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Orientation dependent etching of silicon by fluorine molecules: a quantum chemistry computational study
Authors:
Omesh Dhar Dwivedi,
Yuri Barsukov,
Sierra Jubin,
Joseph Vella,
Igor Kaganovich
Abstract:
Anisotropic etching is a widely used process in semiconductor manufacturing, in particular for micro- and nano-scale texturing of silicon surfaces for black silicon production. The typical process of plasma-assisted etching uses energetic ions to remove material in the vertical direction, creating anisotropic etch profiles. Plasma-less anisotropic etching, considered here, is a less common process…
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Anisotropic etching is a widely used process in semiconductor manufacturing, in particular for micro- and nano-scale texturing of silicon surfaces for black silicon production. The typical process of plasma-assisted etching uses energetic ions to remove material in the vertical direction, creating anisotropic etch profiles. Plasma-less anisotropic etching, considered here, is a less common process that does not use ions and plasma. The anisotropy is caused by the unequal etching rates of different crystal planes; the etching process thus proceeds in a preferred direction. In this paper, we have performed quantum chemistry modeling of gas-surface reactions involved in the etching of silicon surfaces by molecular fluorine. The results confirm that orientation-dependent etch rates are the reason for anisotropy. The modeling of F2 dissociative chemisorption on the F-terminated silicon surfaces show that Si-Si bond breaking is slow for Si(111) surface, while it is fast for the Si(100) and Si(110) surfaces. The Si(100) and Si(110) surfaces incorporate a larger number of fluorine atoms resulting in the Si-Si bonds having a larger amount of positive charge which lowers the reaction barrier of F2 dissociative chemisorption, yielding a higher etch rate for the Si(100) and Si(110) surfaces compared to the Si(111) surfaces. Molecular dynamics modeling of the same reactions has shown that the chosen reactive bond order (REBO) potential does not accurately reproduce the lower reaction barriers for F2 dissociative chemisorption on Si(100) and Si(100) surfaces. Thus, reparameterization is necessary to model the anisotropic etching process that occurs at lower temperatures.
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Submitted 7 August, 2023; v1 submitted 15 May, 2023;
originally announced May 2023.
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Multislant matrices and Jacobi--Trudi determinants over finite fields
Authors:
Omesh Dhar Dwivedi,
Jonah Blasiak,
Darij Grinberg
Abstract:
The problem of counting the $\mathbb{F}_q$-valued points of a variety has been well-studied from algebro-geometric, topological, and combinatorial perspectives. We explore a combinatorially flavored version of this problem studied by Anzis et al. (2018), which is similar to work of Kontsevich, Elkies, and Haglund.
Anzis et al. considered the question: what is the probability that the determinant…
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The problem of counting the $\mathbb{F}_q$-valued points of a variety has been well-studied from algebro-geometric, topological, and combinatorial perspectives. We explore a combinatorially flavored version of this problem studied by Anzis et al. (2018), which is similar to work of Kontsevich, Elkies, and Haglund.
Anzis et al. considered the question: what is the probability that the determinant of a Jacobi-Trudi matrix vanishes if the variables are chosen uniformly at random from a finite field? They gave a formula for various partitions such as hooks, staircases, and rectangles. We give a formula for partitions whose parts form an arithmetic progression, verifying and generalizing one of their conjectures. More generally, we compute the probability of the determinant vanishing for a class of matrices (``multislant matrices'') made of Toeplitz blocks with certain properties.
We furthermore show that the determinant of a skew Jacobi-Trudi matrix is equidistributed across the finite field if the skew partition is a ribbon.
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Submitted 6 June, 2023; v1 submitted 14 February, 2023;
originally announced February 2023.
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On the rank of Hankel matrices over finite fields
Authors:
Omesh Dhar Dwivedi,
Darij Grinberg
Abstract:
Given three nonnegative integers $p,q,r$ and a finite field $F$, how many Hankel matrices $\left( x_{i+j}\right) _{0\leq i\leq p,\ 0\leq j\leq q}$ over $F$ have rank $\leq r$ ? This question is classical, and the answer ($q^{2r}$ when $r\leq\min\left\{ p,q\right\} $) has been obtained independently by various authors using different tools (Daykin, Elkies, Garcia Armas, Ghorpade and Ram). In this n…
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Given three nonnegative integers $p,q,r$ and a finite field $F$, how many Hankel matrices $\left( x_{i+j}\right) _{0\leq i\leq p,\ 0\leq j\leq q}$ over $F$ have rank $\leq r$ ? This question is classical, and the answer ($q^{2r}$ when $r\leq\min\left\{ p,q\right\} $) has been obtained independently by various authors using different tools (Daykin, Elkies, Garcia Armas, Ghorpade and Ram). In this note, we study a refinement of this result: We show that if we fix the first $k$ of the entries $x_{0},x_{1},\ldots,x_{k-1}$ for some $k\leq r\leq\min\left\{ p,q\right\} $, then the number of ways to choose the remaining $p+q-k+1$ entries $x_{k},x_{k+1},\ldots,x_{p+q}$ such that the resulting Hankel matrix $\left( x_{i+j}\right) _{0\leq i\leq p,\ 0\leq j\leq q}$ has rank $\leq r$ is $q^{2r-k}$. This is exactly the answer that one would expect if the first $k$ entries had no effect on the rank, but of course the situation is not this simple. The refined result generalizes (and provides an alternative proof of) a result by Anzis, Chen, Gao, Kim, Li and Patrias on evaluations of Jacobi-Trudi determinants over finite fields.
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Submitted 11 September, 2021;
originally announced September 2021.
