic multivalley effective mass theory to quantify qubit spectral variability. The results indicate (1) appreciable valley splitting (VS) variability of roughly $\pm$ $50\%$ owing to alloy disorder, and (2) roughness-induced double-dot detuning bias energy variability of order $1-10$ meV depending on well thickness. For measured intermixing, atomic steps have negligible influence on VS, and uncorrelated roughness causes spatially fluctuating energy biases in double-dot detunings potentially incorrectly attributed to charge disorder.
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Submitted 27 June, 2023;
originally announced June 2023.
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Toward durable Al-InSb hybrid heterostructures via epitaxy of 2ML interfacial InAs screening layers
Authors:
Candice Thomas,
Rosa E. Diaz,
J. Houston Dycus,
Michael E. Salmon,
Roger E. Daniel,
Tiantian Wang,
Geoffrey C. Gardner,
Michael J. Manfra
Abstract:
The large Landé g-factor, high spin-orbit coupling, and low effective mass of the two-dimensional electron gas in InSb quantum wells combined with proximal superconductivity may realize a scalable platform for topological quantum computation. Aluminum thin films directly deposited on top of InSb planar structures result in the formation of a reactive AlInSb layer at the interface. This interlayer…
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The large Landé g-factor, high spin-orbit coupling, and low effective mass of the two-dimensional electron gas in InSb quantum wells combined with proximal superconductivity may realize a scalable platform for topological quantum computation. Aluminum thin films directly deposited on top of InSb planar structures result in the formation of a reactive AlInSb layer at the interface. This interlayer progressively consumes the whole Al film, resulting in a disordered AlInSb layer after few months at room temperature. We report on a heterostructure design that results in a significant increase of the durability of these hybrid Al-InSb heterostructures with the preservation of a pure Al film and sharp superconductor-semiconductor interface for more than one year. Two monolayers of epitaxial InAs at the superconductor-semiconductor interface prevent interfacial reactivity as evidenced by X-ray reflectivity and energy dispersive spectroscopy measurements. Structural characterizations of the Al films by transmission electron microscopy reveal the presence of tens of nanometers wide grains predominantly oriented with Al(110) parallel to InSb(001).
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Submitted 8 October, 2019;
originally announced October 2019.
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Structure of Native Two-dimensional Oxides on III--Nitride Surfaces
Authors:
J. Houston Dycus,
Kelsey J. Mirrielees,
Everett D. Grimley,
Ronny Kirste,
Seiji Mita,
Zlatko Sitar,
Ramon Collazo,
Douglas L. Irving,
James M. LeBeau
Abstract:
When pristine material surfaces are exposed to air, highly reactive broken bonds can promote the formation of surface oxides with structures and properties differing greatly from bulk. Determination of the oxide structure, however, is often elusive through the use of indirect diffraction methods or techniques that probe only the outer most layer. As a result, surface oxides forming on widely used…
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When pristine material surfaces are exposed to air, highly reactive broken bonds can promote the formation of surface oxides with structures and properties differing greatly from bulk. Determination of the oxide structure, however, is often elusive through the use of indirect diffraction methods or techniques that probe only the outer most layer. As a result, surface oxides forming on widely used materials, such as group III-nitrides, have not been unambiguously resolved, even though critical properties can depend sensitively on their presence. In this work, aberration corrected scanning transmission electron microscopy reveals directly, and with depth dependence, the structure of native two--dimensional oxides that form on AlN and GaN surfaces. Through atomic resolution imaging and spectroscopy, we show that the oxide layers are comprised of tetrahedra--octahedra cation--oxygen units, similar to bulk $θ$--Al$_2$O$_3$ and $β$--Ga$_2$O$_3$. By applying density functional theory, we show that the observed structures are more stable than previously proposed surface oxide models. We place the impact of these observations in the context of key III-nitride growth, device issues, and the recent discovery of two-dimnesional nitrides.
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Submitted 13 August, 2017;
originally announced August 2017.
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Probing collective oscillation of $d$-orbital electrons at the nanoscale
Authors:
Rohan Dhall,
Derek Vigil-Fowler,
J. Houston Dycus,
Ronny Kirste,
Seiji Mita,
Zlatko Sitar,
Ramon Collazo,
James M. LeBeau
Abstract:
Here we demonstrate that high energy electrons can be used to explore the collective oscillation of $s$, $p$, and $d$ orbital electrons at the nanometer length scale. Using epitaxial AlGaN/AlN quantum wells as a test system, we observe the emergence of additional features in the loss spectrum with increasing Ga content. A comparison of the observed spectra with ab--initio theory reveals the origin…
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Here we demonstrate that high energy electrons can be used to explore the collective oscillation of $s$, $p$, and $d$ orbital electrons at the nanometer length scale. Using epitaxial AlGaN/AlN quantum wells as a test system, we observe the emergence of additional features in the loss spectrum with increasing Ga content. A comparison of the observed spectra with ab--initio theory reveals the origin of these spectral features is attributed to 3$d$--electrons contributed by Ga. We find that these modes differ in energy from the valence electron plasmons in Al$_{1-x}$Ga$_x$N due to the different polarizability of the $d$ electrons. Finally, we study the dependence of observed plasmon modes on Ga content, lending insight into plasmon coupling with electron--hole excitations.
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Submitted 12 August, 2017;
originally announced August 2017.
